Molecular beam epitaxy :: from research to mass production /
This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to...
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Weitere Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Amsterdam :
Elsevier,
[2013]
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Schlagworte: | |
Online-Zugang: | Volltext Volltext |
Zusammenfassung: | This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to' on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum. MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. Condenses fundamental science of MBE into a modern reference, speeding up literature reviewDiscusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Coverage of MBE as mass production epitaxial technology enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community. |
Beschreibung: | 1 online resource (xi, 731 pages) : illustrations (some color) |
Bibliographie: | Includes bibliographical references and index. |
ISBN: | 9780123918598 0123918596 9781283734264 1283734265 |
Internformat
MARC
LEADER | 00000cam a2200000 i 4500 | ||
---|---|---|---|
001 | ZDB-4-EBA-ocn819506983 | ||
003 | OCoLC | ||
005 | 20241004212047.0 | ||
006 | m o d | ||
007 | cr cnu---unuuu | ||
008 | 121128s2013 ne a ob 001 0 eng d | ||
010 | |a 2012032168 | ||
040 | |a OPELS |b eng |e rda |e pn |c OPELS |d E7B |d OCLCF |d UIU |d N$T |d YDXCP |d DEBSZ |d OCLCO |d OCLCQ |d OCLCO |d OCLCQ |d LOA |d OCLCO |d ICA |d LVT |d COCUF |d AGLDB |d K6U |d PIFAG |d FVL |d OCLCQ |d NJR |d U3W |d BUF |d OCLCQ |d STF |d WRM |d D6H |d OCLCQ |d VTS |d INT |d TFW |d OCLCQ |d WYU |d VT2 |d OCLCO |d OCLCQ |d OCLCO |d OCLCQ |d SXB | ||
019 | |a 820266197 |a 962188550 |a 972069320 |a 992011848 |a 1037789286 |a 1038662364 |a 1066592192 |a 1081230586 |a 1228566233 |a 1244443571 | ||
020 | |a 9780123918598 |q (electronic bk.) | ||
020 | |a 0123918596 |q (electronic bk.) | ||
020 | |a 9781283734264 | ||
020 | |a 1283734265 | ||
020 | |z 9780123878397 |q (hardback) | ||
020 | |z 012387839X |q (hardback) | ||
035 | |a (OCoLC)819506983 |z (OCoLC)820266197 |z (OCoLC)962188550 |z (OCoLC)972069320 |z (OCoLC)992011848 |z (OCoLC)1037789286 |z (OCoLC)1038662364 |z (OCoLC)1066592192 |z (OCoLC)1081230586 |z (OCoLC)1228566233 |z (OCoLC)1244443571 | ||
037 | |a 404676 |b MIL | ||
050 | 4 | |a QC611.6.M64 |b M645 2013eb | |
072 | 7 | |a TEC |x 008060 |2 bisacsh | |
072 | 7 | |a TEC |x 008070 |2 bisacsh | |
082 | 7 | |a 621.381 |2 23 | |
049 | |a MAIN | ||
245 | 0 | 0 | |a Molecular beam epitaxy : |b from research to mass production / |c edited by Mohamed Henini. |
264 | 1 | |a Amsterdam : |b Elsevier, |c [2013] | |
300 | |a 1 online resource (xi, 731 pages) : |b illustrations (some color) | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
504 | |a Includes bibliographical references and index. | ||
520 | |a This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to' on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum. MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. Condenses fundamental science of MBE into a modern reference, speeding up literature reviewDiscusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Coverage of MBE as mass production epitaxial technology enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community. | ||
588 | 0 | |a Online resource; title from PDF title page (ScienceDirect, viewed October 8, 2018). | |
