An introduction to contact resistance /:
"Contact resistance is both an old and new topic. It is old because fundamentals of the semiconductor-metal contacts were established in the 1930s even earlier than the study on Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). The new knowledge is on material and integration aspects...
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
New York :
Nova Science Publishers, Inc.,
[2020]
|
| Schriftenreihe: | Materials science and technologies series.
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Zusammenfassung: | "Contact resistance is both an old and new topic. It is old because fundamentals of the semiconductor-metal contacts were established in the 1930s even earlier than the study on Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). The new knowledge is on material and integration aspects for contact resistance reduction. As the MOSFETs become smaller and smaller, device parasitics start to dominate performance since the 2010s. The resistance part in MOSFET RC delay is mainly from external parasitics particularly the contact resistance. In the past decade, 3D MOSFETs, also named FinFETs, became the device structure in leading semiconductor technology. The 3D structure brings a unique opportunity for engineering the contact resistance. In physics, this book introduces MOSFET device electronics and contact physics. In material science, a variety of contact metals and silicides are covered. In electrical characterization, test structures and measurements of contact resistance are discussed in depth. In technology, state-of-the-art process techniques, material engineering, and integration for contact resistance reduction are introduced. This book can serve as a reference book for students in electrical engineering and material science major and professionals in semiconductor industry"-- |
| Beschreibung: | 1 online resource (ix, 175 pages) : color illustrations |
| Bibliographie: | Includes bibliographical references and index. |
| ISBN: | 9781536185836 1536185833 |
Internformat
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| 505 | 2 | |a Introduction to semiconductor transistor resistances / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US -- Physics and materials of semiconductor-metal contacts / Zuoguang Liu, PhD, and Nicolas Breil, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others -- Electrical characterization of contact resistance / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others. | |
| 520 | |a "Contact resistance is both an old and new topic. It is old because fundamentals of the semiconductor-metal contacts were established in the 1930s even earlier than the study on Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). The new knowledge is on material and integration aspects for contact resistance reduction. As the MOSFETs become smaller and smaller, device parasitics start to dominate performance since the 2010s. The resistance part in MOSFET RC delay is mainly from external parasitics particularly the contact resistance. In the past decade, 3D MOSFETs, also named FinFETs, became the device structure in leading semiconductor technology. The 3D structure brings a unique opportunity for engineering the contact resistance. In physics, this book introduces MOSFET device electronics and contact physics. In material science, a variety of contact metals and silicides are covered. In electrical characterization, test structures and measurements of contact resistance are discussed in depth. In technology, state-of-the-art process techniques, material engineering, and integration for contact resistance reduction are introduced. This book can serve as a reference book for students in electrical engineering and material science major and professionals in semiconductor industry"-- |c Provided by publisher | ||
| 588 | 0 | |a Online resource; title from digital title page (viewed on February 15, 2021). | |
| 650 | 0 | |a Semiconductor-metal boundaries. |0 http://id.loc.gov/authorities/subjects/sh85119897 | |
| 650 | 0 | |a Electric contacts. |0 http://id.loc.gov/authorities/subjects/sh85041628 | |
| 650 | 0 | |a Electric resistance. |0 http://id.loc.gov/authorities/subjects/sh85041986 | |
| 650 | 6 | |a Contacts métal-semiconducteur. | |
| 650 | 6 | |a Contacts électriques. | |
| 650 | 6 | |a Résistance électrique. | |
| 650 | 7 | |a resistivity. |2 aat | |
| 650 | 7 | |a Electric contacts |2 fast | |
| 650 | 7 | |a Electric resistance |2 fast | |
| 650 | 7 | |a Semiconductor-metal boundaries |2 fast | |
| 700 | 1 | |a Liu, Zuoguang, |e editor. | |
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| _version_ | 1816882527688720384 |
| adam_text | |
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| author2 | Liu, Zuoguang |
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| contents | Introduction to semiconductor transistor resistances / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US -- Physics and materials of semiconductor-metal contacts / Zuoguang Liu, PhD, and Nicolas Breil, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others -- Electrical characterization of contact resistance / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others. |
| ctrlnum | (OCoLC)1191456345 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | ZDB-4-EBA-on1191456345 |
| illustrated | Illustrated |
| indexdate | 2024-11-27T13:30:02Z |
| institution | BVB |
| isbn | 9781536185836 1536185833 |
| language | English |
| lccn | 2020038447 |
| oclc_num | 1191456345 |
| open_access_boolean | |
| owner | MAIN DE-863 DE-BY-FWS |
| owner_facet | MAIN DE-863 DE-BY-FWS |
