Spectroscopic ellipsometry :: practical application to thin film characterization /
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced i...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
New York [New York] (222 East 46th Street, New York, NY 10017) :
Momentum Press,
2016.
|
| Schriftenreihe: | Materials characterization and analysis collection,
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Zusammenfassung: | Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself. |
| Beschreibung: | Title from PDF title page (viewed on January 27, 2016). |
| Beschreibung: | 1 online resource (1 PDF (xxiii, 159 pages)) : illustrations |
| Bibliographie: | Includes bibliographical references (pages 151-154) and index. |
| ISBN: | 9781606507285 1606507281 |
| ISSN: | 2377-4355 |
Internformat
MARC
| LEADER | 00000cam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | ZDB-4-EBA-ocn936210041 | ||
| 003 | OCoLC | ||
| 005 | 20241004212047.0 | ||
| 006 | m eo d | ||
| 007 | cr cn||||m|||a | ||
| 008 | 160127s2016 nyua foab 001 0 eng d | ||
| 040 | |a NYMPP |b eng |e rda |e pn |c NYMPP |d OCLCO |d IDEBK |d YDXCP |d EBLCP |d N$T |d CUY |d BTCTA |d OCLCQ |d MERUC |d OCLCQ |d OCLCF |d STF |d OCLCQ |d G3B |d IGB |d OCLCQ |d OCLCO |d OCLCQ |d OCLCO |d OCLCL |d OCLCQ | ||
| 019 | |a 933336763 |a 933443522 |a 939264352 |a 967683287 | ||
| 020 | |a 9781606507285 |q (electronic bk.) | ||
| 020 | |a 1606507281 |q (electronic bk.) | ||
| 020 | |z 9781606507278 |q (print) | ||
| 020 | |z 1606507273 | ||
| 035 | |a (OCoLC)936210041 |z (OCoLC)933336763 |z (OCoLC)933443522 |z (OCoLC)939264352 |z (OCoLC)967683287 | ||
| 037 | |a 881144 |b MIL | ||
| 050 | 4 | |a QC443 |b .T657 2016 | |
| 072 | 7 | |a TEC |x 009000 |2 bisacsh | |
| 072 | 7 | |a TEC |x 035000 |2 bisacsh | |
| 082 | 7 | |a 620.11295 |2 23 | |
| 049 | |a MAIN | ||
| 100 | 1 | |a Tompkins, Harland G., |e author. |0 http://id.loc.gov/authorities/names/n84008686 | |
| 245 | 1 | 0 | |a Spectroscopic ellipsometry : |b practical application to thin film characterization / |c Harland G. Tompkins and James N. Hilfiker. |
| 264 | 1 | |a New York [New York] (222 East 46th Street, New York, NY 10017) : |b Momentum Press, |c 2016. | |
| 300 | |a 1 online resource (1 PDF (xxiii, 159 pages)) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 0 | |a Materials characterization and analysis collection, |x 2377-4355 | |
| 500 | |a Title from PDF title page (viewed on January 27, 2016). | ||
| 504 | |a Includes bibliographical references (pages 151-154) and index. | ||
| 505 | 0 | |a 1. Perspective, previous works, and purpose of this volume -- 1.1 Historical aspects -- 1.2 Focus of this book and target audience -- 1.3 Overview of topics. | |
| 505 | 8 | |a 2. Basic physical phenomena -- 2.1 The electromagnetic wave -- 2.2 Interactions between the electromagnetic wave and matter -- 2.3 Laws of reflection and refraction -- 2.4 Polarized light -- 2.5 The reflection and transmission of light -- 2.6 Measurement quantities. | |
| 505 | 8 | |a 3. Spectroscopic ellipsometry components and instrumentation -- 3.1 Components of a spectroscopic ellipsometer -- 3.2 Spectroscopic ellipsometers. | |
| 505 | 8 | |a 4. General data features -- 4.1 Spectra for substrates -- 4.2 Spectra for films on a substrate. | |
| 505 | 8 | |a 5. Representing optical functions -- 5.1 Tabulated list -- 5.2 Dispersion equations -- 5.3 The Cauchy equation, a dispersion equation for transparent regions -- 5.4 Oscillator models -- 5.5 B-spline. | |
| 505 | 8 | |a 6. Optical data analysis -- 6.1 Direct calculation: pseudo-optical constants -- 6.2 Data analysis, the problem -- 6.3 Data analysis, the approach. | |
| 505 | 8 | |a 7. Transparent thin films -- 7.1 Data features of transparent films -- 7.2 Fitting a transparent film with known index -- 7.3 Fitting a transparent film with an unknown index -- 7.4 Example: dielectric SiNx film on Si -- 7.5 Example: dielectric SiO2 film on glass. | |