505 | 8 | |a Machine generated contents note: 1. Molecular Beam Epitaxy: Fundamentals, Historical Background and Future Prospects; 2. Molecular Beam Epitaxy in the Ultra-Vacuum of Space: Present and Near Future; 3. Growth of Semiconductor Nanowires by Molecular Beam Epitaxy; 4. Droplet Epitaxy of Nanostructures; 5. Self-assembled Quantum Dots; 6. Migration Enhanced Epitaxy of Low Dimensional Structures; 7. Surfactant-modified Epitaxy; 8. MBE Growth of High Mobility 2DEG; 9. MBE of GaAsBi; 10. Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys; 11. MBE of Dilute Nitride Optoelectronic Devices; 12. The Effects of Antimony During MBE Growth; 13. Nonpolar Cubic III Nitrides: From the Basics of Growth to Device Applications; 14. In-rich InGaN; 15. Molecular Beam Epitaxy of IV-VI Compounds: Heterostructures/Superlattices/Devices; 16. Epitaxial Growth f Thin Films And Quantum Structures of II-VI Visible-Band Gap Semiconductors; 17. MBE of Semiconducting Oxides; 18. ZnO Materials and Devices grown by MBE; 19. MBE of Complex Oxides; 20. Epitaxial Systems Combining Oxides and Semiconductors; 21. MBE Growth of As and Sb based Ferromagnetic III-V Semiconductor; 22. Epitaxial Magnetic Layers Grown by MBE : Model Systems to Study the Physics in Nanomagnetism and Spintronic; 23. Atomic Layer-by-Layer Molecular Beam Epitaxy of Superconducting and Magnetic Materials; 24. MBE of Semimagnetic Quantum Dots; 25. MBE Growth of Graphene; 26. Growth and Characterization of Fullerene/GaAs Interfaces and C60 Doped GaAs and AlGaAs layers; 27. Molecular Beam Epitaxial Growth and Exotic Electronic Structure of Topological Insulators; 28. Thin Films of Organic Molecules: Interfaces and Epitaxial Growth; 29. MBE of II-VI Lasers; 30. MBE Growth of Terahertz Quantum Cascade Lasers; 31. MBE as a Mass Production Technique; 32. Mass production of optoelectronic devices: LEDs, lasers, VCSELs; 33. Mass Production of Sensors Grown by MBE. | |
650 | 0 | |a Molecular beam epitaxy. |0 http://id.loc.gov/authorities/subjects/sh85086573 | |
650 | 0 | |a Optoelectronic devices |x Materials. | |
650 | 0 | |a Semiconductors |x Materials. | |
650 | 6 | |a Épitaxie par jets moléculaires. | |
650 | 6 | |a Dispositifs optoélectroniques |x Matériaux. | |
650 | 6 | |a Semi-conducteurs |x Matériaux. | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Digital. |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Microelectronics. |2 bisacsh | |
650 | 7 | |a Molecular beam epitaxy |2 fast | |
650 | 7 | |a Optoelectronic devices |x Materials |2 fast | |
650 | 7 | |a Semiconductors |x Materials |2 fast | |
655 | 0 | |a Electronic book. | |
655 | 4 | |a Electronic books. | |
700 | 1 | |a Henini, Mohamed, |e editor. | |
776 | 0 | 8 | |i Print version: |t Molecular beam epitaxy. |d Amsterdam : Elsevier, [2013] |z 9780123878397 |w (DLC) 2012032168 |w (OCoLC)788255722 |
856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=485858 |3 Volltext |
856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://www.sciencedirect.com/science/book/9780123878397 |3 Volltext |
938 | |a ebrary |b EBRY |n ebr10621135 | ||
938 | |a EBSCOhost |b EBSC |n 485858 | ||
938 | |a YBP Library Services |b YANK |n 9906435 | ||
994 | |a 92 |b GEBAY | ||
912 | |a ZDB-4-EBA | ||
049 | |a DE-863 |
Datensatz im Suchindex
DE-BY-FWS_katkey | ZDB-4-EBA-ocn819506983 |
---|---|
_version_ | 1816882215247675392 |
adam_text | |
any_adam_object | |
author2 | Henini, Mohamed |
author2_role | edt |
author2_variant | m h mh |
author_facet | Henini, Mohamed |
building | Verbundindex |
bvnumber | localFWS |
callnumber-first | Q - Science |
callnumber-label | QC611 |
callnumber-raw | QC611.6.M64 M645 2013eb |
callnumber-search | QC611.6.M64 M645 2013eb |
callnumber-sort | QC 3611.6 M64 M645 42013EB |
callnumber-subject | QC - Physics |
collection | ZDB-4-EBA |
contents | Machine generated contents note: 1. Molecular Beam Epitaxy: Fundamentals, Historical Background and Future Prospects; 2. Molecular Beam Epitaxy in the Ultra-Vacuum of Space: Present and Near Future; 3. Growth of Semiconductor Nanowires by Molecular Beam Epitaxy; 4. Droplet Epitaxy of Nanostructures; 5. Self-assembled Quantum Dots; 6. Migration Enhanced Epitaxy of Low Dimensional Structures; 7. Surfactant-modified Epitaxy; 8. MBE Growth of High Mobility 2DEG; 9. MBE of GaAsBi; 10. Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys; 11. MBE of Dilute Nitride Optoelectronic Devices; 12. The Effects of Antimony During MBE Growth; 13. Nonpolar Cubic III Nitrides: From the Basics of Growth to Device Applications; 14. In-rich InGaN; 15. Molecular Beam Epitaxy of IV-VI Compounds: Heterostructures/Superlattices/Devices; 16. Epitaxial Growth f Thin Films And Quantum Structures of II-VI Visible-Band Gap Semiconductors; 17. MBE of Semiconducting Oxides; 18. ZnO Materials and Devices grown by MBE; 19. MBE of Complex Oxides; 20. Epitaxial Systems Combining Oxides and Semiconductors; 21. MBE Growth of As and Sb based Ferromagnetic III-V Semiconductor; 22. Epitaxial Magnetic Layers Grown by MBE : Model Systems to Study the Physics in Nanomagnetism and Spintronic; 23. Atomic Layer-by-Layer Molecular Beam Epitaxy of Superconducting and Magnetic Materials; 24. MBE of Semimagnetic Quantum Dots; 25. MBE Growth of Graphene; 26. Growth and Characterization of Fullerene/GaAs Interfaces and C60 Doped GaAs and AlGaAs layers; 27. Molecular Beam Epitaxial Growth and Exotic Electronic Structure of Topological Insulators; 28. Thin Films of Organic Molecules: Interfaces and Epitaxial Growth; 29. MBE of II-VI Lasers; 30. MBE Growth of Terahertz Quantum Cascade Lasers; 31. MBE as a Mass Production Technique; 32. Mass production of optoelectronic devices: LEDs, lasers, VCSELs; 33. Mass Production of Sensors Grown by MBE. |
ctrlnum | (OCoLC)819506983 |
dewey-full | 621.381 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.381 |
dewey-search | 621.381 |
dewey-sort | 3621.381 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>06693cam a2200661 i 4500</leader><controlfield tag="001">ZDB-4-EBA-ocn819506983</controlfield><controlfield tag="003">OCoLC</controlfield><controlfield tag="005">20241004212047.0</controlfield><controlfield tag="006">m o d </controlfield><controlfield tag="007">cr cnu---unuuu</controlfield><controlfield tag="008">121128s2013 ne a ob 001 0 eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a"> 2012032168</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">OPELS</subfield><subfield code="b">eng</subfield><subfield code="e">rda</subfield><subfield code="e">pn</subfield><subfield code="c">OPELS</subfield><subfield code="d">E7B</subfield><subfield code="d">OCLCF</subfield><subfield code="d">UIU</subfield><subfield code="d">N$T</subfield><subfield code="d">YDXCP</subfield><subfield code="d">DEBSZ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">LOA</subfield><subfield code="d">OCLCO</subfield><subfield code="d">ICA</subfield><subfield code="d">LVT</subfield><subfield code="d">COCUF</subfield><subfield code="d">AGLDB</subfield><subfield code="d">K6U</subfield><subfield code="d">PIFAG</subfield><subfield code="d">FVL</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">NJR</subfield><subfield code="d">U3W</subfield><subfield code="d">BUF</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">STF</subfield><subfield code="d">WRM</subfield><subfield code="d">D6H</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">VTS</subfield><subfield code="d">INT</subfield><subfield code="d">TFW</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">WYU</subfield><subfield code="d">VT2</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">SXB</subfield></datafield><datafield tag="019" ind1=" " ind2=" "><subfield code="a">820266197</subfield><subfield code="a">962188550</subfield><subfield code="a">972069320</subfield><subfield code="a">992011848</subfield><subfield code="a">1037789286</subfield><subfield code="a">1038662364</subfield><subfield code="a">1066592192</subfield><subfield code="a">1081230586</subfield><subfield code="a">1228566233</subfield><subfield code="a">1244443571</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780123918598</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0123918596</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781283734264</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1283734265</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">9780123878397</subfield><subfield