Plasma processing of materials :: scientific opportunities and technological challenges /
Gespeichert in:
Körperschaft: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Washington, D.C. :
National Academy Press,
1991.
|
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | 1 online resource (xii, 75 pages) : illustrations |
Format: | Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |
ISBN: | 0585084637 9780585084633 1280203366 9781280203367 9786610203369 6610203369 0309583756 9780309583756 |
Internformat
MARC
LEADER | 00000cam a2200000Ma 4500 | ||
---|---|---|---|
001 | ZDB-4-EBA-ocm43475627 | ||
003 | OCoLC | ||
005 | 20241004212047.0 | ||
006 | m o d | ||
007 | cr cn||||||||| | ||
008 | 000112s1991 dcua o 000 0 eng d | ||
010 | |a 91066812 | ||
040 | |a N$T |b eng |e pn |c N$T |d OCL |d OCLCQ |d OCL |d YDXCP |d OCLCQ |d COF |d OCLCQ |d COCUF |d OCLCE |d E7B |d CUSER |d DKDLA |d ADU |d IDEBK |d CUS |d VPI |d FVL |d OCLCQ |d OCLCF |d OCLCQ |d NLGGC |d OCLCQ |d UV0 |d OCLCQ |d AZK |d OCLCQ |d LOA |d MOR |d PIFBR |d OCLCQ |d BUF |d STF |d WRM |d VTS |d NRAMU |d EZ9 |d INT |d VT2 |d OCLCQ |d AU@ |d WYU |d UKCRE |d OCLCO |d OCLCQ |d INARC |d QGK |d OCLCO | ||
019 | |a 133166726 |a 301331452 |a 326754879 |a 475452781 |a 614620430 |a 645824130 |a 666932774 |a 722249159 |a 728014561 |a 961670055 |a 961679911 |a 962592336 |a 962716419 |a 966199181 |a 988443441 |a 991988040 |a 1037915847 |a 1038701257 |a 1045497160 |a 1047525714 |a 1053023850 |a 1055334602 |a 1058093928 |a 1065043700 |a 1081244963 |a 1153481889 |a 1156362447 |a 1228603603 |a 1249251486 |a 1259204972 |a 1392329949 | ||
020 | |a 0585084637 |q (electronic bk.) | ||
020 | |a 9780585084633 |q (electronic bk.) | ||
020 | |z 0309045975 |q (pbk.) | ||
020 | |z 9780309045971 |q (pbk.) | ||
020 | |a 1280203366 | ||
020 | |a 9781280203367 | ||
020 | |a 9786610203369 | ||
020 | |a 6610203369 | ||
020 | |a 0309583756 | ||
020 | |a 9780309583756 | ||
035 | |a (OCoLC)43475627 |z (OCoLC)133166726 |z (OCoLC)301331452 |z (OCoLC)326754879 |z (OCoLC)475452781 |z (OCoLC)614620430 |z (OCoLC)645824130 |z (OCoLC)666932774 |z (OCoLC)722249159 |z (OCoLC)728014561 |z (OCoLC)961670055 |z (OCoLC)961679911 |z (OCoLC)962592336 |z (OCoLC)962716419 |z (OCoLC)966199181 |z (OCoLC)988443441 |z (OCoLC)991988040 |z (OCoLC)1037915847 |z (OCoLC)1038701257 |z (OCoLC)1045497160 |z (OCoLC)1047525714 |z (OCoLC)1053023850 |z (OCoLC)1055334602 |z (OCoLC)1058093928 |z (OCoLC)1065043700 |z (OCoLC)1081244963 |z (OCoLC)1153481889 |z (OCoLC)1156362447 |z (OCoLC)1228603603 |z (OCoLC)1249251486 |z (OCoLC)1259204972 |z (OCoLC)1392329949 | ||
042 | |a dlr | ||
050 | 4 | |a TA2005 |b .N37 1991eb | |
072 | 7 | |a TEC |x 009070 |2 bisacsh | |
082 | 7 | |a 621.044 |2 20 | |
049 | |a MAIN | ||
110 | 2 | |a National Research Council (U.S.). |b Panel on Plasma Processing of Materials. |0 http://id.loc.gov/authorities/names/n92043473 | |
245 | 1 | 0 | |a Plasma processing of materials : |b scientific opportunities and technological challenges / |c Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
260 | |a Washington, D.C. : |b National Academy Press, |c 1991. | ||
300 | |a 1 online resource (xii, 75 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
347 | |a data file |2 rda | ||
588 | 0 | |a Print version record. | |
506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
533 | |a Electronic reproduction. |b [S.l.] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
546 | |a English. | ||
650 | 0 | |a Plasma engineering. |0 http://id.loc.gov/authorities/subjects/sh85103069 | |
650 | 0 | |a Microelectronics |x Materials |x Effect of radiation on. | |
650 | 0 | |a Surfaces (Technology) |0 http://id.loc.gov/authorities/subjects/sh85130750 | |
650 | 6 | |a Technique des plasmas. | |
650 | 6 | |a Microélectronique |x Matériaux |x Effets du rayonnement sur. | |
650 | 6 | |a Surfaces (Technologie) | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Mechanical. |2 bisacsh | |
650 | 7 | |a Microelectronics |x Materials |x Effect of radiation on |2 fast | |
650 | 7 | |a Plasma engineering |2 fast | |
650 | 7 | |a Surfaces (Technology) |2 fast | |
776 | 0 | 8 | |i Print version: |a National Research Council (U.S.). Panel on Plasma Processing of Materials. |t Plasma processing of materials. |d Washington, D.C. : National Academy Press, 1991 |z 0309045975 |w (DLC) 91066812 |w (OCoLC)24832731 |
