Interfacial phenomena and colloid stability.: basic principles / Volume 1 :
Interfacial Phenomena and Colloid Stability deals with the fundamental aspects of interfacial phenomena, which form the basis of applications of interface and colloid science to various disperse systems. These include suspensions, emulsions, nano-dispersions, wetting, spreading, deposition and adhes...
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Berlin, Germany ; Boston, Massachusetts :
De Gruyter,
2015.
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Schriftenreihe: | Interfacial Phenomena and Colloid Stability
|
Schlagworte: | |
Online-Zugang: | Volltext |
Zusammenfassung: | Interfacial Phenomena and Colloid Stability deals with the fundamental aspects of interfacial phenomena, which form the basis of applications of interface and colloid science to various disperse systems. These include suspensions, emulsions, nano-dispersions, wetting, spreading, deposition and adhesion of particles to surfaces. This book is valuable for research scientists and PhDs. investigating various aspects of interface and colloid science. |
Beschreibung: | 1 online resource (358 pages) : illustrations, graphs. |
Bibliographie: | Includes bibliographical references at the end of each chapters and index. |
ISBN: | 9783110283433 3110283433 9781680157659 1680157655 3110283409 9783110283402 3110388529 9783110388527 |
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100 | 1 | |a Tadros, Tharwat F., |d 1937- |e author. |1 https://id.oclc.org/worldcat/entity/E39PBJkp8mHt49m4tkRXt3yfMP |0 http://id.loc.gov/authorities/names/n82094357 | |
245 | 1 | 0 | |a Interfacial phenomena and colloid stability. |n Volume 1 : |b basic principles / |c Tharwat F. Tadros. |
264 | 1 | |a Berlin, Germany ; |a Boston, Massachusetts : |b De Gruyter, |c 2015. | |
264 | 4 | |c ©2015 | |
300 | |a 1 online resource (358 pages) : |b illustrations, graphs. | ||
336 | |a text |b txt |2 rdacontent | ||
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338 | |a online resource |b cr |2 rdacarrier | ||
490 | 0 | |a Interfacial Phenomena and Colloid Stability | |
504 | |a Includes bibliographical references at the end of each chapters and index. | ||
588 | 0 | |a Print version record. | |
505 | 0 | |a Preface; Contents; 1. General introduction; 1.1 Definition of the interfacial region and interfacial tension; 1.2 Role of interfacial phenomena; 1.3 Outline of the book; 2. Origin of charge at interfaces: Structure of the electrical double layer; 2.1 Origin of charge on surfaces; 2.1.1 Surface ions; 2.1.2 Ionization of surface groups; 2.1.3 Isomorphic substitution; 2.1.4 Specific adsorption of ions; 2.2 Structure of the electrical double layer; 2.2.1 Diffuse double layer (Gouy and Chapman); 2.2.2 Stern-Grahame model of the double layer; 2.2.3 Capacitance of the double layer. | |
505 | 8 | |a 2.2.4 Double layer investigation3. Electrokinetic phenomena and zeta potential; 3.1 Stern-Grahame model of the double layer; 3.1.1 Calculation of zeta potential from particle mobility; 3.1.2 Measurement of electrophoretic mobility and zeta potential; 4. Van der Waals attraction; 4.1 Introduction; 4.2 Intermolecular attraction between atoms or molecules; 4.2.1 Dipole-dipole interaction (Keesom-van der Waals interaction); 4.2.2 Dipole-induced dipole interaction (Debye-van der Waals Interaction); 4.2.3 London-van der Waals interaction (dispersion interaction). | |
505 | 8 | |a 4.2.4 General approach for the van der Waals attraction4.2.5 Hydrogen bonding; 4.2.6 Hydrophobic (bonding) interaction; 4.2.7 Van der Waals attraction of macroscopic bodies; 4.2.8 Medium effect on van der Waals attraction; 4.2.9 Retardation effect; 4.2.10 Direct measurement of van de Waals attraction between macroscopic bodies; 5. Double layer repulsion; 5.1 Introduction; 5.2 Interaction between similar and dissimilar flat plates; 5.3 Calculation of electrostatic interaction using the Gibbs energy concept; 5.4 Charge and potential distribution; 5.5 Interaction between spherical particles. | |
