Auger electron spectroscopy :: practical application to materials analysis and characterization of surfaces, interfaces, and thin films /
Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detect...
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
New York [New York] (222 East 46th Street, New York, NY 10017) :
Momentum Press,
2015.
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| Schriftenreihe: | Materials characterization and analysis collection.
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| Online-Zugang: | Volltext |
| Zusammenfassung: | Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed. |
| Beschreibung: | Title from PDF title page (viewed on July 25, 2015). |
| Beschreibung: | 1 online resource (1 PDF (xxvi, 224 pages)) : illustrations |
| Bibliographie: | Includes bibliographical references and index. |
| ISBN: | 9781606506820 160650682X |
Internformat
MARC
| LEADER | 00000cam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | ZDB-4-EBA-ocn914432297 | ||
| 003 | OCoLC | ||
| 005 | 20241004212047.0 | ||
| 006 | m eo d | ||
| 007 | cr cn||||m|||a | ||
| 008 | 150725s2015 nyua foab 001 0 eng d | ||
| 040 | |a NYMPP |b eng |e rda |e pn |c NYMPP |d OCLCO |d IDEBK |d EBLCP |d YDXCP |d OCLCF |d N$T |d YDX |d OCLCQ |d MERUC |d STF |d LOA |d ZCU |d MOQ |d VT2 |d OCLCQ |d OCLCO |d WYU |d S8J |d S9I |d TKN |d D6H |d DKC |d AU@ |d OCLCQ |d UKAHL |d OCLCQ |d K6U |d OCLCQ |d BTN |d OCLCQ |d OCLCO |d OCLCL |d UEJ |d OCLCQ | ||
| 019 | |a 914190645 |a 968174150 | ||
| 020 | |a 9781606506820 |q (electronic bk.) | ||
| 020 | |a 160650682X |q (electronic bk.) | ||
| 020 | |z 9781606506813 |q (print) | ||
| 020 | |z 1606506811 | ||
| 035 | |a (OCoLC)914432297 |z (OCoLC)914190645 |z (OCoLC)968174150 | ||
| 037 | |a 813360 |b MIL | ||
| 050 | 4 | |a QC454.E4 |b W652 2015 | |
| 072 | 7 | |a SCI |x 053000 |2 bisacsh | |
| 082 | 7 | |a 535.3325 |2 23 | |
| 049 | |a MAIN | ||
| 100 | 1 | |a Wolstenholme, John, |e author. | |
| 245 | 1 | 0 | |a Auger electron spectroscopy : |b practical application to materials analysis and characterization of surfaces, interfaces, and thin films / |c John Wolstenholme. |
| 264 | 1 | |a New York [New York] (222 East 46th Street, New York, NY 10017) : |b Momentum Press, |c 2015. | |
| 300 | |a 1 online resource (1 PDF (xxvi, 224 pages)) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a electronic |2 isbdmedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials characterization and analysis collection | |
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a 1. Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index. | |
| 520 | 3 | |a Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed. | |
| 500 | |a Title from PDF title page (viewed on July 25, 2015). | ||
| 650 | 0 | |a Auger electron spectroscopy. |0 http://id.loc.gov/authorities/subjects/sh2005007340 | |
| 650 | 7 | |a SCIENCE |x Physics |x Optics & Light. |2 bisacsh | |
| 650 | 7 | |a Auger electron spectroscopy |2 fast | |
| 653 | |a analytical methods | ||
| 653 | |a Auger electron spectroscopy (AES) | ||
| 653 | |a Auger spectrometers | ||
| 653 | |a chemical imaging | ||
| 653 | |a depth profiling | ||
| 653 | |a energy analyzer | ||
| 653 | |a interface analysis | ||
| 653 | |a materials analysis | ||
| 653 | |a microanalysis | ||
| 653 | |a nanoanalysis | ||
| 653 | |a scanning Auger microscopy (SAM) | ||
| 653 | |a secondary electron microscopy | ||
| 653 | |a spectrometer | ||
| 653 | |a surface analysis | ||
| 653 | |a surface sensitive | ||
| 653 | |a surface specific | ||
| 653 | |a thin film analysis | ||
| 653 | |a ultrahigh vacuum | ||
| 758 | |i has work: |a Auger electron spectroscopy (Text) |1 https://id.oclc.org/worldcat/entity/E39PCFrkQX7PdYwC4TWyfCYWwC |4 https://id.oclc.org/worldcat/ontology/hasWork | ||
| 776 | 0 | 8 | |i Print version: |z 9781606506813 |
| 830 | 0 | |a Materials characterization and analysis collection. |0 http://id.loc.gov/authorities/names/no2018013025 | |
| 856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1030107 |3 Volltext |
| 936 | |a BATCHLOAD | ||
| 938 | |a Askews and Holts Library Services |b ASKH |n AH34378927 | ||
| 938 | |a ProQuest Ebook Central |b EBLB |n EBL2095627 | ||
| 938 | |a EBSCOhost |b EBSC |n 1030107 | ||
| 938 | |a ProQuest MyiLibrary Digital eBook Collection |b IDEB |n cis32071131 | ||
| 938 | |a Momentum Press |b NYMP |n 9781606506820 | ||
| 938 | |a YBP Library Services |b YANK |n 12535292 | ||
| 994 | |a 92 |b GEBAY | ||
| 912 | |a ZDB-4-EBA | ||
| 049 | |a DE-863 | ||
Datensatz im Suchindex
| DE-BY-FWS_katkey | ZDB-4-EBA-ocn914432297 |
|---|---|
| _version_ | 1816882318883684352 |
| adam_text | |
| any_adam_object | |
| author | Wolstenholme, John |
| author_facet | Wolstenholme, John |
| author_role | aut |
| author_sort | Wolstenholme, John |
| author_variant | j w jw |
| building | Verbundindex |
| bvnumber | localFWS |
| callnumber-first | Q - Science |
| callnumber-label | QC454 |
| callnumber-raw | QC454.E4 W652 2015 |
| callnumber-search | QC454.E4 W652 2015 |
| callnumber-sort | QC 3454 E4 W652 42015 |
| callnumber-subject | QC - Physics |
| collection | ZDB-4-EBA |
| contents | 1. Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index. |
| ctrlnum | (OCoLC)914432297 |
| dewey-full | 535.3325 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 535 - Light and related radiation |
| dewey-raw | 535.3325 |
| dewey-search | 535.3325 |
| dewey-sort | 3535.3325 |
| dewey-tens | 530 - Physics |