code="q">(hardback)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">012387839X</subfield><subfield code="q">(hardback)</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)819506983</subfield><subfield code="z">(OCoLC)820266197</subfield><subfield code="z">(OCoLC)962188550</subfield><subfield code="z">(OCoLC)972069320</subfield><subfield code="z">(OCoLC)992011848</subfield><subfield code="z">(OCoLC)1037789286</subfield><subfield code="z">(OCoLC)1038662364</subfield><subfield code="z">(OCoLC)1066592192</subfield><subfield code="z">(OCoLC)1081230586</subfield><subfield code="z">(OCoLC)1228566233</subfield><subfield code="z">(OCoLC)1244443571</subfield></datafield><datafield tag="037" ind1=" " ind2=" "><subfield code="a">404676</subfield><subfield code="b">MIL</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">QC611.6.M64</subfield><subfield code="b">M645 2013eb</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">008060</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">008070</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="082" ind1="7" ind2=" "><subfield code="a">621.381</subfield><subfield code="2">23</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">MAIN</subfield></datafield><datafield tag="245" ind1="0" ind2="0"><subfield code="a">Molecular beam epitaxy :</subfield><subfield code="b">from research to mass production /</subfield><subfield code="c">edited by Mohamed Henini.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam :</subfield><subfield code="b">Elsevier,</subfield><subfield code="c">[2013]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xi, 731 pages) :</subfield><subfield code="b">illustrations (some color)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">computer</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="504" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index.</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to' on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum. MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. Condenses fundamental science of MBE into a modern reference, speeding up literature reviewDiscusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Coverage of MBE as mass production epitaxial technology enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community.</subfield></datafield><datafield tag="588" ind1="0" ind2=" "><subfield code="a">Online resource; title from PDF title page (ScienceDirect, viewed October 8, 2018).</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">Machine generated contents note: 1. Molecular Beam Epitaxy: Fundamentals, Historical Background and Future Prospects; 2. Molecular Beam Epitaxy in the Ultra-Vacuum of Space: Present and Near Future; 3. Growth of Semiconductor Nanowires by Molecular Beam Epitaxy; 4. Droplet Epitaxy of Nanostructures; 5. Self-assembled Quantum Dots; 6. Migration Enhanced Epitaxy of Low Dimensional Structures; 7. Surfactant-modified Epitaxy; 8. MBE Growth of High Mobility 2DEG; 9. MBE of GaAsBi; 10. Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys; 11. MBE of Dilute Nitride Optoelectronic Devices; 12. The Effects of Antimony During MBE Growth; 13. Nonpolar Cubic III Nitrides: From the Basics of Growth to Device Applications; 14. In-rich InGaN; 15. Molecular Beam Epitaxy of IV-VI Compounds: Heterostructures/Superlattices/Devices; 16. Epitaxial Growth f Thin Films And Quantum Structures of II-VI Visible-Band Gap Semiconductors; 17. MBE of Semiconducting Oxides; 18. ZnO Materials and Devices grown by MBE; 19. MBE of Complex Oxides; 20. Epitaxial Systems Combining Oxides and Semiconductors; 21. MBE Growth of As and Sb based Ferromagnetic III-V Semiconductor; 22. Epitaxial Magnetic Layers Grown by MBE : Model Systems to Study the Physics in Nanomagnetism