Optical imaging in projection microlithography:
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into e...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
[2005]
|
| Schriftenreihe: | SPIE tutorial texts
TT66 |
| Schlagworte: | |
| Online-Zugang: | FHD01 Volltext |
| Zusammenfassung: | Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists |
| Beschreibung: | 1 online resource (xix, 254 pages) illustrations |
| ISBN: | 9780819478702 |
| DOI: | 10.1117/3.612961 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044222505 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170313s2005 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819478702 |9 978-0-8194-7870-2 | ||
| 024 | 7 | |a 10.1117/3.612961 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819478702 | ||
| 035 | |a (OCoLC)812342481 | ||
| 035 | |a (DE-599)BVBBV044222505 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/31 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Wong, Alfred Kwok-Kit |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Optical imaging in projection microlithography |c Alfred Kwok-Kit Wong |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c [2005] | |
| 300 | |a 1 online resource (xix, 254 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE tutorial texts |v TT66 | |
| 520 | |a Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists | ||
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Imaging systems | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-5829-2 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.612961 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029628422 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1117/3.612961 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804177371227488256 |
|---|---|
| any_adam_object | |
| author | Wong, Alfred Kwok-Kit |
| author_facet | Wong, Alfred Kwok-Kit |
| author_role | aut |
| author_sort | Wong, Alfred Kwok-Kit |
| author_variant | a k k w akk akkw |
| building | Verbundindex |
| bvnumber | BV044222505 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819478702 (OCoLC)812342481 (DE-599)BVBBV044222505 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.612961 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02304nmm a2200445zcb4500</leader><controlfield tag="001">BV044222505</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170313s2005 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819478702</subfield><subfield code="9">978-0-8194-7870-2</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.612961</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819478702</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812342481</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044222505</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Wong, Alfred Kwok-Kit</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Optical imaging in projection microlithography</subfield><subfield code="c">Alfred Kwok-Kit Wong</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">[2005]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xix, 254 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE tutorial texts</subfield><subfield code="v">TT66</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Imaging systems</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-5829-2</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.612961</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029628422</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.612961</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044222505 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:01Z |
| institution | BVB |
| isbn | 9780819478702 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029628422 |
| oclc_num | 812342481 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xix, 254 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2005 |
| publishDateSearch | 2005 |
| publishDateSort | 2005 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE tutorial texts |
| spelling | Wong, Alfred Kwok-Kit Verfasser aut Optical imaging in projection microlithography Alfred Kwok-Kit Wong Bellingham, Wash. SPIE [2005] 1 online resource (xix, 254 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE tutorial texts TT66 Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists Microlithography Imaging systems Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-5829-2 https://doi.org/10.1117/3.612961 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Wong, Alfred Kwok-Kit Optical imaging in projection microlithography Microlithography Imaging systems Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4191584-7 |
| title | Optical imaging in projection microlithography |
| title_auth | Optical imaging in projection microlithography |
| title_exact_search | Optical imaging in projection microlithography |
| title_full | Optical imaging in projection microlithography Alfred Kwok-Kit Wong |
| title_fullStr | Optical imaging in projection microlithography Alfred Kwok-Kit Wong |
| title_full_unstemmed | Optical imaging in projection microlithography Alfred Kwok-Kit Wong |
| title_short | Optical imaging in projection microlithography |
| title_sort | optical imaging in projection microlithography |
| topic | Microlithography Imaging systems Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Microlithography Imaging systems Lithografie Halbleitertechnologie |
| url | https://doi.org/10.1117/3.612961 |
| work_keys_str_mv | AT wongalfredkwokkit opticalimaginginprojectionmicrolithography |