| 505 | 8 | |a 8. Roughness -- 8.1 Macroscopic roughness -- 8.2 Microscopic roughness -- 8.3 Effective medium approximations -- 8.4 Rough film example. | |
| 505 | 8 | |a 9. Very thin films -- 9.1 Determining thickness with known optical functions -- 9.2 Determining optical constants of a very thin film -- 9.3 Distinguishing one film material from another. | |
| 505 | 8 | |a 10. Thin films with absorbing spectral regions -- 10.1 Selecting the transparent wavelength region -- 10.2 Models for the absorbing region -- 10.3 Example: amorphous Si on glass, using the oscillator method -- 10.4 Example: photoresist on Si, using the B-spline method. | |
| 505 | 8 | |a 11. Metallic films -- 11.1 Challenge of absorbing films -- 11.2 Strategies for absorbing films. | |
| 505 | 8 | |a 12. Multilayer thin film stacks -- 12.1 Multilayer strategies -- 12.2 Example: two layer organic stack, using "divide and conquer" -- 12.3 Example: high-low optical stack, using "coupling" -- References -- Index. | |
| 520 | 3 | |a Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself. | |
| 650 | 0 | |a Ellipsometry. |0 http://id.loc.gov/authorities/subjects/sh85042606 | |
| 650 | 0 | |a Thin films |x Measurement. | |
| 650 | 0 | |a Spectrum analysis |x Measurement. | |
| 650 | 6 | |a Ellipsométrie. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Engineering (General) |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Reference. |2 bisacsh | |
| 650 | 7 | |a Ellipsometry |2 fast | |
| 650 | 7 | |a Thin films |x Measurement |2 fast | |
| 653 | |a Cauchy equation | ||
| 653 | |a dispersion equations | ||
| 653 | |a ellipsometry | ||
| 653 | |a optical constants | ||
| 653 | |a polarized light | ||
| 653 | |a refractive index | ||
| 653 | |a thin film thickness | ||
| 700 | 1 | |a Hilfiker, James N., |e author. | |
| 758 | |i has work: |a Spectroscopic ellipsometry (Text) |1 https://id.oclc.org/worldcat/entity/E39PCGMB8Wp9V7q6WdBqdwfH4q |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
| 776 | 0 | 8 | |i Print version: |z 9781606507278 |
| 856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1124572 |3 Volltext |
| 936 | |a BATCHLOAD | ||
| 938 | |a Baker and Taylor |b BTCP |n BK0020447252 | ||
| 938 | |a ProQuest Ebook Central |b EBLB |n EBL4205920 | ||
| 938 | |a EBSCOhost |b EBSC |n 1124572 | ||
| 938 | |a ProQuest MyiLibrary Digital eBook Collection |b IDEB |n cis33393352 | ||
| 938 | |a Momentum Press |b NYMP |n 9781606507285 | ||
| 938 | |a YBP Library Services |b YANK |n 12756395 | ||
| 994 | |a 92 |b GEBAY | ||
| 912 | |a ZDB-4-EBA | ||
| 049 | |a DE-863 | ||
Datensatz im Suchindex
| DE-BY-FWS_katkey | ZDB-4-EBA-ocn936210041 |
|---|---|
| _version_ | 1816882337916387328 |
| adam_text | |
| any_adam_object | |
| author | Tompkins, Harland G. Hilfiker, James N. |
| author_GND | http://id.loc.gov/authorities/names/n84008686 |
| author_facet | Tompkins, Harland G. Hilfiker, James N. |
| author_role | aut aut |
| author_sort | Tompkins, Harland G. |
| author_variant | h g t hg hgt j n h jn jnh |
| building | Verbundindex |
| bvnumber | localFWS |
| callnumber-first | Q - Science |
| callnumber-label | QC443 |
| callnumber-raw | QC443 .T657 2016 |
| callnumber-search | QC443 .T657 2016 |
| callnumber-sort | QC 3443 T657 42016 |
| callnumber-subject | QC - Physics |
| collection | ZDB-4-EBA |
| contents | 1. Perspective, previous works, and purpose of this volume -- 1.1 Historical aspects -- 1.2 Focus of this book and target audience -- 1.3 Overview of topics. 2. Basic physical phenomena -- 2.1 The electromagnetic wave -- 2.2 Interactions between the electromagnetic wave and matter -- 2.3 Laws of reflection and refraction -- 2.4 Polarized light -- 2.5 The reflection and transmission of light -- 2.6 Measurement quantities. 3. Spectroscopic ellipsometry components and instrumentation -- 3.1 Components of a spectroscopic ellipsometer -- 3.2 Spectroscopic ellipsometers. 4. General data features -- 4.1 Spectra for substrates -- 4.2 Spectra for films on a substrate. 