| discipline | Physik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>05618cam a2200781 i 4500</leader><controlfield tag="001">ZDB-4-EBA-ocn914432297</controlfield><controlfield tag="003">OCoLC</controlfield><controlfield tag="005">20241004212047.0</controlfield><controlfield tag="006">m eo d </controlfield><controlfield tag="007">cr cn||||m|||a</controlfield><controlfield tag="008">150725s2015 nyua foab 001 0 eng d</controlfield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">NYMPP</subfield><subfield code="b">eng</subfield><subfield code="e">rda</subfield><subfield code="e">pn</subfield><subfield code="c">NYMPP</subfield><subfield code="d">OCLCO</subfield><subfield code="d">IDEBK</subfield><subfield code="d">EBLCP</subfield><subfield code="d">YDXCP</subfield><subfield code="d">OCLCF</subfield><subfield code="d">N$T</subfield><subfield code="d">YDX</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">MERUC</subfield><subfield code="d">STF</subfield><subfield code="d">LOA</subfield><subfield code="d">ZCU</subfield><subfield code="d">MOQ</subfield><subfield code="d">VT2</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">WYU</subfield><subfield code="d">S8J</subfield><subfield code="d">S9I</subfield><subfield code="d">TKN</subfield><subfield code="d">D6H</subfield><subfield code="d">DKC</subfield><subfield code="d">AU@</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">UKAHL</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">K6U</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">BTN</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCL</subfield><subfield code="d">UEJ</subfield><subfield code="d">OCLCQ</subfield></datafield><datafield tag="019" ind1=" " ind2=" "><subfield code="a">914190645</subfield><subfield code="a">968174150</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781606506820</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">160650682X</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">9781606506813</subfield><subfield code="q">(print)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">1606506811</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)914432297</subfield><subfield code="z">(OCoLC)914190645</subfield><subfield code="z">(OCoLC)968174150</subfield></datafield><datafield tag="037" ind1=" " ind2=" "><subfield code="a">813360</subfield><subfield code="b">MIL</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">QC454.E4</subfield><subfield code="b">W652 2015</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">SCI</subfield><subfield code="x">053000</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="082" ind1="7" ind2=" "><subfield code="a">535.3325</subfield><subfield code="2">23</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">MAIN</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Wolstenholme, John,</subfield><subfield code="e">author.</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Auger electron spectroscopy :</subfield><subfield code="b">practical application to materials analysis and characterization of surfaces, interfaces, and thin films /</subfield><subfield code="c">John Wolstenholme.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York [New York] (222 East 46th Street, New York, NY 10017) :</subfield><subfield code="b">Momentum Press,</subfield><subfield code="c">2015.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (1 PDF (xxvi, 224 pages)) :</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">electronic</subfield><subfield code="2">isbdmedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Materials characterization and analysis collection</subfield></datafield><datafield tag="504" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index.</subfield></datafield><datafield tag="505" ind1="0" ind2=" "><subfield code="a">1. Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index.</subfield></datafield><datafield tag="520" ind1="3" ind2=" "><subfield code="a">Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed.</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Title from PDF title page (viewed on July 25, 2015).</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Auger electron spectroscopy.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh2005007340</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">SCIENCE</subfield><subfield code="x">Physics</subfield><subfield code="x">Optics & Light.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Auger electron spectroscopy</subfield><subfield code="2">fast</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">analytical methods</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Auger electron spectroscopy (AES)</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Auger spectrometers</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">chemical imaging</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">depth profiling</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">energy analyzer</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">interface analysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">materials analysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">microanalysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">nanoanalysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">scanning Auger microscopy (SAM)</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">secondary electron microscopy</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">spectrometer</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">surface analysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">surface sensitive</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">surface specific</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">thin film analysis</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">ultrahigh vacuum</subfield></datafield><datafield tag="758" ind1=" " ind2=" "><subfield code="i">has work:</subfield><subfield code="a">Auger electron spectroscopy (Text)</subfield><subfield code="1">https://id.oclc.org/worldcat/entity/E39PCFrkQX7PdYwC4TWyfCYWwC</subfield><subfield code="4">https://id.oclc.org/worldcat/ontology/hasWork</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Print version:</subfield><subfield code="z">9781606506813</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Materials characterization and analysis collection.