505 | 8 | |a 5.6 Effect of increasing electrolyte concentration, valency of counterions and Stern potential5.7 Effect of particle concentration; 6. Combination of double layer repulsion and van der Waals attraction theory of colloid stability; 6.1 Introduction; 6.2 Stability of charge stabilized systems. Theory of colloid stability of hydrophobic colloids: Deryaguin-Landau-Verwey-Overbeek (DLVO) theory; 6.3 Mechanism of aggregation; 6.4 Kinetics of flocculation of dispersions; 6.4.1 Diffusion limited aggregation (fast flocculation kinetics); 6.4.2 Potential limited aggregation (slow flocculation kinetics). | |
505 | 8 | |a 6.4.3 Weak (reversible) flocculation6.4.4 Orthokinetic flocculation; 6.4.5 Aggregate structure; 6.5 Influence of particle number concentration; 6.6 States of suspension on standing; 6.7 Sedimentation of suspensions and its prevention; 6.7.1 Sedimentation rate of suspensions; 6.7.2 Prevention of sedimentation and formation of dilatant sediments; 7. The liquid/liquid interface and surfactant adsorption; 7.1 Introduction; 7.2 Surfactant adsorption; 7.2.1 The Gibbs adsorption isotherm; 7.2.2 Equation of state approach; 7.2.3 The Langmuir, Szyszkowski and Frumkin equations. | |
520 | |a Interfacial Phenomena and Colloid Stability deals with the fundamental aspects of interfacial phenomena, which form the basis of applications of interface and colloid science to various disperse systems. These include suspensions, emulsions, nano-dispersions, wetting, spreading, deposition and adhesion of particles to surfaces. This book is valuable for research scientists and PhDs. investigating various aspects of interface and colloid science. | ||
650 | 0 | |a Surfaces (Technology) |x Analysis. |0 http://id.loc.gov/authorities/subjects/sh85130751 | |
650 | 0 | |a Solid-liquid interfaces. |0 http://id.loc.gov/authorities/subjects/sh95002691 | |
650 | 0 | |a Chemistry, Technical. |0 http://id.loc.gov/authorities/subjects/sh85023029 | |
650 | 0 | |a Colloids |x Industrial applications. | |
650 | 6 | |a Surfaces (Technologie) |x Analyse. | |
650 | 6 | |a Interfaces solide-liquide. | |
650 | 6 | |a Chimie industrielle. | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Engineering (General) |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Reference. |2 bisacsh | |
650 | 7 | |a Chemistry, Technical |2 fast | |
650 | 7 | |a Colloids |x Industrial applications |2 fast | |
650 | 7 | |a Solid-liquid interfaces |2 fast | |
650 | 7 | |a Surfaces (Technology) |x Analysis |2 fast | |
650 | 7 | |a Chemical & Materials Engineering. |2 hilcc | |
650 | 7 | |a Engineering & Applied Sciences. |2 hilcc | |
650 | 7 | |a Chemical Engineering. |2 hilcc | |
776 | 0 | 8 | |i Print version: |a Tadros, Tharwat F., 1937- |t Interfacial phenomena and colloid stability. Volume 1. |d Berlin, Germany ; Boston, Massachusetts : De Gruyter, ©2015 |h xvi, 342 pages |z 9783110283402 |
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author | Tadros, Tharwat F., 1937- |
author_GND | http://id.loc.gov/authorities/names/n82094357 |
author_facet | Tadros, Tharwat F., 1937- |
author_role | aut |
author_sort | Tadros, Tharwat F., 1937- |
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collection | ZDB-4-EBA |