5. Representing optical functions -- 5.1 Tabulated list -- 5.2 Dispersion equations -- 5.3 The Cauchy equation, a dispersion equation for transparent regions -- 5.4 Oscillator models -- 5.5 B-spline. 6. Optical data analysis -- 6.1 Direct calculation: pseudo-optical constants -- 6.2 Data analysis, the problem -- 6.3 Data analysis, the approach. 7. Transparent thin films -- 7.1 Data features of transparent films -- 7.2 Fitting a transparent film with known index -- 7.3 Fitting a transparent film with an unknown index -- 7.4 Example: dielectric SiNx film on Si -- 7.5 Example: dielectric SiO2 film on glass. 8. Roughness -- 8.1 Macroscopic roughness -- 8.2 Microscopic roughness -- 8.3 Effective medium approximations -- 8.4 Rough film example. 9. Very thin films -- 9.1 Determining thickness with known optical functions -- 9.2 Determining optical constants of a very thin film -- 9.3 Distinguishing one film material from another. 10. Thin films with absorbing spectral regions -- 10.1 Selecting the transparent wavelength region -- 10.2 Models for the absorbing region -- 10.3 Example: amorphous Si on glass, using the oscillator method -- 10.4 Example: photoresist on Si, using the B-spline method. 11. Metallic films -- 11.1 Challenge of absorbing films -- 11.2 Strategies for absorbing films. 12. Multilayer thin film stacks -- 12.1 Multilayer strategies -- 12.2 Example: two layer organic stack, using "divide and conquer" -- 12.3 Example: high-low optical stack, using "coupling" -- References -- Index. |
| ctrlnum | (OCoLC)936210041 |
| dewey-full | 620.11295 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.11295 |
| dewey-search | 620.11295 |
| dewey-sort | 3620.11295 |
| dewey-tens | 620 - Engineering and allied operations |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>06528cam a2200853 i 4500</leader><controlfield tag="001">ZDB-4-EBA-ocn936210041</controlfield><controlfield tag="003">OCoLC</controlfield><controlfield tag="005">20241004212047.0</controlfield><controlfield tag="006">m eo d </controlfield><controlfield tag="007">cr cn||||m|||a</controlfield><controlfield tag="008">160127s2016 nyua foab 001 0 eng d</controlfield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">NYMPP</subfield><subfield code="b">eng</subfield><subfield code="e">rda</subfield><subfield code="e">pn</subfield><subfield code="c">NYMPP</subfield><subfield code="d">OCLCO</subfield><subfield code="d">IDEBK</subfield><subfield code="d">YDXCP</subfield><subfield code="d">EBLCP</subfield><subfield code="d">N$T</subfield><subfield code="d">CUY</subfield><subfield code="d">BTCTA</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">MERUC</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCF</subfield><subfield code="d">STF</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">G3B</subfield><subfield code="d">IGB</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCL</subfield><subfield code="d">OCLCQ</subfield></datafield><datafield tag="019" ind1=" " ind2=" "><subfield code="a">933336763</subfield><subfield code="a">933443522</subfield><subfield code="a">939264352</subfield><subfield code="a">967683287</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781606507285</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1606507281</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">9781606507278</subfield><subfield code="q">(print)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">1606507273</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)936210041</subfield><subfield code="z">(OCoLC)933336763</subfield><subfield code="z">(OCoLC)933443522</subfield><subfield code="z">(OCoLC)939264352</subfield><subfield code="z">(OCoLC)967683287</subfield></datafield><datafield tag="037" ind1=" " ind2=" "><subfield code="a">881144</subfield><subfield code="b">MIL</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">QC443</subfield><subfield code="b">.T657 2016</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">009000</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">035000</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="082" ind1="7" ind2=" "><subfield code="a">620.11295</subfield><subfield code="2">23</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">MAIN</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Tompkins, Harland G.,</subfield><subfield code="e">author.