| physical | 1 online resource (ix, 175 pages) : color illustrations |
| psigel | ZDB-4-EBA |
| publishDate | 2020 |
| publishDateSearch | 2020 |
| publishDateSort | 2020 |
| publisher | Nova Science Publishers, Inc., |
| record_format | marc |
| series | Materials science and technologies series. |
| series2 | Materials science and technologies |
| spelling | An introduction to contact resistance / Zuoguang Liu, editor. New York : Nova Science Publishers, Inc., [2020] 1 online resource (ix, 175 pages) : color illustrations text txt rdacontent computer c rdamedia online resource cr rdacarrier Materials science and technologies Includes bibliographical references and index. Introduction to semiconductor transistor resistances / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US -- Physics and materials of semiconductor-metal contacts / Zuoguang Liu, PhD, and Nicolas Breil, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others -- Electrical characterization of contact resistance / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others. "Contact resistance is both an old and new topic. It is old because fundamentals of the semiconductor-metal contacts were established in the 1930s even earlier than the study on Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). The new knowledge is on material and integration aspects for contact resistance reduction. As the MOSFETs become smaller and smaller, device parasitics start to dominate performance since the 2010s. The resistance part in MOSFET RC delay is mainly from external parasitics particularly the contact resistance. In the past decade, 3D MOSFETs, also named FinFETs, became the device structure in leading semiconductor technology. The 3D structure brings a unique opportunity for engineering the contact resistance. In physics, this book introduces MOSFET device electronics and contact physics. In material science, a variety of contact metals and silicides are covered. In electrical characterization, test structures and measurements of contact resistance are discussed in depth. In technology, state-of-the-art process techniques, material engineering, and integration for contact resistance reduction are introduced. This book can serve as a reference book for students in electrical engineering and material science major and professionals in semiconductor industry"-- Provided by publisher Online resource; title from digital title page (viewed on February 15, 2021). Semiconductor-metal boundaries. http://id.loc.gov/authorities/subjects/sh85119897 Electric contacts. http://id.loc.gov/authorities/subjects/sh85041628 Electric resistance. http://id.loc.gov/authorities/subjects/sh85041986 Contacts métal-semiconducteur. Contacts électriques. Résistance électrique. resistivity. aat Electric contacts fast Electric resistance fast Semiconductor-metal boundaries fast Liu, Zuoguang, editor. has work: An introduction to contact resistance (Text) https://id.oclc.org/worldcat/entity/E39PCH8rBggY7GrcMqdgrqJ4FX https://id.oclc.org/worldcat/ontology/hasWork Print version: An introduction to contact resistance. New York : Nova Science Publishers, Inc., [2020] 9781536185010 (DLC) 2020038446 Materials science and technologies series. http://id.loc.gov/authorities/names/no2009129021 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=2579892 Volltext |
| spellingShingle | An introduction to contact resistance / Materials science and technologies series. Introduction to semiconductor transistor resistances / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US -- Physics and materials of semiconductor-metal contacts / Zuoguang Liu, PhD, and Nicolas Breil, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others -- Electrical characterization of contact resistance / Zuoguang Liu, PhD, Semiconductor Technology Research, IBM, Albany, NY, US, and others. Semiconductor-metal boundaries. http://id.loc.gov/authorities/subjects/sh85119897 Electric contacts. http://id.loc.gov/authorities/subjects/sh85041628 Electric resistance. http://id.loc.gov/authorities/subjects/sh85041986 Contacts métal-semiconducteur. Contacts électriques. Résistance électrique. resistivity. aat Electric contacts fast Electric resistance fast Semiconductor-metal boundaries fast |
| subject_GND | http://id.loc.gov/authorities/subjects/sh85119897 http://id.loc.gov/authorities/subjects/sh85041628 http://id.loc.gov/authorities/subjects/sh85041986 |
| title | An introduction to contact resistance / |
| title_auth | An introduction to contact resistance / |
| title_exact_search | An introduction to contact resistance / |
| title_full | An introduction to contact resistance / Zuoguang Liu, editor. |
| title_fullStr | An introduction to contact resistance / Zuoguang Liu, editor. |
| title_full_unstemmed | An introduction to contact resistance / Zuoguang Liu, editor. |
| title_short | An introduction to contact resistance / |
| title_sort | introduction to contact resistance |
| topic | Semiconductor-metal boundaries. http://id.loc.gov/authorities/subjects/sh85119897 Electric contacts. http://id.loc.gov/authorities/subjects/sh85041628 Electric resistance. http://id.loc.gov/authorities/subjects/sh85041986 Contacts métal-semiconducteur. Contacts électriques. Résistance électrique. resistivity. aat Electric contacts fast Electric resistance fast Semiconductor-metal boundaries fast |
| topic_facet | Semiconductor-metal boundaries. Electric contacts. Electric resistance. Contacts métal-semiconducteur. Contacts électriques. Résistance électrique. resistivity. Electric contacts Electric resistance Semiconductor-metal boundaries |
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