Plasma deposition of amorphous silicon-based materials /:
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference...
Gespeichert in:
| Weitere Verfasser: | , , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston :
Academic Press,
©1995.
|
| Schriftenreihe: | Plasma--materials interactions.
|
| Schlagworte: | |
| Online-Zugang: | Volltext Volltext |
| Zusammenfassung: | Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. |
| Beschreibung: | 1 online resource (xi, 324 pages) : illustrations |
| Bibliographie: | Includes bibliographical references and index. |
| ISBN: | 9780080539102 0080539106 1281054100 9781281054104 |
Internformat
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| 490 | 1 | |a Plasma--materials interactions | |
| 504 | |a Includes bibliographical references and index. | ||
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| 505 | 0 | |a Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices. | |
| 520 | |a Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. | ||
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| 650 | 0 | |a Silicon alloys. |0 http://id.loc.gov/authorities/subjects/sh85122518 | |
| 650 | 0 | |a Plasma-enhanced chemical vapor deposition. |0 http://id.loc.gov/authorities/subjects/sh90002917 | |
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| 653 | 0 | |a Semiconductors | |
| 700 | 1 | |a Bruno, Giovanni. | |
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Datensatz im Suchindex
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| _version_ | 1816881654728228865 |
| adam_text | |
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| author2 | Bruno, Giovanni Capezzuto, Pio Madan, A. (Arun) |
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| author_GND | http://id.loc.gov/authorities/names/n95030401 http://id.loc.gov/authorities/names/n85063306 |
| author_facet | Bruno, Giovanni Capezzuto, Pio Madan, A. (Arun) |
| author_sort | Bruno, Giovanni |
| building | Verbundindex |
| bvnumber | localFWS |
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| callnumber-search | TK7871.99.A45 P55 1995eb |
| callnumber-sort | TK 47871.99 A45 P55 41995EB |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| collection | ZDB-4-EBA |
| contents | Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices. |
| ctrlnum | (OCoLC)175286921 |
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| id | ZDB-4-EBA-ocn175286921 |
| illustrated | Illustrated |
| indexdate | 2024-11-27T13:16:10Z |
| institution | BVB |
| isbn | 9780080539102 0080539106 1281054100 9781281054104 |
| language | English |
| oclc_num | 175286921 |
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| owner_facet | MAIN DE-863 DE-BY-FWS |
| physical | 1 online resource (xi, 324 pages) : illustrations |
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| publishDate | 1995 |
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| series | Plasma--materials interactions. |
| series2 | Plasma--materials interactions |
| spelling | Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. Boston : Academic Press, ©1995. 1 online resource (xi, 324 pages) : illustrations text txt rdacontent computer c rdamedia online resource cr rdacarrier Plasma--materials interactions Includes bibliographical references and index. Print version record. Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices. Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Amorphous semiconductors Design and construction. Silicon alloys. http://id.loc.gov/authorities/subjects/sh85122518 Plasma-enhanced chemical vapor deposition. http://id.loc.gov/authorities/subjects/sh90002917 Silicium Alliages. Dépôt chimique en phase vapeur activé par plasma. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Amorphous semiconductors Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Semiconductors Bruno, Giovanni. Capezzuto, Pio. http://id.loc.gov/authorities/names/n95030401 Madan, A. (Arun) https://id.oclc.org/worldcat/entity/E39PCjyWMD9H6RKffjXfdkdh9C http://id.loc.gov/authorities/names/n85063306 has work: Plasma deposition of amorphous silicon-based materials (Text) https://id.oclc.org/worldcat/entity/E39PCGvTwGC8gd4bxd44Vx9GgX https://id.oclc.org/worldcat/ontology/hasWork Print version: Plasma deposition of amorphous silicon-based materials. Boston : Academic Press, ©1995 012137940X 9780121379407 (DLC) 95012433 (OCoLC)32311752 Plasma--materials interactions. http://id.loc.gov/authorities/names/n86731624 FWS01 ZDB-4-EBA FWS_PDA_EBA https://www.sciencedirect.com/science/book/9780121379407 Volltext FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=207143 Volltext |
| spellingShingle | Plasma deposition of amorphous silicon-based materials / Plasma--materials interactions. Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices. Amorphous semiconductors Design and construction. Silicon alloys. http://id.loc.gov/authorities/subjects/sh85122518 Plasma-enhanced chemical vapor deposition. http://id.loc.gov/authorities/subjects/sh90002917 Silicium Alliages. Dépôt chimique en phase vapeur activé par plasma. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Amorphous semiconductors Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast |
| subject_GND | http://id.loc.gov/authorities/subjects/sh85122518 http://id.loc.gov/authorities/subjects/sh90002917 |
| title | Plasma deposition of amorphous silicon-based materials / |
| title_auth | Plasma deposition of amorphous silicon-based materials / |
| title_exact_search | Plasma deposition of amorphous silicon-based materials / |
| title_full | Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. |
| title_fullStr | Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. |
| title_full_unstemmed | Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. |
| title_short | Plasma deposition of amorphous silicon-based materials / |
| title_sort | plasma deposition of amorphous silicon based materials |
| topic | Amorphous semiconductors Design and construction. Silicon alloys. http://id.loc.gov/authorities/subjects/sh85122518 Plasma-enhanced chemical vapor deposition. http://id.loc.gov/authorities/subjects/sh90002917 Silicium Alliages. Dépôt chimique en phase vapeur activé par plasma. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Amorphous semiconductors Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast |
| topic_facet | Amorphous semiconductors Design and construction. Silicon alloys. Plasma-enhanced chemical vapor deposition. Silicium Alliages. Dépôt chimique en phase vapeur activé par plasma. TECHNOLOGY & ENGINEERING Electronics Solid State. TECHNOLOGY & ENGINEERING Electronics Semiconductors. Amorphous semiconductors Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys |
| url | https://www.sciencedirect.com/science/book/9780121379407 https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=207143 |
| work_keys_str_mv | AT brunogiovanni plasmadepositionofamorphoussiliconbasedmaterials AT capezzutopio plasmadepositionofamorphoussiliconbasedmaterials AT madana plasmadepositionofamorphoussiliconbasedmaterials |