</subfield><subfield code="0">http://id.loc.gov/authorities/names/n84008686</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Spectroscopic ellipsometry :</subfield><subfield code="b">practical application to thin film characterization /</subfield><subfield code="c">Harland G. Tompkins and James N. Hilfiker.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York [New York] (222 East 46th Street, New York, NY 10017) :</subfield><subfield code="b">Momentum Press,</subfield><subfield code="c">2016.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (1 PDF (xxiii, 159 pages)) :</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">computer</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials characterization and analysis collection,</subfield><subfield code="x">2377-4355</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Title from PDF title page (viewed on January 27, 2016).</subfield></datafield><datafield tag="504" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references (pages 151-154) and index.</subfield></datafield><datafield tag="505" ind1="0" ind2=" "><subfield code="a">1. Perspective, previous works, and purpose of this volume -- 1.1 Historical aspects -- 1.2 Focus of this book and target audience -- 1.3 Overview of topics.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">2. Basic physical phenomena -- 2.1 The electromagnetic wave -- 2.2 Interactions between the electromagnetic wave and matter -- 2.3 Laws of reflection and refraction -- 2.4 Polarized light -- 2.5 The reflection and transmission of light -- 2.6 Measurement quantities.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">3. Spectroscopic ellipsometry components and instrumentation -- 3.1 Components of a spectroscopic ellipsometer -- 3.2 Spectroscopic ellipsometers.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">4. General data features -- 4.1 Spectra for substrates -- 4.2 Spectra for films on a substrate.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">5. Representing optical functions -- 5.1 Tabulated list -- 5.2 Dispersion equations -- 5.3 The Cauchy equation, a dispersion equation for transparent regions -- 5.4 Oscillator models -- 5.5 B-spline.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">6. Optical data analysis -- 6.1 Direct calculation: pseudo-optical constants -- 6.2 Data analysis, the problem -- 6.3 Data analysis, the approach.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">7. Transparent thin films -- 7.1 Data features of transparent films -- 7.2 Fitting a transparent film with known index -- 7.3 Fitting a transparent film with an unknown index -- 7.4 Example: dielectric SiNx film on Si -- 7.5 Example: dielectric SiO2 film on glass.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">8. Roughness -- 8.1 Macroscopic roughness -- 8.2 Microscopic roughness -- 8.3 Effective medium approximations -- 8.4 Rough film example.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">9. Very thin films -- 9.1 Determining thickness with known optical functions -- 9.2 Determining optical constants of a very thin film -- 9.3 Distinguishing one film material from another.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">10. Thin films with absorbing spectral regions -- 10.1 Selecting the transparent wavelength region -- 10.2 Models for the absorbing region -- 10.3 Example: amorphous Si on glass, using the oscillator method -- 10.4 Example: photoresist on Si, using the B-spline method.