OTDR theory and operation - introducing the OTDR:

The silicon-germanium heterojunction bipolar transistor (SiGe HBT) is the first practical bandgap-engineered device to be realized in silicon. This course will provide a comprehensive review of the state-of-the-art in SiGe HBTs and assess its potential for current and future wireless and wireline ap...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Johnson, Larry (VerfasserIn)
Format: Elektronisch Video
Sprache:English
Veröffentlicht: United States IEEE 2009
Schlagworte:
Online-Zugang:FHN01
TUM01
Zusammenfassung:The silicon-germanium heterojunction bipolar transistor (SiGe HBT) is the first practical bandgap-engineered device to be realized in silicon. This course will provide a comprehensive review of the state-of-the-art in SiGe HBTs and assess its potential for current and future wireless and wireline applications. SiGe HBT technology combines transistor performance competitive with III-V technologies such as GaAs and InP with the processing maturity, integration levels, yield, and cost commonly associated with conventional Si CMOS fabrication. First-generation SiGe HBTs can deliver: fT in excess of 50 GHz, fmax in excess of 70 GHz, minimum noise figure below 0.5 dB at 2.0 GHz, linearity efficiency (OIP3/Pdc) above 10, 1/f noise corner frequencies below 1 kHz, operation at cryogenic temperatures, excellent radiation hardness, as well as yield, reliability and cost comparable to Si. Aggressively-scaled SiGe HBTs can achieve greater than 200 GHz transistor-level performance, and thus are expected to enable Si-based solutions for >40 GB/sec data links and emerging RF, microwave, and even mm-wave systems
Beschreibung:Description based on online resource; title from title screen (IEEE Xplore Digital Library, viewed November 12, 2020)
Beschreibung:1 Online-Resource (1 Videodatei, 60 Minuten) color illustrations
ISBN:9781424461455

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