Verfügbarkeit: Chemical vapor deposition /

Chemical vapor deposition /:

Gespeichert in:

Bibliographische Detailangaben
Weitere Verfasser:	Park, Jong-Hee, 1951-, Sudarshan, T. S., 1955-
Format:	Elektronisch E-Book
Sprache:	English
Veröffentlicht:	Materials Park, Ohio : ASM International, 2001.
Schriftenreihe:	Surface engineering series ; v. 2.
Schlagworte:	Vapor-plating. Refractory coating. Revêtement réfractaire. TECHNOLOGY & ENGINEERING > Technical & Manufacturing Industries & Trades. Refractory coating Vapor-plating
Online-Zugang:	Volltext
Beschreibung:	1 online resource (vii, 481 pages :)
Bibliographie:	Includes bibliographical references.
ISBN:	9781615032242 161503224X

Internformat

MARC


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505	0	0	\|g Ch. 1. \|t Introduction to Chemical Vapor Deposition (CVD) / \|r J.R. Creighton and P. Ho -- \|g Ch. 2. \|t Basic Principles of CVD Thermodynamics and Kinetics / \|r A.K. Pattanaik and V.K. Sarin -- \|g Ch. 3. \|t Stresses and Mechanical Stability of CVD Thin Films / \|r M. Ignat -- \|g Ch. 4. \|t Combustion Chemical Vapor Deposition (CCVD) / \|r A.T. Hunt and Matthias Pohl -- \|g Ch. 5. \|t Polarized Electrochemical Vapor Deposition / \|r Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- \|g Ch. 6. \|t Chemical Vapor Infiltration: Optimization of Processing Conditions / \|r S.K. Griffiths and Robert H. Nilson -- \|g Ch. 7. \|t Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications / \|r C.S. Hwang and H.-I. Yoo.
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650		6	\|a Revêtement réfractaire.
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776	0	8	\|i Print version: \|t Chemical vapor deposition. \|d Materials Park, Ohio : ASM International, 2001 \|w (DLC) 2001022339
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Datensatz im Suchindex