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">11. Metallic films -- 11.1 Challenge of absorbing films -- 11.2 Strategies for absorbing films.</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">12. Multilayer thin film stacks -- 12.1 Multilayer strategies -- 12.2 Example: two layer organic stack, using "divide and conquer" -- 12.3 Example: high-low optical stack, using "coupling" -- References -- Index.</subfield></datafield><datafield tag="520" ind1="3" ind2=" "><subfield code="a">Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Ellipsometry.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85042606</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Thin films</subfield><subfield code="x">Measurement.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Spectrum analysis</subfield><subfield code="x">Measurement.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Ellipsométrie.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Engineering (General)</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Reference.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Ellipsometry</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin films</subfield><subfield code="x">Measurement</subfield><subfield code="2">fast</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Cauchy equation</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">dispersion equations</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">ellipsometry</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">optical constants</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">polarized light</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">refractive index</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">thin film thickness</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hilfiker, James N.,</subfield><subfield code="e">author.</subfield></datafield><datafield tag="758" ind1=" " ind2=" "><subfield code="i">has work:</subfield><subfield code="a">Spectroscopic ellipsometry (Text)</subfield><subfield code="1">https://id.oclc.org/worldcat/entity/E39PCGMB8Wp9V7q6WdBqdwfH4q</subfield><subfield code="4">https://id.oclc.org/worldcat/ontology/hasWork</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Print version:</subfield><subfield code="z">9781606507278</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1124572</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="936" ind1=" " ind2=" "><subfield code="a">BATCHLOAD</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">Baker and Taylor</subfield><subfield code="b">BTCP</subfield><subfield code="n">BK0020447252</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ProQuest Ebook Central</subfield><subfield code="b">EBLB</subfield><subfield code="n">EBL4205920</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBSCOhost</subfield><subfield code="b">EBSC</subfield><subfield code="n">1124572</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ProQuest MyiLibrary Digital eBook Collection</subfield><subfield code="b">IDEB</subfield><subfield code="n">cis33393352</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">Momentum Press</subfield><subfield code="b">NYMP</subfield><subfield code="n">9781606507285</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">12756395</subfield></datafield><datafield tag="994" ind1=" " ind2=" "><subfield code="a">92</subfield><subfield code="b">GEBAY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-863</subfield></datafield></record></collection> |
| id | ZDB-4-EBA-ocn936210041 |
| illustrated | Illustrated |
| indexdate | 2024-11-27T13:27:01Z |
| institution | BVB |
| isbn | 9781606507285 1606507281 |
| issn | 2377-4355 |
| language | English |
| oclc_num | 936210041 |
| open_access_boolean | |
| owner | MAIN DE-863 DE-BY-FWS |
| owner_facet | MAIN DE-863 DE-BY-FWS |
| physical | 1 online resource (1 PDF (xxiii, 159 pages)) : illustrations |
| psigel | ZDB-4-EBA |
| publishDate | 2016 |
| publishDateSearch | 2016 |
| publishDateSort | 2016 |