856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=14049 |3 Volltext |
938 | |a ebrary |b EBRY |n ebr10055392 | ||
938 | |a EBSCOhost |b EBSC |n 14049 | ||
938 | |a ProQuest MyiLibrary Digital eBook Collection |b IDEB |n 20336 | ||
938 | |a YBP Library Services |b YANK |n 2305353 | ||
938 | |a YBP Library Services |b YANK |n 6012565 | ||
938 | |a Internet Archive |b INAR |n plasmaprocessing0000nati | ||
994 | |a 92 |b GEBAY | ||
912 | |a ZDB-4-EBA | ||
049 | |a DE-863 |
Datensatz im Suchindex
DE-BY-FWS_katkey | ZDB-4-EBA-ocm43475627 |
---|---|
_version_ | 1816881581949714432 |
adam_text | |
any_adam_object | |
author_corporate | National Research Council (U.S.). Panel on Plasma Processing of Materials |
author_corporate_role | |
author_facet | National Research Council (U.S.). Panel on Plasma Processing of Materials |
author_sort | National Research Council (U.S.). Panel on Plasma Processing of Materials |
building | Verbundindex |
bvnumber | localFWS |
callnumber-first | T - Technology |
callnumber-label | TA2005 |
callnumber-raw | TA2005 .N37 1991eb |
callnumber-search | TA2005 .N37 1991eb |
callnumber-sort | TA 42005 N37 41991EB |
callnumber-subject | TA - General and Civil Engineering |
collection | ZDB-4-EBA |
ctrlnum | (OCoLC)43475627 |
dewey-full | 621.044 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.044 |
dewey-search | 621.044 |
dewey-sort | 3621.044 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Werkstoffwissenschaften / Fertigungstechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>04613cam a2200721Ma 4500</leader><controlfield tag="001">ZDB-4-EBA-ocm43475627 </controlfield><controlfield tag="003">OCoLC</controlfield><controlfield tag="005">20241004212047.0</controlfield><controlfield tag="006">m o d </controlfield><controlfield tag="007">cr cn|||||||||</controlfield><controlfield tag="008">000112s1991 dcua o 000 0 eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a"> 91066812 </subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">N$T</subfield><subfield code="b">eng</subfield><subfield code="e">pn</subfield><subfield code="c">N$T</subfield><subfield code="d">OCL</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCL</subfield><subfield code="d">YDXCP</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">COF</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">COCUF</subfield><subfield code="d">OCLCE</subfield><subfield code="d">E7B</subfield><subfield code="d">CUSER</subfield><subfield code="d">DKDLA</subfield><subfield code="d">ADU</subfield><subfield code="d">IDEBK</subfield><subfield code="d">CUS</subfield><subfield code="d">VPI</subfield><subfield code="d">FVL</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCF</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">NLGGC</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">UV0</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">AZK</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">LOA</subfield><subfield code="d">MOR</subfield><subfield code="d">PIFBR</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">BUF</subfield><subfield code="d">STF</subfield><subfield code="d">WRM</subfield><subfield code="d">VTS</subfield><subfield code="d">NRAMU</subfield><subfield code="d">EZ9</subfield><subfield code="d">INT</subfield><subfield code="d">VT2</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">AU@</subfield><subfield code="d">WYU</subfield><subfield code="d">UKCRE</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">INARC</subfield><subfield code="d">QGK</subfield><subfield code="d">OCLCO</subfield></datafield><datafield tag="019" ind1=" " ind2=" "><subfield code="a">133166726</subfield><subfield code="a">301331452</subfield><subfield code="a">326754879</subfield><subfield code="a">475452781</subfield><subfield code="a">614620430</subfield><subfield code="a">645824130</subfield><subfield code="a">666932774</subfield><subfield code="a">722249159</subfield><subfield code="a">728014561</subfield><subfield code="a">961670055</subfield><subfield code="a">961679911</subfield><subfield code="a">962592336</subfield><subfield