and Spintronic; 23. Atomic Layer-by-Layer Molecular Beam Epitaxy of Superconducting and Magnetic Materials; 24. MBE of Semimagnetic Quantum Dots; 25. MBE Growth of Graphene; 26. Growth and Characterization of Fullerene/GaAs Interfaces and C60 Doped GaAs and AlGaAs layers; 27. Molecular Beam Epitaxial Growth and Exotic Electronic Structure of Topological Insulators; 28. Thin Films of Organic Molecules: Interfaces and Epitaxial Growth; 29. MBE of II-VI Lasers; 30. MBE Growth of Terahertz Quantum Cascade Lasers; 31. MBE as a Mass Production Technique; 32. Mass production of optoelectronic devices: LEDs, lasers, VCSELs; 33. Mass Production of Sensors Grown by MBE.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Molecular beam epitaxy.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85086573</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Optoelectronic devices</subfield><subfield code="x">Materials.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Semiconductors</subfield><subfield code="x">Materials.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Épitaxie par jets moléculaires.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Dispositifs optoélectroniques</subfield><subfield code="x">Matériaux.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Semi-conducteurs</subfield><subfield code="x">Matériaux.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Electronics</subfield><subfield code="x">Digital.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Electronics</subfield><subfield code="x">Microelectronics.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Molecular beam epitaxy</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Optoelectronic devices</subfield><subfield code="x">Materials</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconductors</subfield><subfield code="x">Materials</subfield><subfield code="2">fast</subfield></datafield><datafield tag="655" ind1=" " ind2="0"><subfield code="a">Electronic book.</subfield></datafield><datafield tag="655" ind1=" " ind2="4"><subfield code="a">Electronic books.</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Henini, Mohamed,</subfield><subfield code="e">editor.</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Print version:</subfield><subfield code="t">Molecular beam epitaxy.</subfield><subfield code="d">Amsterdam : Elsevier, [2013]</subfield><subfield code="z">9780123878397</subfield><subfield code="w">(DLC) 2012032168</subfield><subfield code="w">(OCoLC)788255722</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=485858</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://www.sciencedirect.com/science/book/9780123878397</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ebrary</subfield><subfield code="b">EBRY</subfield><subfield code="n">ebr10621135</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBSCOhost</subfield><subfield code="b">EBSC</subfield><subfield code="n">485858</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">9906435</subfield></datafield><datafield tag="994" ind1=" " ind2=" "><subfield code="a">92</subfield><subfield code="b">GEBAY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-863</subfield></datafield></record></collection> |
genre | Electronic book. Electronic books. |
genre_facet | Electronic book. Electronic books. |
id | ZDB-4-EBA-ocn819506983 |
illustrated | Illustrated |
indexdate | 2024-11-27T13:25:04Z |
institution | BVB |
isbn | 9780123918598 0123918596 9781283734264 1283734265 |
language | English |
lccn | 2012032168 |
oclc_num | 819506983 |
open_access_boolean | |
owner | MAIN DE-863 DE-BY-FWS |
owner_facet | MAIN DE-863 DE-BY-FWS |
physical | 1 online resource (xi, 731 pages) : illustrations (some color) |
psigel | ZDB-4-EBA |
publishDate | 2013 |
publishDateSearch | 2013 |
publishDateSort | 2013 |
publisher | Elsevier, |
record_format | marc |
