Lithography for semiconductor manufacturing: 19 - 21 May 1999, Edinburgh, Scotland
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Bellingham, Wash.
SPIE
1999
|
Schriftenreihe: | Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers
3741 |
Schlagworte: | |
Beschreibung: | VII, 262 S. Ill., graph. Darst. |
ISBN: | 0819432210 |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV014116485 | ||
003 | DE-604 | ||
005 | 20021025 | ||
007 | t | ||
008 | 020128s1999 ad|| |||| 10||| eng d | ||
020 | |a 0819432210 |9 0-8194-3221-0 | ||
035 | |a (OCoLC)41549745 | ||
035 | |a (DE-599)BVBBV014116485 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | 0 | |a eng | |
049 | |a DE-703 |a DE-83 | ||
050 | 0 | |a TK7874 | |
050 | 0 | |a TS510 | |
082 | 0 | |a 621.3815/2 |2 21 | |
084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
245 | 1 | 0 | |a Lithography for semiconductor manufacturing |b 19 - 21 May 1999, Edinburgh, Scotland |c Chris A. Mack ... chairs/eds. |
264 | 1 | |a Bellingham, Wash. |b SPIE |c 1999 | |
300 | |a VII, 262 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers |v 3741 | |
650 | 4 | |a Integrated circuits |x Design and construction |v Congresses | |
650 | 4 | |a Microlithography |v Congresses | |
650 | 4 | |a Semiconductors |x Etching |v Congresses | |
650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1999 |z Edinburgh |2 gnd-content | |
689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Mack, Chris A. |e Sonstige |4 oth | |
810 | 2 | |a Society of Photo-Optical Instrumentation Engineers |t Proceedings of SPIE |v 3741 |w (DE-604)BV000010887 |9 3741 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-009672127 |
Datensatz im Suchindex
_version_ | 1804128985307676672 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV014116485 |
callnumber-first | T - Technology |
callnumber-label | TK7874 |
callnumber-raw | TK7874 TS510 |
callnumber-search | TK7874 TS510 |
callnumber-sort | TK 47874 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | ZN 4170 |
ctrlnum | (OCoLC)41549745 (DE-599)BVBBV014116485 |
dewey-full | 621.3815/2 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/2 |
dewey-search | 621.3815/2 |
dewey-sort | 3621.3815 12 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01550nam a2200409 cb4500</leader><controlfield tag="001">BV014116485</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20021025 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">020128s1999 ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0819432210</subfield><subfield code="9">0-8194-3221-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)41549745</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV014116485</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS510</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">21</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Lithography for semiconductor manufacturing</subfield><subfield code="b">19 - 21 May 1999, Edinburgh, Scotland</subfield><subfield code="c">Chris A. Mack ... chairs/eds.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VII, 262 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers</subfield><subfield code="v">3741</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Design and construction</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1999</subfield><subfield code="z">Edinburgh</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Mack, Chris A.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="810" ind1="2" ind2=" "><subfield code="a">Society of Photo-Optical Instrumentation Engineers</subfield><subfield code="t">Proceedings of SPIE</subfield><subfield code="v">3741</subfield><subfield code="w">(DE-604)BV000010887</subfield><subfield code="9">3741</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-009672127</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1999 Edinburgh gnd-content |
genre_facet | Konferenzschrift 1999 Edinburgh |
id | DE-604.BV014116485 |
illustrated | Illustrated |
indexdate | 2024-07-09T18:57:56Z |
institution | BVB |
isbn | 0819432210 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009672127 |
oclc_num | 41549745 |
open_access_boolean | |
owner | DE-703 DE-83 |
owner_facet | DE-703 DE-83 |
physical | VII, 262 S. Ill., graph. Darst. |
publishDate | 1999 |
publishDateSearch | 1999 |
publishDateSort | 1999 |
publisher | SPIE |
record_format | marc |
series2 | Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers |
spelling | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland Chris A. Mack ... chairs/eds. Bellingham, Wash. SPIE 1999 VII, 262 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers 3741 Integrated circuits Design and construction Congresses Microlithography Congresses Semiconductors Etching Congresses Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1999 Edinburgh gnd-content Lithografie Halbleitertechnologie (DE-588)4191584-7 s DE-604 Mack, Chris A. Sonstige oth Society of Photo-Optical Instrumentation Engineers Proceedings of SPIE 3741 (DE-604)BV000010887 3741 |
spellingShingle | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland Integrated circuits Design and construction Congresses Microlithography Congresses Semiconductors Etching Congresses Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
subject_GND | (DE-588)4191584-7 (DE-588)1071861417 |
title | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland |
title_auth | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland |
title_exact_search | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland |
title_full | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland Chris A. Mack ... chairs/eds. |
title_fullStr | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland Chris A. Mack ... chairs/eds. |
title_full_unstemmed | Lithography for semiconductor manufacturing 19 - 21 May 1999, Edinburgh, Scotland Chris A. Mack ... chairs/eds. |
title_short | Lithography for semiconductor manufacturing |
title_sort | lithography for semiconductor manufacturing 19 21 may 1999 edinburgh scotland |
title_sub | 19 - 21 May 1999, Edinburgh, Scotland |
topic | Integrated circuits Design and construction Congresses Microlithography Congresses Semiconductors Etching Congresses Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
topic_facet | Integrated circuits Design and construction Congresses Microlithography Congresses Semiconductors Etching Congresses Lithografie Halbleitertechnologie Konferenzschrift 1999 Edinburgh |
volume_link | (DE-604)BV000010887 |
work_keys_str_mv | AT mackchrisa lithographyforsemiconductormanufacturing1921may1999edinburghscotland |