Chemistry and lithography: Volume 2 Chemistry in Lithography
This volume explores the chemical basis of lithography, with the goal of deconstructing lithography into its essential chemical principles and to situate its various aspects in specific fields of chemistry. It is organized in five parts, comprising: lithographic process chemistry, lithographic mater...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2023]
|
| Ausgabe: | Second edition |
| Online-Zugang: | UER01 Volltext |
| Zusammenfassung: | This volume explores the chemical basis of lithography, with the goal of deconstructing lithography into its essential chemical principles and to situate its various aspects in specific fields of chemistry. It is organized in five parts, comprising: lithographic process chemistry, lithographic materials chemistry, lithographic photo- and radiation chemistry, chemistry of lithographic imaging mechanisms, and lithographic process-induced chemistry. |
| Beschreibung: | 1 Online-Ressource (xxxiv, 794 Seiten) |
| ISBN: | 9781510655584 |
| DOI: | 10.1117/3.2642420 |
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| illustrated | Not Illustrated |
| index_date | 2024-07-03T22:27:38Z |
| indexdate | 2024-07-10T09:54:27Z |
| institution | BVB |
| isbn | 9781510655584 |
| language | English |
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| publisher | SPIE Press |
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| spelling | Okoroanyanwu, Uzodinma Verfasser aut Chemistry and lithography Volume 2 Chemistry in Lithography Uzodinma Okoroanyanwu Second edition Bellingham, Washington, USA SPIE Press [2023] 1 Online-Ressource (xxxiv, 794 Seiten) txt rdacontent c rdamedia cr rdacarrier This volume explores the chemical basis of lithography, with the goal of deconstructing lithography into its essential chemical principles and to situate its various aspects in specific fields of chemistry. It is organized in five parts, comprising: lithographic process chemistry, lithographic materials chemistry, lithographic photo- and radiation chemistry, chemistry of lithographic imaging mechanisms, and lithographic process-induced chemistry. (DE-604)BV046693682 2 Erscheint auch als Druck-Ausgabe 978-1-5106-5557-7 https://doi.org/10.1117/3.2642420 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Okoroanyanwu, Uzodinma Chemistry and lithography |
| title | Chemistry and lithography |
| title_auth | Chemistry and lithography |
| title_exact_search | Chemistry and lithography |
| title_exact_search_txtP | Chemistry and lithography |
| title_full | Chemistry and lithography Volume 2 Chemistry in Lithography Uzodinma Okoroanyanwu |
| title_fullStr | Chemistry and lithography Volume 2 Chemistry in Lithography Uzodinma Okoroanyanwu |
| title_full_unstemmed | Chemistry and lithography Volume 2 Chemistry in Lithography Uzodinma Okoroanyanwu |
| title_short | Chemistry and lithography |
| title_sort | chemistry and lithography chemistry in lithography |
| url | https://doi.org/10.1117/3.2642420 |
| volume_link | (DE-604)BV046693682 |
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