code="a">962716419</subfield><subfield code="a">966199181</subfield><subfield code="a">988443441</subfield><subfield code="a">991988040</subfield><subfield code="a">1037915847</subfield><subfield code="a">1038701257</subfield><subfield code="a">1045497160</subfield><subfield code="a">1047525714</subfield><subfield code="a">1053023850</subfield><subfield code="a">1055334602</subfield><subfield code="a">1058093928</subfield><subfield code="a">1065043700</subfield><subfield code="a">1081244963</subfield><subfield code="a">1153481889</subfield><subfield code="a">1156362447</subfield><subfield code="a">1228603603</subfield><subfield code="a">1249251486</subfield><subfield code="a">1259204972</subfield><subfield code="a">1392329949</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0585084637</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780585084633</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">0309045975</subfield><subfield code="q">(pbk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">9780309045971</subfield><subfield code="q">(pbk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1280203366</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781280203367</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9786610203369</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">6610203369</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0309583756</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780309583756</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)43475627</subfield><subfield code="z">(OCoLC)133166726</subfield><subfield code="z">(OCoLC)301331452</subfield><subfield code="z">(OCoLC)326754879</subfield><subfield code="z">(OCoLC)475452781</subfield><subfield code="z">(OCoLC)614620430</subfield><subfield code="z">(OCoLC)645824130</subfield><subfield code="z">(OCoLC)666932774</subfield><subfield code="z">(OCoLC)722249159</subfield><subfield code="z">(OCoLC)728014561</subfield><subfield code="z">(OCoLC)961670055</subfield><subfield code="z">(OCoLC)961679911</subfield><subfield code="z">(OCoLC)962592336</subfield><subfield code="z">(OCoLC)962716419</subfield><subfield code="z">(OCoLC)966199181</subfield><subfield code="z">(OCoLC)988443441</subfield><subfield code="z">(OCoLC)991988040</subfield><subfield code="z">(OCoLC)1037915847</subfield><subfield code="z">(OCoLC)1038701257</subfield><subfield code="z">(OCoLC)1045497160</subfield><subfield code="z">(OCoLC)1047525714</subfield><subfield code="z">(OCoLC)1053023850</subfield><subfield code="z">(OCoLC)1055334602</subfield><subfield code="z">(OCoLC)1058093928</subfield><subfield code="z">(OCoLC)1065043700</subfield><subfield code="z">(OCoLC)1081244963</subfield><subfield code="z">(OCoLC)1153481889</subfield><subfield code="z">(OCoLC)1156362447</subfield><subfield code="z">(OCoLC)1228603603</subfield><subfield code="z">(OCoLC)1249251486</subfield><subfield code="z">(OCoLC)1259204972</subfield><subfield code="z">(OCoLC)1392329949</subfield></datafield><datafield tag="042" ind1=" " ind2=" "><subfield code="a">dlr</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">TA2005</subfield><subfield code="b">.N37 1991eb</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">009070</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="082" ind1="7" ind2=" "><subfield code="a">621.044</subfield><subfield code="2">20</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">MAIN</subfield></datafield><datafield tag="110" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.).</subfield><subfield code="b">Panel on Plasma Processing of Materials.</subfield><subfield code="0">http://id.loc.gov/authorities/names/n92043473</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma processing of materials :</subfield><subfield code="b">scientific opportunities and technological challenges /</subfield><subfield code="c">Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.</subfield></datafield><datafield tag="260" ind1=" " ind2=" "><subfield code="a">Washington, D.C. :</subfield><subfield code="b">National Academy Press,</subfield><subfield code="c">1991.