Nanoscale Self-Assembly: Nanopatterning and Metrology:
The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epita...
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Basel
MDPI
2021
|
| Online-Zugang: | kostenfrei kostenfrei |
| Zusammenfassung: | The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed. |
| Beschreibung: | 1 Online-Ressource |
| ISBN: | 9783036519609 |
| DOI: | 10.3390/books978-3-0365-1960-9 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV048252506 | ||
| 003 | DE-604 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 220602s2021 xx o|||| 00||| eng d | ||
| 020 | |a 9783036519609 |c Online, PDF |9 978-3-0365-1960-9 | ||
| 024 | 7 | |a 10.3390/books978-3-0365-1960-9 |2 doi | |
| 035 | |a (OCoLC)1322800435 | ||
| 035 | |a (DE-599)BVBBV048252506 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-12 |a DE-210 |a DE-521 |a DE-1102 |a DE-1046 |a DE-1028 |a DE-1050 |a DE-573 |a DE-M347 |a DE-92 |a DE-1051 |a DE-898 |a DE-859 |a DE-860 |a DE-1049 |a DE-861 |a DE-863 |a DE-862 |a DE-Re13 |a DE-Y3 |a DE-255 |a DE-Y7 |a DE-Y2 |a DE-70 |a DE-2174 |a DE-127 |a DE-22 |a DE-155 |a DE-91 |a DE-384 |a DE-473 |a DE-19 |a DE-355 |a DE-703 |a DE-20 |a DE-706 |a DE-824 |a DE-29 |a DE-739 | ||
| 245 | 1 | 0 | |a Nanoscale Self-Assembly: Nanopatterning and Metrology |c Edited by: Federico Ferrarese Lupi |
| 264 | 1 | |a Basel |b MDPI |c 2021 | |
| 300 | |a 1 Online-Ressource | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 520 | |a The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed. | ||
| 700 | 1 | |a Ferrarese Lupi, Federico |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 978-3-0365-1961-6 |
| 856 | 4 | 0 | |u https://directory.doabooks.org/handle/20.500.12854/77002 |x Verlag |z kostenfrei |3 Volltext |
| 856 | 4 | 0 | |u https://doi.org/10.3390/books978-3-0365-1960-9 |x Verlag |z kostenfrei |3 Volltext |
| 912 | |a ZDB-94-OAB | ||
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-033632808 | |
Datensatz im Suchindex
| _version_ | 1824556055799005185 |
|---|---|
| adam_text | |
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author2 | Ferrarese Lupi, Federico |
| author2_role | edt |
| author2_variant | l f f lf lff |
| author_facet | Ferrarese Lupi, Federico |
| building | Verbundindex |
| bvnumber | BV048252506 |
| collection | ZDB-94-OAB |
| ctrlnum | (OCoLC)1322800435 (DE-599)BVBBV048252506 |
| doi_str_mv | 10.3390/books978-3-0365-1960-9 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00000nam a2200000 c 4500</leader><controlfield tag="001">BV048252506</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">220602s2021 xx o|||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783036519609</subfield><subfield code="c">Online, PDF</subfield><subfield code="9">978-3-0365-1960-9</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.3390/books978-3-0365-1960-9</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1322800435</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV048252506</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-12</subfield><subfield code="a">DE-210</subfield><subfield code="a">DE-521</subfield><subfield code="a">DE-1102</subfield><subfield code="a">DE-1046</subfield><subfield code="a">DE-1028</subfield><subfield code="a">DE-1050</subfield><subfield code="a">DE-573</subfield><subfield code="a">DE-M347</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-1051</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-859</subfield><subfield code="a">DE-860</subfield><subfield code="a">DE-1049</subfield><subfield code="a">DE-861</subfield><subfield code="a">DE-863</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-Re13</subfield><subfield code="a">DE-Y3</subfield><subfield