contents | Preface; Contents; 1. General introduction; 1.1 Definition of the interfacial region and interfacial tension; 1.2 Role of interfacial phenomena; 1.3 Outline of the book; 2. Origin of charge at interfaces: Structure of the electrical double layer; 2.1 Origin of charge on surfaces; 2.1.1 Surface ions; 2.1.2 Ionization of surface groups; 2.1.3 Isomorphic substitution; 2.1.4 Specific adsorption of ions; 2.2 Structure of the electrical double layer; 2.2.1 Diffuse double layer (Gouy and Chapman); 2.2.2 Stern-Grahame model of the double layer; 2.2.3 Capacitance of the double layer. 2.2.4 Double layer investigation3. Electrokinetic phenomena and zeta potential; 3.1 Stern-Grahame model of the double layer; 3.1.1 Calculation of zeta potential from particle mobility; 3.1.2 Measurement of electrophoretic mobility and zeta potential; 4. Van der Waals attraction; 4.1 Introduction; 4.2 Intermolecular attraction between atoms or molecules; 4.2.1 Dipole-dipole interaction (Keesom-van der Waals interaction); 4.2.2 Dipole-induced dipole interaction (Debye-van der Waals Interaction); 4.2.3 London-van der Waals interaction (dispersion interaction). 4.2.4 General approach for the van der Waals attraction4.2.5 Hydrogen bonding; 4.2.6 Hydrophobic (bonding) interaction; 4.2.7 Van der Waals attraction of macroscopic bodies; 4.2.8 Medium effect on van der Waals attraction; 4.2.9 Retardation effect; 4.2.10 Direct measurement of van de Waals attraction between macroscopic bodies; 5. Double layer repulsion; 5.1 Introduction; 5.2 Interaction between similar and dissimilar flat plates; 5.3 Calculation of electrostatic interaction using the Gibbs energy concept; 5.4 Charge and potential distribution; 5.5 Interaction between spherical particles. 5.6 Effect of increasing electrolyte concentration, valency of counterions and Stern potential5.7 Effect of particle concentration; 6. Combination of double layer repulsion and van der Waals attraction theory of colloid stability; 6.1 Introduction; 6.2 Stability of charge stabilized systems. Theory of colloid stability of hydrophobic colloids: Deryaguin-Landau-Verwey-Overbeek (DLVO) theory; 6.3 Mechanism of aggregation; 6.4 Kinetics of flocculation of dispersions; 6.4.1 Diffusion limited aggregation (fast flocculation kinetics); 6.4.2 Potential limited aggregation (slow flocculation kinetics). 6.4.3 Weak (reversible) flocculation6.4.4 Orthokinetic flocculation; 6.4.5 Aggregate structure; 6.5 Influence of particle number concentration; 6.6 States of suspension on standing; 6.7 Sedimentation of suspensions and its prevention; 6.7.1 Sedimentation rate of suspensions; 6.7.2 Prevention of sedimentation and formation of dilatant sediments; 7. The liquid/liquid interface and surfactant adsorption; 7.1 Introduction; 7.2 Surfactant adsorption; 7.2.1 The Gibbs adsorption isotherm; 7.2.2 Equation of state approach; 7.2.3 The Langmuir, Szyszkowski and Frumkin equations. |
ctrlnum | (OCoLC)912323210 |
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format | Electronic eBook |
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Theory of colloid stability of hydrophobic colloids: Deryaguin-Landau-Verwey-Overbeek (DLVO) theory; 6.3 Mechanism of aggregation; 6.4 Kinetics of flocculation of dispersions; 6.4.1 Diffusion limited aggregation (fast flocculation kinetics); 6.4.2 Potential limited aggregation (slow flocculation kinetics).</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">6.4.3 Weak (reversible) flocculation6.4.4 Orthokinetic flocculation; 6.4.5 Aggregate structure; 6.5 Influence of particle number concentration; 6.6 States of suspension on standing; 6.7 Sedimentation of suspensions and its prevention; 6.7.1 Sedimentation rate of suspensions; 6.7.2 Prevention of sedimentation and formation of dilatant sediments; 7. The liquid/liquid interface and surfactant adsorption; 7.1 Introduction; 7.2 Surfactant adsorption; 7.2.1 The Gibbs adsorption isotherm; 7.2.2 Equation of state approach; 7.2.3 The Langmuir, Szyszkowski and Frumkin equations.</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Interfacial Phenomena and Colloid Stability deals with the fundamental aspects of interfacial phenomena, which form the basis of applications of interface and colloid science to various disperse systems. These include suspensions, emulsions, nano-dispersions, wetting, spreading, deposition and adhesion of particles to surfaces. 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id | ZDB-4-EBA-ocn912323210 |