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xii, 75 pages) :</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">computer</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="347" ind1=" " ind2=" "><subfield code="a">data file</subfield><subfield code="2">rda</subfield></datafield><datafield tag="588" ind1="0" ind2=" "><subfield code="a">Print version record.</subfield></datafield><datafield tag="506" ind1=" " ind2=" "><subfield code="3">Use copy</subfield><subfield code="f">Restrictions unspecified</subfield><subfield code="2">star</subfield><subfield code="5">MiAaHDL</subfield></datafield><datafield tag="533" ind1=" " ind2=" "><subfield code="a">Electronic reproduction.</subfield><subfield code="b">[S.l.] :</subfield><subfield code="c">HathiTrust Digital Library,</subfield><subfield code="d">2010.</subfield><subfield code="5">MiAaHDL</subfield></datafield><datafield tag="538" ind1=" " ind2=" "><subfield code="a">Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.</subfield><subfield code="u">http://purl.oclc.org/DLF/benchrepro0212</subfield><subfield code="5">MiAaHDL</subfield></datafield><datafield tag="583" ind1="1" ind2=" "><subfield code="a">digitized</subfield><subfield code="c">2010</subfield><subfield code="h">HathiTrust Digital Library</subfield><subfield code="l">committed to preserve</subfield><subfield code="2">pda</subfield><subfield code="5">MiAaHDL</subfield></datafield><datafield tag="546" ind1=" " ind2=" "><subfield code="a">English.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Plasma engineering.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85103069</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Microelectronics</subfield><subfield code="x">Materials</subfield><subfield code="x">Effect of radiation on.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Surfaces (Technology)</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85130750</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Technique des plasmas.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Microélectronique</subfield><subfield code="x">Matériaux</subfield><subfield code="x">Effets du rayonnement sur.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Surfaces (Technologie)</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Mechanical.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Microelectronics</subfield><subfield code="x">Materials</subfield><subfield code="x">Effect of radiation on</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma engineering</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Surfaces (Technology)</subfield><subfield code="2">fast</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Print version:</subfield><subfield code="a">National Research Council (U.S.). Panel on Plasma Processing of Materials.</subfield><subfield code="t">Plasma processing of materials.</subfield><subfield code="d">Washington, D.C. : National Academy Press, 1991</subfield><subfield code="z">0309045975</subfield><subfield code="w">(DLC) 91066812</subfield><subfield code="w">(OCoLC)24832731</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=14049</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ebrary</subfield><subfield code="b">EBRY</subfield><subfield code="n">ebr10055392</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBSCOhost</subfield><subfield code="b">EBSC</subfield><subfield code="n">14049</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ProQuest MyiLibrary Digital eBook Collection</subfield><subfield code="b">IDEB</subfield><subfield code="n">20336</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">2305353</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">6012565</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">Internet Archive</subfield><subfield code="b">INAR</subfield><subfield code="n">plasmaprocessing0000nati</subfield></datafield><datafield tag="994" ind1=" " ind2=" "><subfield code="a">92</subfield><subfield code="b">GEBAY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-863</subfield></datafield></record></collection> |
id | ZDB-4-EBA-ocm43475627 |
illustrated | Illustrated |
indexdate | 2024-11-27T13:15:00Z |
institution | BVB |
institution_GND | http://id.loc.gov/authorities/names/n92043473 |
isbn | 0585084637 9780585084633 1280203366 9781280203367 9786610203369 6610203369 0309583756 9780309583756 |
language | English |
lccn | 91066812 |