DE-BY-FWS_katkey	ZDB-4-EBA-ocn646817910
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author2	Park, Jong-Hee, 1951- Sudarshan, T. S., 1955-
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author_GND	http://id.loc.gov/authorities/names/n88621361 http://id.loc.gov/authorities/names/n88199059
author_additional	J.R. Creighton and P. Ho -- A.K. Pattanaik and V.K. Sarin -- M. Ignat -- A.T. Hunt and Matthias Pohl -- Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- S.K. Griffiths and Robert H. Nilson -- C.S. Hwang and H.-I. Yoo.
author_facet	Park, Jong-Hee, 1951- Sudarshan, T. S., 1955-
author_sort	Park, Jong-Hee, 1951-
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contents	Introduction to Chemical Vapor Deposition (CVD) / Basic Principles of CVD Thermodynamics and Kinetics / Stresses and Mechanical Stability of CVD Thin Films / Combustion Chemical Vapor Deposition (CCVD) / Polarized Electrochemical Vapor Deposition / Chemical Vapor Infiltration: Optimization of Processing Conditions / Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications /
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dewey-search	671.7/35
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discipline	Werkstoffwissenschaften / Fertigungstechnik
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indexdate	2024-10-25T16:17:37Z
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spelling	Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan. Materials Park, Ohio : ASM International, 2001. 1 online resource (vii, 481 pages :) text txt rdacontent computer c rdamedia online resource cr rdacarrier data file Surface engineering series ; v. 2 Includes bibliographical references. Print version record. Ch. 1. Introduction to Chemical Vapor Deposition (CVD) / J.R. Creighton and P. Ho -- Ch. 2. Basic Principles of CVD Thermodynamics and Kinetics / A.K. Pattanaik and V.K. Sarin -- Ch. 3. Stresses and Mechanical Stability of CVD Thin Films / M. Ignat -- Ch. 4. Combustion Chemical Vapor Deposition (CCVD) / A.T. Hunt and Matthias Pohl -- Ch. 5. Polarized Electrochemical Vapor Deposition / Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- Ch. 6. Chemical Vapor Infiltration: Optimization of Processing Conditions / S.K. Griffiths and Robert H. Nilson -- Ch. 7. Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications / C.S. Hwang and H.-I. Yoo. Vapor-plating. http://id.loc.gov/authorities/subjects/sh85142069 Refractory coating. http://id.loc.gov/authorities/subjects/sh85112268 Revêtement réfractaire. TECHNOLOGY & ENGINEERING Technical & Manufacturing Industries & Trades. bisacsh Refractory coating fast Vapor-plating fast Park, Jong-Hee, 1951- https://id.oclc.org/worldcat/entity/E39PCjvXWvfDVQDTypWtCMCDG3 http://id.loc.gov/authorities/names/n88621361 Sudarshan, T. S., 1955- https://id.oclc.org/worldcat/entity/E39PCjF43j4Q9wVtw4w6gmgRJC http://id.loc.gov/authorities/names/n88199059 has work: Chemical vapor deposition (Text) https://id.oclc.org/worldcat/entity/E39PCGJRt74g8hRKRyvxcPGT73 https://id.oclc.org/worldcat/ontology/hasWork Print version: Chemical vapor deposition. Materials Park, Ohio : ASM International, 2001 (DLC) 2001022339 Surface engineering series ; v. 2. http://id.loc.gov/authorities/names/no99036709 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=395831 Volltext CBO01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=395831 Volltext
spellingShingle	Chemical vapor deposition / Surface engineering series ; Introduction to Chemical Vapor Deposition (CVD) / Basic Principles of CVD Thermodynamics and Kinetics / Stresses and Mechanical Stability of CVD Thin Films / Combustion Chemical Vapor Deposition (CCVD) / Polarized Electrochemical Vapor Deposition / Chemical Vapor Infiltration: Optimization of Processing Conditions / Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications / Vapor-plating. http://id.loc.gov/authorities/subjects/sh85142069 Refractory coating. http://id.loc.gov/authorities/subjects/sh85112268 Revêtement réfractaire. TECHNOLOGY & ENGINEERING Technical & Manufacturing Industries & Trades. bisacsh Refractory coating fast Vapor-plating fast
subject_GND	http://id.loc.gov/authorities/subjects/sh85142069 http://id.loc.gov/authorities/subjects/sh85112268
title	Chemical vapor deposition /
title_alt	Introduction to Chemical Vapor Deposition (CVD) / Basic Principles of CVD Thermodynamics and Kinetics / Stresses and Mechanical Stability of CVD Thin Films / Combustion Chemical Vapor Deposition (CCVD) / Polarized Electrochemical Vapor Deposition / Chemical Vapor Infiltration: Optimization of Processing Conditions / Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications /
title_auth	Chemical vapor deposition /
title_exact_search	Chemical vapor deposition /
title_full	Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.
title_fullStr	Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.
title_full_unstemmed	Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.
title_short	Chemical vapor deposition /
title_sort	chemical vapor deposition
topic	Vapor-plating. http://id.loc.gov/authorities/subjects/sh85142069 Refractory coating. http://id.loc.gov/authorities/subjects/sh85112268 Revêtement réfractaire. TECHNOLOGY & ENGINEERING Technical & Manufacturing Industries & Trades. bisacsh Refractory coating fast Vapor-plating fast
topic_facet	Vapor-plating. Refractory coating. Revêtement réfractaire. TECHNOLOGY & ENGINEERING Technical & Manufacturing Industries & Trades. Refractory coating Vapor-plating
url	https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=395831
work_keys_str_mv	AT parkjonghee chemicalvapordeposition AT sudarshants chemicalvapordeposition

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