illustrated | Illustrated |
indexdate | 2024-11-27T13:26:41Z |
institution | BVB |
isbn | 9783110283433 3110283433 9781680157659 1680157655 3110283409 9783110283402 3110388529 9783110388527 |
language | English |
oclc_num | 912323210 |
open_access_boolean | |
owner | MAIN DE-863 DE-BY-FWS |
owner_facet | MAIN DE-863 DE-BY-FWS |
physical | 1 online resource (358 pages) : illustrations, graphs. |
psigel | ZDB-4-EBA |
publishDate | 2015 |
publishDateSearch | 2015 |
publishDateSort | 2015 |
publisher | De Gruyter, |
record_format | marc |
series2 | Interfacial Phenomena and Colloid Stability |
spelling | Tadros, Tharwat F., 1937- author. https://id.oclc.org/worldcat/entity/E39PBJkp8mHt49m4tkRXt3yfMP http://id.loc.gov/authorities/names/n82094357 Interfacial phenomena and colloid stability. Volume 1 : basic principles / Tharwat F. Tadros. Berlin, Germany ; Boston, Massachusetts : De Gruyter, 2015. ©2015 1 online resource (358 pages) : illustrations, graphs. text txt rdacontent computer c rdamedia online resource cr rdacarrier Interfacial Phenomena and Colloid Stability Includes bibliographical references at the end of each chapters and index. Print version record. Preface; Contents; 1. General introduction; 1.1 Definition of the interfacial region and interfacial tension; 1.2 Role of interfacial phenomena; 1.3 Outline of the book; 2. Origin of charge at interfaces: Structure of the electrical double layer; 2.1 Origin of charge on surfaces; 2.1.1 Surface ions; 2.1.2 Ionization of surface groups; 2.1.3 Isomorphic substitution; 2.1.4 Specific adsorption of ions; 2.2 Structure of the electrical double layer; 2.2.1 Diffuse double layer (Gouy and Chapman); 2.2.2 Stern-Grahame model of the double layer; 2.2.3 Capacitance of the double layer. 2.2.4 Double layer investigation3. Electrokinetic phenomena and zeta potential; 3.1 Stern-Grahame model of the double layer; 3.1.1 Calculation of zeta potential from particle mobility; 3.1.2 Measurement of electrophoretic mobility and zeta potential; 4. Van der Waals attraction; 4.1 Introduction; 4.2 Intermolecular attraction between atoms or molecules; 4.2.1 Dipole-dipole interaction (Keesom-van der Waals interaction); 4.2.2 Dipole-induced dipole interaction (Debye-van der Waals Interaction); 4.2.3 London-van der Waals interaction (dispersion interaction). 4.2.4 General approach for the van der Waals attraction4.2.5 Hydrogen bonding; 4.2.6 Hydrophobic (bonding) interaction; 4.2.7 Van der Waals attraction of macroscopic bodies; 4.2.8 Medium effect on van der Waals attraction; 4.2.9 Retardation effect; 4.2.10 Direct measurement of van de Waals attraction between macroscopic bodies; 5. Double layer repulsion; 5.1 Introduction; 5.2 Interaction between similar and dissimilar flat plates; 5.3 Calculation of electrostatic interaction using the Gibbs energy concept; 5.4 Charge and potential distribution; 5.5 Interaction between spherical particles. 5.6 Effect of increasing electrolyte concentration, valency of counterions and Stern potential5.7 Effect of particle concentration; 6. Combination of double layer repulsion and van der Waals attraction theory of colloid stability; 6.1 Introduction; 6.2 Stability of charge stabilized systems. Theory of colloid stability of hydrophobic colloids: Deryaguin-Landau-Verwey-Overbeek (DLVO) theory; 6.3 Mechanism of aggregation; 6.4 Kinetics of flocculation of dispersions; 6.4.1 Diffusion limited aggregation (fast flocculation kinetics); 6.4.2 Potential limited aggregation (slow flocculation kinetics). 