oclc_num | 43475627 |
open_access_boolean | |
owner | MAIN DE-863 DE-BY-FWS |
owner_facet | MAIN DE-863 DE-BY-FWS |
physical | 1 online resource (xii, 75 pages) : illustrations |
psigel | ZDB-4-EBA |
publishDate | 1991 |
publishDateSearch | 1991 |
publishDateSort | 1991 |
publisher | National Academy Press, |
record_format | marc |
spelling | National Research Council (U.S.). Panel on Plasma Processing of Materials. http://id.loc.gov/authorities/names/n92043473 Plasma processing of materials : scientific opportunities and technological challenges / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. Washington, D.C. : National Academy Press, 1991. 1 online resource (xii, 75 pages) : illustrations text txt rdacontent computer c rdamedia online resource cr rdacarrier data file rda Print version record. Use copy Restrictions unspecified star MiAaHDL Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL English. Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Microelectronics Materials Effect of radiation on. Surfaces (Technology) http://id.loc.gov/authorities/subjects/sh85130750 Technique des plasmas. Microélectronique Matériaux Effets du rayonnement sur. Surfaces (Technologie) TECHNOLOGY & ENGINEERING Mechanical. bisacsh Microelectronics Materials Effect of radiation on fast Plasma engineering fast Surfaces (Technology) fast Print version: National Research Council (U.S.). Panel on Plasma Processing of Materials. Plasma processing of materials. Washington, D.C. : National Academy Press, 1991 0309045975 (DLC) 91066812 (OCoLC)24832731 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=14049 Volltext |
spellingShingle | Plasma processing of materials : scientific opportunities and technological challenges / Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Microelectronics Materials Effect of radiation on. Surfaces (Technology) http://id.loc.gov/authorities/subjects/sh85130750 Technique des plasmas. Microélectronique Matériaux Effets du rayonnement sur. Surfaces (Technologie) TECHNOLOGY & ENGINEERING Mechanical. bisacsh Microelectronics Materials Effect of radiation on fast Plasma engineering fast Surfaces (Technology) fast |
subject_GND | http://id.loc.gov/authorities/subjects/sh85103069 http://id.loc.gov/authorities/subjects/sh85130750 |
title | Plasma processing of materials : scientific opportunities and technological challenges / |
title_auth | Plasma processing of materials : scientific opportunities and technological challenges / |
title_exact_search | Plasma processing of materials : scientific opportunities and technological challenges / |
title_full | Plasma processing of materials : scientific opportunities and technological challenges / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_fullStr | Plasma processing of materials : scientific opportunities and technological challenges / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_full_unstemmed | Plasma processing of materials : scientific opportunities and technological challenges / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_short | Plasma processing of materials : |
title_sort | plasma processing of materials scientific opportunities and technological challenges |
title_sub | scientific opportunities and technological challenges / |
topic | Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Microelectronics Materials Effect of radiation on. Surfaces (Technology) http://id.loc.gov/authorities/subjects/sh85130750 Technique des plasmas. Microélectronique Matériaux Effets du rayonnement sur. Surfaces (Technologie) TECHNOLOGY & ENGINEERING Mechanical. bisacsh Microelectronics Materials Effect of radiation on fast Plasma engineering fast Surfaces (Technology) fast |
topic_facet | Plasma engineering. Microelectronics Materials Effect of radiation on. Surfaces (Technology) Technique des plasmas. Microélectronique Matériaux Effets du rayonnement sur. Surfaces (Technologie) TECHNOLOGY & ENGINEERING Mechanical. Microelectronics Materials Effect of radiation on Plasma engineering |
url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=14049 |
work_keys_str_mv | AT nationalresearchcounciluspanelonplasmaprocessingofmaterials plasmaprocessingofmaterialsscientificopportunitiesandtechnologicalchallenges |