| publisher | Momentum Press, |
| record_format | marc |
| series2 | Materials characterization and analysis collection, |
| spelling | Tompkins, Harland G., author. http://id.loc.gov/authorities/names/n84008686 Spectroscopic ellipsometry : practical application to thin film characterization / Harland G. Tompkins and James N. Hilfiker. New York [New York] (222 East 46th Street, New York, NY 10017) : Momentum Press, 2016. 1 online resource (1 PDF (xxiii, 159 pages)) : illustrations text txt rdacontent computer c rdamedia online resource cr rdacarrier Materials characterization and analysis collection, 2377-4355 Title from PDF title page (viewed on January 27, 2016). Includes bibliographical references (pages 151-154) and index. 1. Perspective, previous works, and purpose of this volume -- 1.1 Historical aspects -- 1.2 Focus of this book and target audience -- 1.3 Overview of topics. 2. Basic physical phenomena -- 2.1 The electromagnetic wave -- 2.2 Interactions between the electromagnetic wave and matter -- 2.3 Laws of reflection and refraction -- 2.4 Polarized light -- 2.5 The reflection and transmission of light -- 2.6 Measurement quantities. 3. Spectroscopic ellipsometry components and instrumentation -- 3.1 Components of a spectroscopic ellipsometer -- 3.2 Spectroscopic ellipsometers. 4. General data features -- 4.1 Spectra for substrates -- 4.2 Spectra for films on a substrate. 5. Representing optical functions -- 5.1 Tabulated list -- 5.2 Dispersion equations -- 5.3 The Cauchy equation, a dispersion equation for transparent regions -- 5.4 Oscillator models -- 5.5 B-spline. 6. Optical data analysis -- 6.1 Direct calculation: pseudo-optical constants -- 6.2 Data analysis, the problem -- 6.3 Data analysis, the approach. 7. Transparent thin films -- 7.1 Data features of transparent films -- 7.2 Fitting a transparent film with known index -- 7.3 Fitting a transparent film with an unknown index -- 7.4 Example: dielectric SiNx film on Si -- 7.5 Example: dielectric SiO2 film on glass. 8. Roughness -- 8.1 Macroscopic roughness -- 8.2 Microscopic roughness -- 8.3 Effective medium approximations -- 8.4 Rough film example. 9. Very thin films -- 9.1 Determining thickness with known optical functions -- 9.2 Determining optical constants of a very thin film -- 9.3 Distinguishing one film material from another. 10. Thin films with absorbing spectral regions -- 10.1 Selecting the transparent wavelength region -- 10.2 Models for the absorbing region -- 10.3 Example: amorphous Si on glass, using the oscillator method -- 10.4 Example: photoresist on Si, using the B-spline method. 11. Metallic films -- 11.1 Challenge of absorbing films -- 11.2 Strategies for absorbing films. 12. Multilayer thin film stacks -- 12.1 Multilayer strategies -- 12.2 Example: two layer organic stack, using "divide and conquer" -- 12.3 Example: high-low optical stack, using "coupling" -- References -- Index. Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself. Ellipsometry. http://id.loc.gov/authorities/subjects/sh85042606 Thin films Measurement. Spectrum analysis Measurement. Ellipsométrie. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Ellipsometry fast Thin films Measurement fast Cauchy equation dispersion equations ellipsometry optical constants polarized light refractive index thin film thickness Hilfiker, James N., author. has work: Spectroscopic ellipsometry (Text) https://id.oclc.org/worldcat/entity/E39PCGMB8Wp9V7q6WdBqdwfH4q https://id.oclc.org/worldcat/ontology/hasWork Print version: 9781606507278 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1124572 Volltext |