spelling | Molecular beam epitaxy : from research to mass production / edited by Mohamed Henini. Amsterdam : Elsevier, [2013] 1 online resource (xi, 731 pages) : illustrations (some color) text txt rdacontent computer c rdamedia online resource cr rdacarrier Includes bibliographical references and index. This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a 'how to' on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum. MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. Condenses fundamental science of MBE into a modern reference, speeding up literature reviewDiscusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Coverage of MBE as mass production epitaxial technology enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community. Online resource; title from PDF title page (ScienceDirect, viewed October 8, 2018). Machine generated contents note: 1. Molecular Beam Epitaxy: Fundamentals, Historical Background and Future Prospects; 2. Molecular Beam Epitaxy in the Ultra-Vacuum of Space: Present and Near Future; 3. Growth of Semiconductor Nanowires by Molecular Beam Epitaxy; 4. Droplet Epitaxy of Nanostructures; 5. Self-assembled Quantum Dots; 6. Migration Enhanced Epitaxy of Low Dimensional Structures; 7. Surfactant-modified Epitaxy; 8. MBE Growth of High Mobility 2DEG; 9. MBE of GaAsBi; 10. Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys; 11. MBE of Dilute Nitride Optoelectronic Devices; 12. The Effects of Antimony During MBE Growth; 13. Nonpolar Cubic III Nitrides: From the Basics of Growth to Device Applications; 14. In-rich InGaN; 15. Molecular Beam Epitaxy of IV-VI Compounds: Heterostructures/Superlattices/Devices; 16. Epitaxial Growth f Thin Films And Quantum Structures of II-VI Visible-Band Gap Semiconductors; 17. MBE of Semiconducting Oxides; 18. ZnO Materials and Devices grown by MBE; 19. MBE of Complex Oxides; 20. Epitaxial Systems Combining Oxides and Semiconductors; 21. MBE Growth of As and Sb based Ferromagnetic III-V Semiconductor; 22. Epitaxial Magnetic Layers Grown by MBE : Model Systems to Study the Physics in Nanomagnetism and Spintronic; 23. Atomic Layer-by-Layer Molecular Beam Epitaxy of Superconducting and Magnetic Materials; 24. MBE of Semimagnetic Quantum Dots; 25. MBE Growth of Graphene; 26. Growth and Characterization of Fullerene/GaAs Interfaces and C60 Doped GaAs and AlGaAs layers; 27. Molecular Beam Epitaxial Growth and Exotic Electronic Structure of Topological Insulators; 28. Thin Films of Organic Molecules: Interfaces and Epitaxial Growth; 29. MBE of II-VI Lasers; 30. MBE Growth of Terahertz Quantum Cascade Lasers; 31. MBE as a Mass Production Technique; 32. Mass production of optoelectronic devices: LEDs, lasers, VCSELs; 33. Mass Production of Sensors Grown by MBE. Molecular beam epitaxy. http://id.loc.gov/authorities/subjects/sh85086573 Optoelectronic devices Materials. Semiconductors Materials. Épitaxie par jets moléculaires. Dispositifs optoélectroniques Matériaux. Semi-conducteurs Matériaux. TECHNOLOGY & ENGINEERING Electronics Digital. bisacsh TECHNOLOGY & ENGINEERING Electronics Microelectronics. bisacsh Molecular beam epitaxy fast Optoelectronic devices Materials fast Semiconductors Materials fast Electronic book. Electronic books. Henini, Mohamed, editor. Print version: Molecular beam epitaxy. Amsterdam : Elsevier, [2013] 9780123878397 (DLC) 2012032168 (OCoLC)788255722 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=485858 Volltext FWS01 ZDB-4-EBA FWS_PDA_EBA https://www.sciencedirect.com/science/book/9780123878397 Volltext |
