Optical lithography: here is why
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn t...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2021]
|
| Ausgabe: | Second Edition |
| Zusammenfassung: | This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies |
| Beschreibung: | xvii, 560 Seiten Illustrationen, Diagramme |
| ISBN: | 9781510639959 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV047556415 | ||
| 003 | DE-604 | ||
| 005 | 20220119 | ||
| 007 | t | ||
| 008 | 211022s2021 a||| |||| 00||| eng d | ||
| 020 | |a 9781510639959 |c hbk |9 978-1-5106-3995-9 | ||
| 024 | 3 | |a 9781510639959 | |
| 035 | |a (DE-599)BVBBV047556415 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-29T | ||
| 100 | 1 | |a Lin, Burn Jeng |d 1942- |e Verfasser |0 (DE-588)143761455 |4 aut | |
| 245 | 1 | 0 | |a Optical lithography |b here is why |c Burn J. Lin |
| 250 | |a Second Edition | ||
| 264 | 1 | |a Bellingham, Washington, USA |b SPIE Press |c [2021] | |
| 300 | |a xvii, 560 Seiten |b Illustrationen, Diagramme | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 520 | |a This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies | ||
| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe, PDF |z 978-1-5106-3996-6 |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-032931961 | ||
Datensatz im Suchindex
| _version_ | 1804182880414334976 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | Lin, Burn Jeng 1942- |
| author_GND | (DE-588)143761455 |
| author_facet | Lin, Burn Jeng 1942- |
| author_role | aut |
| author_sort | Lin, Burn Jeng 1942- |
| author_variant | b j l bj bjl |
| building | Verbundindex |
| bvnumber | BV047556415 |
| ctrlnum | (DE-599)BVBBV047556415 |
| edition | Second Edition |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01808nam a2200289 c 4500</leader><controlfield tag="001">BV047556415</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20220119 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">211022s2021 a||| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781510639959</subfield><subfield code="c">hbk</subfield><subfield code="9">978-1-5106-3995-9</subfield></datafield><datafield tag="024" ind1="3" ind2=" "><subfield code="a">9781510639959</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV047556415</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Lin, Burn Jeng</subfield><subfield code="d">1942-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)143761455</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Optical lithography</subfield><subfield code="b">here is why</subfield><subfield code="c">Burn J. Lin</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">Second Edition</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Washington, USA</subfield><subfield code="b">SPIE Press</subfield><subfield code="c">[2021]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">xvii, 560 Seiten</subfield><subfield code="b">Illustrationen, Diagramme</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Online-Ausgabe, PDF</subfield><subfield code="z">978-1-5106-3996-6</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-032931961</subfield></datafield></record></collection> |
| id | DE-604.BV047556415 |
| illustrated | Illustrated |
| index_date | 2024-07-03T18:25:57Z |
| indexdate | 2024-07-10T09:14:35Z |
| institution | BVB |
| isbn | 9781510639959 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-032931961 |
| open_access_boolean | |
| owner | DE-29T |
| owner_facet | DE-29T |
| physical | xvii, 560 Seiten Illustrationen, Diagramme |
| publishDate | 2021 |
| publishDateSearch | 2021 |
| publishDateSort | 2021 |
| publisher | SPIE Press |
| record_format | marc |
| spelling | Lin, Burn Jeng 1942- Verfasser (DE-588)143761455 aut Optical lithography here is why Burn J. Lin Second Edition Bellingham, Washington, USA SPIE Press [2021] xvii, 560 Seiten Illustrationen, Diagramme txt rdacontent n rdamedia nc rdacarrier This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies Erscheint auch als Online-Ausgabe, PDF 978-1-5106-3996-6 |
| spellingShingle | Lin, Burn Jeng 1942- Optical lithography here is why |
| title | Optical lithography here is why |
| title_auth | Optical lithography here is why |
| title_exact_search | Optical lithography here is why |
| title_exact_search_txtP | Optical lithography here is why |
| title_full | Optical lithography here is why Burn J. Lin |
| title_fullStr | Optical lithography here is why Burn J. Lin |
| title_full_unstemmed | Optical lithography here is why Burn J. Lin |
| title_short | Optical lithography |
| title_sort | optical lithography here is why |
| title_sub | here is why |
| work_keys_str_mv | AT linburnjeng opticallithographyhereiswhy |