| spellingShingle | Tompkins, Harland G. Hilfiker, James N. Spectroscopic ellipsometry : practical application to thin film characterization / 1. Perspective, previous works, and purpose of this volume -- 1.1 Historical aspects -- 1.2 Focus of this book and target audience -- 1.3 Overview of topics. 2. Basic physical phenomena -- 2.1 The electromagnetic wave -- 2.2 Interactions between the electromagnetic wave and matter -- 2.3 Laws of reflection and refraction -- 2.4 Polarized light -- 2.5 The reflection and transmission of light -- 2.6 Measurement quantities. 3. Spectroscopic ellipsometry components and instrumentation -- 3.1 Components of a spectroscopic ellipsometer -- 3.2 Spectroscopic ellipsometers. 4. General data features -- 4.1 Spectra for substrates -- 4.2 Spectra for films on a substrate. 5. Representing optical functions -- 5.1 Tabulated list -- 5.2 Dispersion equations -- 5.3 The Cauchy equation, a dispersion equation for transparent regions -- 5.4 Oscillator models -- 5.5 B-spline. 6. Optical data analysis -- 6.1 Direct calculation: pseudo-optical constants -- 6.2 Data analysis, the problem -- 6.3 Data analysis, the approach. 7. Transparent thin films -- 7.1 Data features of transparent films -- 7.2 Fitting a transparent film with known index -- 7.3 Fitting a transparent film with an unknown index -- 7.4 Example: dielectric SiNx film on Si -- 7.5 Example: dielectric SiO2 film on glass. 8. Roughness -- 8.1 Macroscopic roughness -- 8.2 Microscopic roughness -- 8.3 Effective medium approximations -- 8.4 Rough film example. 9. Very thin films -- 9.1 Determining thickness with known optical functions -- 9.2 Determining optical constants of a very thin film -- 9.3 Distinguishing one film material from another. 10. Thin films with absorbing spectral regions -- 10.1 Selecting the transparent wavelength region -- 10.2 Models for the absorbing region -- 10.3 Example: amorphous Si on glass, using the oscillator method -- 10.4 Example: photoresist on Si, using the B-spline method. 11. Metallic films -- 11.1 Challenge of absorbing films -- 11.2 Strategies for absorbing films. 12. Multilayer thin film stacks -- 12.1 Multilayer strategies -- 12.2 Example: two layer organic stack, using "divide and conquer" -- 12.3 Example: high-low optical stack, using "coupling" -- References -- Index. Ellipsometry. http://id.loc.gov/authorities/subjects/sh85042606 Thin films Measurement. Spectrum analysis Measurement. Ellipsométrie. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Ellipsometry fast Thin films Measurement fast |
| subject_GND | http://id.loc.gov/authorities/subjects/sh85042606 |
| title | Spectroscopic ellipsometry : practical application to thin film characterization / |
| title_auth | Spectroscopic ellipsometry : practical application to thin film characterization / |
| title_exact_search | Spectroscopic ellipsometry : practical application to thin film characterization / |
| title_full | Spectroscopic ellipsometry : practical application to thin film characterization / Harland G. Tompkins and James N. Hilfiker. |
| title_fullStr | Spectroscopic ellipsometry : practical application to thin film characterization / Harland G. Tompkins and James N. Hilfiker. |
| title_full_unstemmed | Spectroscopic ellipsometry : practical application to thin film characterization / Harland G. Tompkins and James N. Hilfiker. |
| title_short | Spectroscopic ellipsometry : |
| title_sort | spectroscopic ellipsometry practical application to thin film characterization |
| title_sub | practical application to thin film characterization / |
| topic | Ellipsometry. http://id.loc.gov/authorities/subjects/sh85042606 Thin films Measurement. Spectrum analysis Measurement. Ellipsométrie. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Ellipsometry fast Thin films Measurement fast |
| topic_facet | Ellipsometry. Thin films Measurement. Spectrum analysis Measurement. Ellipsométrie. TECHNOLOGY & ENGINEERING Engineering (General) TECHNOLOGY & ENGINEERING Reference. Ellipsometry Thin films Measurement |
| url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1124572 |
| work_keys_str_mv | AT tompkinsharlandg spectroscopicellipsometrypracticalapplicationtothinfilmcharacterization AT hilfikerjamesn spectroscopicellipsometrypracticalapplicationtothinfilmcharacterization |