spellingShingle | Molecular beam epitaxy : from research to mass production / Machine generated contents note: 1. Molecular Beam Epitaxy: Fundamentals, Historical Background and Future Prospects; 2. Molecular Beam Epitaxy in the Ultra-Vacuum of Space: Present and Near Future; 3. Growth of Semiconductor Nanowires by Molecular Beam Epitaxy; 4. Droplet Epitaxy of Nanostructures; 5. Self-assembled Quantum Dots; 6. Migration Enhanced Epitaxy of Low Dimensional Structures; 7. Surfactant-modified Epitaxy; 8. MBE Growth of High Mobility 2DEG; 9. MBE of GaAsBi; 10. Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys; 11. MBE of Dilute Nitride Optoelectronic Devices; 12. The Effects of Antimony During MBE Growth; 13. Nonpolar Cubic III Nitrides: From the Basics of Growth to Device Applications; 14. In-rich InGaN; 15. Molecular Beam Epitaxy of IV-VI Compounds: Heterostructures/Superlattices/Devices; 16. Epitaxial Growth f Thin Films And Quantum Structures of II-VI Visible-Band Gap Semiconductors; 17. MBE of Semiconducting Oxides; 18. ZnO Materials and Devices grown by MBE; 19. MBE of Complex Oxides; 20. Epitaxial Systems Combining Oxides and Semiconductors; 21. MBE Growth of As and Sb based Ferromagnetic III-V Semiconductor; 22. Epitaxial Magnetic Layers Grown by MBE : Model Systems to Study the Physics in Nanomagnetism and Spintronic; 23. Atomic Layer-by-Layer Molecular Beam Epitaxy of Superconducting and Magnetic Materials; 24. MBE of Semimagnetic Quantum Dots; 25. MBE Growth of Graphene; 26. Growth and Characterization of Fullerene/GaAs Interfaces and C60 Doped GaAs and AlGaAs layers; 27. Molecular Beam Epitaxial Growth and Exotic Electronic Structure of Topological Insulators; 28. Thin Films of Organic Molecules: Interfaces and Epitaxial Growth; 29. MBE of II-VI Lasers; 30. MBE Growth of Terahertz Quantum Cascade Lasers; 31. MBE as a Mass Production Technique; 32. Mass production of optoelectronic devices: LEDs, lasers, VCSELs; 33. Mass Production of Sensors Grown by MBE. Molecular beam epitaxy. http://id.loc.gov/authorities/subjects/sh85086573 Optoelectronic devices Materials. Semiconductors Materials. Épitaxie par jets moléculaires. Dispositifs optoélectroniques Matériaux. Semi-conducteurs Matériaux. TECHNOLOGY & ENGINEERING Electronics Digital. bisacsh TECHNOLOGY & ENGINEERING Electronics Microelectronics. bisacsh Molecular beam epitaxy fast Optoelectronic devices Materials fast Semiconductors Materials fast |
subject_GND | http://id.loc.gov/authorities/subjects/sh85086573 |
title | Molecular beam epitaxy : from research to mass production / |
title_auth | Molecular beam epitaxy : from research to mass production / |
title_exact_search | Molecular beam epitaxy : from research to mass production / |
title_full | Molecular beam epitaxy : from research to mass production / edited by Mohamed Henini. |
title_fullStr | Molecular beam epitaxy : from research to mass production / edited by Mohamed Henini. |
title_full_unstemmed | Molecular beam epitaxy : from research to mass production / edited by Mohamed Henini. |
title_short | Molecular beam epitaxy : |
title_sort | molecular beam epitaxy from research to mass production |
title_sub | from research to mass production / |
topic | Molecular beam epitaxy. http://id.loc.gov/authorities/subjects/sh85086573 Optoelectronic devices Materials. Semiconductors Materials. Épitaxie par jets moléculaires. Dispositifs optoélectroniques Matériaux. Semi-conducteurs Matériaux. TECHNOLOGY & ENGINEERING Electronics Digital. bisacsh TECHNOLOGY & ENGINEERING Electronics Microelectronics. bisacsh Molecular beam epitaxy fast Optoelectronic devices Materials fast Semiconductors Materials fast |
topic_facet | Molecular beam epitaxy. Optoelectronic devices Materials. Semiconductors Materials. Épitaxie par jets moléculaires. Dispositifs optoélectroniques Matériaux. Semi-conducteurs Matériaux. TECHNOLOGY & ENGINEERING Electronics Digital. TECHNOLOGY & ENGINEERING Electronics Microelectronics. Molecular beam epitaxy Optoelectronic devices Materials Semiconductors Materials Electronic book. Electronic books. |
url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=485858 https://www.sciencedirect.com/science/book/9780123878397 |
work_keys_str_mv | AT heninimohamed molecularbeamepitaxyfromresearchtomassproduction |