</subfield><subfield code="0">http://id.loc.gov/authorities/names/no2018013025</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1030107</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="936" ind1=" " ind2=" "><subfield code="a">BATCHLOAD</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">Askews and Holts Library Services</subfield><subfield code="b">ASKH</subfield><subfield code="n">AH34378927</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ProQuest Ebook Central</subfield><subfield code="b">EBLB</subfield><subfield code="n">EBL2095627</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBSCOhost</subfield><subfield code="b">EBSC</subfield><subfield code="n">1030107</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ProQuest MyiLibrary Digital eBook Collection</subfield><subfield code="b">IDEB</subfield><subfield code="n">cis32071131</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">Momentum Press</subfield><subfield code="b">NYMP</subfield><subfield code="n">9781606506820</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">12535292</subfield></datafield><datafield tag="994" ind1=" " ind2=" "><subfield code="a">92</subfield><subfield code="b">GEBAY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-863</subfield></datafield></record></collection> |
| id | ZDB-4-EBA-ocn914432297 |
| illustrated | Illustrated |
| indexdate | 2024-11-27T13:26:43Z |
| institution | BVB |
| isbn | 9781606506820 160650682X |
| language | English |
| oclc_num | 914432297 |
| open_access_boolean | |
| owner | MAIN DE-863 DE-BY-FWS |
| owner_facet | MAIN DE-863 DE-BY-FWS |
| physical | 1 online resource (1 PDF (xxvi, 224 pages)) : illustrations |
| psigel | ZDB-4-EBA |
| publishDate | 2015 |
| publishDateSearch | 2015 |
| publishDateSort | 2015 |
| publisher | Momentum Press, |
| record_format | marc |
| series | Materials characterization and analysis collection. |
| series2 | Materials characterization and analysis collection |
| spelling | Wolstenholme, John, author. Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / John Wolstenholme. New York [New York] (222 East 46th Street, New York, NY 10017) : Momentum Press, 2015. 1 online resource (1 PDF (xxvi, 224 pages)) : illustrations text txt rdacontent electronic isbdmedia online resource cr rdacarrier Materials characterization and analysis collection Includes bibliographical references and index. 1. Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index. Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed. Title from PDF title page (viewed on July 25, 2015). Auger electron spectroscopy. http://id.loc.gov/authorities/subjects/sh2005007340 SCIENCE Physics Optics & Light. bisacsh Auger electron spectroscopy fast analytical methods Auger electron spectroscopy (AES) Auger spectrometers chemical imaging depth profiling energy analyzer interface analysis materials analysis microanalysis nanoanalysis scanning Auger microscopy (SAM) secondary electron microscopy spectrometer surface analysis surface sensitive surface specific thin film analysis ultrahigh vacuum has work: Auger electron spectroscopy (Text) https://id.oclc.org/worldcat/entity/E39PCFrkQX7PdYwC4TWyfCYWwC https://id.oclc.org/worldcat/ontology/hasWork Print version: 9781606506813 Materials characterization and analysis collection. http://id.loc.gov/authorities/names/no2018013025 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1030107 Volltext |
| spellingShingle | Wolstenholme, John Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / Materials characterization and analysis collection. 1. Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index. Auger electron spectroscopy. http://id.loc.gov/authorities/subjects/sh2005007340 SCIENCE Physics Optics & Light. bisacsh Auger electron spectroscopy fast |
| subject_GND | http://id.loc.gov/authorities/subjects/sh2005007340 |
| title | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / |
| title_auth | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / |
| title_exact_search | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / |
| title_full | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / John Wolstenholme. |
| title_fullStr | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / John Wolstenholme. |
| title_full_unstemmed | Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films / John Wolstenholme. |
| title_short | Auger electron spectroscopy : |
| title_sort | auger electron spectroscopy practical application to materials analysis and characterization of surfaces interfaces and thin films |
| title_sub | practical application to materials analysis and characterization of surfaces, interfaces, and thin films / |
| topic | Auger electron spectroscopy. http://id.loc.gov/authorities/subjects/sh2005007340 SCIENCE Physics Optics & Light. bisacsh Auger electron spectroscopy fast |
| topic_facet | Auger electron spectroscopy. SCIENCE Physics Optics & Light. Auger electron spectroscopy |
| url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=1030107 |
| work_keys_str_mv | AT wolstenholmejohn augerelectronspectroscopypracticalapplicationtomaterialsanalysisandcharacterizationofsurfacesinterfacesandthinfilms |