code="a">DE-255</subfield><subfield code="a">DE-Y7</subfield><subfield code="a">DE-Y2</subfield><subfield code="a">DE-70</subfield><subfield code="a">DE-2174</subfield><subfield code="a">DE-127</subfield><subfield code="a">DE-22</subfield><subfield code="a">DE-155</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-384</subfield><subfield code="a">DE-473</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-706</subfield><subfield code="a">DE-824</subfield><subfield code="a">DE-29</subfield><subfield code="a">DE-739</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Nanoscale Self-Assembly: Nanopatterning and Metrology</subfield><subfield code="c">Edited by: Federico Ferrarese Lupi</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Basel</subfield><subfield code="b">MDPI</subfield><subfield code="c">2021</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed.</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ferrarese Lupi, Federico</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, Hardcover</subfield><subfield code="z">978-3-0365-1961-6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://directory.doabooks.org/handle/20.500.12854/77002</subfield><subfield code="x">Verlag</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.3390/books978-3-0365-1960-9</subfield><subfield code="x">Verlag</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-94-OAB</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-033632808</subfield></datafield></record></collection> |
| id | DE-604.BV048252506 |
| illustrated | Not Illustrated |
| index_date | 2024-07-03T19:57:17Z |
| indexdate | 2025-02-20T07:17:29Z |
| institution | BVB |
| isbn | 9783036519609 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-033632808 |
| oclc_num | 1322800435 |
| open_access_boolean | 1 |
| owner | DE-12 DE-210 DE-521 DE-1102 DE-1046 DE-1028 DE-1050 DE-573 DE-M347 DE-92 DE-1051 DE-898 DE-BY-UBR DE-859 DE-860 DE-1049 DE-861 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-Re13 DE-BY-UBR DE-Y3 DE-255 DE-Y7 DE-Y2 DE-70 DE-2174 DE-127 DE-22 DE-BY-UBG DE-155 DE-BY-UBR DE-91 DE-BY-TUM DE-384 DE-473 DE-BY-UBG DE-19 DE-BY-UBM DE-355 DE-BY-UBR DE-703 DE-20 DE-706 DE-824 DE-29 DE-739 |
| owner_facet | DE-12 DE-210 DE-521 DE-1102 DE-1046 DE-1028 DE-1050 DE-573 DE-M347 DE-92 DE-1051 DE-898 DE-BY-UBR DE-859 DE-860 DE-1049 DE-861 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-Re13 DE-BY-UBR DE-Y3 DE-255 DE-Y7 DE-Y2 DE-70 DE-2174 DE-127 DE-22 DE-BY-UBG DE-155 DE-BY-UBR DE-91 DE-BY-TUM DE-384 DE-473 DE-BY-UBG DE-19 DE-BY-UBM DE-355 DE-BY-UBR DE-703 DE-20 DE-706 DE-824 DE-29 DE-739 |
| physical | 1 Online-Ressource |
| psigel | ZDB-94-OAB |
| publishDate | 2021 |
| publishDateSearch | 2021 |
| publishDateSort | 2021 |
| publisher | MDPI |
| record_format | marc |
| spellingShingle | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_auth | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_exact_search | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_exact_search_txtP | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_full | Nanoscale Self-Assembly: Nanopatterning and Metrology Edited by: Federico Ferrarese Lupi |
| title_fullStr | Nanoscale Self-Assembly: Nanopatterning and Metrology Edited by: Federico Ferrarese Lupi |
| title_full_unstemmed | Nanoscale Self-Assembly: Nanopatterning and Metrology Edited by: Federico Ferrarese Lupi |
| title_short | Nanoscale Self-Assembly: Nanopatterning and Metrology |
| title_sort | nanoscale self assembly nanopatterning and metrology |
| url | https://directory.doabooks.org/handle/20.500.12854/77002 https://doi.org/10.3390/books978-3-0365-1960-9 |
| work_keys_str_mv | AT ferrareselupifederico nanoscaleselfassemblynanopatterningandmetrology |