6.4.3 Weak (reversible) flocculation6.4.4 Orthokinetic flocculation; 6.4.5 Aggregate structure; 6.5 Influence of particle number concentration; 6.6 States of suspension on standing; 6.7 Sedimentation of suspensions and its prevention; 6.7.1 Sedimentation rate of suspensions; 6.7.2 Prevention of sedimentation and formation of dilatant sediments; 7. The liquid/liquid interface and surfactant adsorption; 7.1 Introduction; 7.2 Surfactant adsorption; 7.2.1 The Gibbs adsorption isotherm; 7.2.2 Equation of state approach; 7.2.3 The Langmuir, Szyszkowski and Frumkin equations. Interfacial Phenomena and Colloid Stability deals with the fundamental aspects of interfacial phenomena, which form the basis of applications of interface and colloid science to various disperse systems. These include suspensions, emulsions, nano-dispersions, wetting, spreading, deposition and adhesion of particles to surfaces. This book is valuable for research scientists and PhDs. investigating various aspects of interface and colloid science. Surfaces (Technology) Analysis. http://id.loc.gov/authorities/subjects/sh85130751 Solid-liquid interfaces. http://id.loc.gov/authorities/subjects/sh95002691 Chemistry, Technical. http://id.loc.gov/authorities/subjects/sh85023029 Colloids Industrial applications. Surfaces (Technologie) Analyse. Interfaces solide-liquide. Chimie industrielle. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Chemistry, Technical fast Colloids Industrial applications fast Solid-liquid interfaces fast Surfaces (Technology) Analysis fast Chemical & Materials Engineering. hilcc Engineering & Applied Sciences. hilcc Chemical Engineering. hilcc Print version: Tadros, Tharwat F., 1937- Interfacial phenomena and colloid stability. Volume 1. Berlin, Germany ; Boston, Massachusetts : De Gruyter, ©2015 xvi, 342 pages 9783110283402 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=999657 Volltext |
spellingShingle | Tadros, Tharwat F., 1937- Interfacial phenomena and colloid stability. basic principles / Preface; Contents; 1. General introduction; 1.1 Definition of the interfacial region and interfacial tension; 1.2 Role of interfacial phenomena; 1.3 Outline of the book; 2. Origin of charge at interfaces: Structure of the electrical double layer; 2.1 Origin of charge on surfaces; 2.1.1 Surface ions; 2.1.2 Ionization of surface groups; 2.1.3 Isomorphic substitution; 2.1.4 Specific adsorption of ions; 2.2 Structure of the electrical double layer; 2.2.1 Diffuse double layer (Gouy and Chapman); 2.2.2 Stern-Grahame model of the double layer; 2.2.3 Capacitance of the double layer. 2.2.4 Double layer investigation3. Electrokinetic phenomena and zeta potential; 3.1 Stern-Grahame model of the double layer; 3.1.1 Calculation of zeta potential from particle mobility; 3.1.2 Measurement of electrophoretic mobility and zeta potential; 4. Van der Waals attraction; 4.1 Introduction; 4.2 Intermolecular attraction between atoms or molecules; 4.2.1 Dipole-dipole interaction (Keesom-van der Waals interaction); 4.2.2 Dipole-induced dipole interaction (Debye-van der Waals Interaction); 4.2.3 London-van der Waals interaction (dispersion interaction). 4.2.4 General approach for the van der Waals attraction4.2.5 Hydrogen bonding; 4.2.6 Hydrophobic (bonding) interaction; 4.2.7 Van der Waals attraction of macroscopic bodies; 4.2.8 Medium effect on van der Waals attraction; 4.2.9 Retardation effect; 4.2.10 Direct measurement of van de Waals attraction between macroscopic bodies; 5. Double layer repulsion; 5.1 Introduction; 5.2 Interaction between similar and dissimilar flat plates; 5.3 Calculation of electrostatic interaction using the Gibbs energy concept; 5.4 Charge and potential distribution; 5.5 Interaction between spherical particles. 5.6 Effect of increasing electrolyte concentration, valency of counterions and Stern potential5.7 Effect of particle concentration; 6. Combination of double layer repulsion and van der Waals attraction theory of colloid stability; 6.1 Introduction; 6.2 Stability of charge stabilized systems. Theory of colloid stability of hydrophobic colloids: Deryaguin-Landau-Verwey-Overbeek (DLVO) theory; 6.3 Mechanism of aggregation; 6.4 Kinetics of flocculation of dispersions; 6.4.1 Diffusion limited aggregation (fast flocculation kinetics); 6.4.2 Potential limited aggregation (slow flocculation kinetics). 6.4.3 Weak (reversible) flocculation6.4.4 Orthokinetic flocculation; 6.4.5 Aggregate structure; 6.5 Influence of particle number concentration; 6.6 States of suspension on standing; 6.7 Sedimentation of suspensions and its prevention; 6.7.1 Sedimentation rate of suspensions; 6.7.2 Prevention of sedimentation and formation of dilatant sediments; 7. The liquid/liquid interface and surfactant adsorption; 7.1 Introduction; 7.2 Surfactant adsorption; 7.2.1 The Gibbs adsorption isotherm; 7.2.2 Equation of state approach; 7.2.3 The Langmuir, Szyszkowski and Frumkin equations. Surfaces (Technology) Analysis. http://id.loc.gov/authorities/subjects/sh85130751 Solid-liquid interfaces. http://id.loc.gov/authorities/subjects/sh95002691 Chemistry, Technical. http://id.loc.gov/authorities/subjects/sh85023029 Colloids Industrial applications. Surfaces (Technologie) Analyse. Interfaces solide-liquide. Chimie industrielle. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Chemistry, Technical fast Colloids Industrial applications fast Solid-liquid interfaces fast Surfaces (Technology) Analysis fast Chemical & Materials Engineering. hilcc Engineering & Applied Sciences. hilcc Chemical Engineering. hilcc |
subject_GND | http://id.loc.gov/authorities/subjects/sh85130751 http://id.loc.gov/authorities/subjects/sh95002691 http://id.loc.gov/authorities/subjects/sh85023029 |
title | Interfacial phenomena and colloid stability. basic principles / |
title_auth | Interfacial phenomena and colloid stability. basic principles / |
title_exact_search | Interfacial phenomena and colloid stability. basic principles / |
title_full | Interfacial phenomena and colloid stability. Volume 1 : basic principles / Tharwat F. Tadros. |
title_fullStr | Interfacial phenomena and colloid stability. Volume 1 : basic principles / Tharwat F. Tadros. |
title_full_unstemmed | Interfacial phenomena and colloid stability. Volume 1 : basic principles / Tharwat F. Tadros. |
title_short | Interfacial phenomena and colloid stability. |
title_sort | interfacial phenomena and colloid stability basic principles |
title_sub | basic principles / |
topic | Surfaces (Technology) Analysis. http://id.loc.gov/authorities/subjects/sh85130751 Solid-liquid interfaces. http://id.loc.gov/authorities/subjects/sh95002691 Chemistry, Technical. http://id.loc.gov/authorities/subjects/sh85023029 Colloids Industrial applications. Surfaces (Technologie) Analyse. Interfaces solide-liquide. Chimie industrielle. TECHNOLOGY & ENGINEERING Engineering (General) bisacsh TECHNOLOGY & ENGINEERING Reference. bisacsh Chemistry, Technical fast Colloids Industrial applications fast Solid-liquid interfaces fast Surfaces (Technology) Analysis fast Chemical & Materials Engineering. hilcc Engineering & Applied Sciences. hilcc Chemical Engineering. hilcc |
topic_facet | Surfaces (Technology) Analysis. Solid-liquid interfaces. Chemistry, Technical. Colloids Industrial applications. Surfaces (Technologie) Analyse. Interfaces solide-liquide. Chimie industrielle. TECHNOLOGY & ENGINEERING Engineering (General) TECHNOLOGY & ENGINEERING Reference. Chemistry, Technical Colloids Industrial applications Solid-liquid interfaces Surfaces (Technology) Analysis Chemical & Materials Engineering. Engineering & Applied Sciences. Chemical Engineering. |
url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=999657 |
work_keys_str_mv | AT tadrostharwatf interfacialphenomenaandcolloidstabilityvolume1basicprinciples |