Optical and EUV lithography: a modeling perspective
"State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and me...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2021]
|
| Schlagworte: | |
| Online-Zugang: | FHD01 UER01 URL des Erstveröffentlichers |
| Zusammenfassung: | "State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and metrology of nanopatterns requires an in depth understanding of all involved physical and chemical effects. This book tries to support such understanding from a modeling-driven perspective, but without a heavy mathematical apparatus. The material for this book was compiled in many years of teaching lectures on "Optical lithography Technology, Physical Effects, and Modeling" at the Friedrich-Alexander-University Erlangen-Nuremberg and in the preparation of dedicated courses on special aspects of lithography. The book is intended to help interested students with background in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology and other areas to get started in the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers to widen their view on alternative methods and applications"-- |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource (xxii, 351 Seiten) |
| ISBN: | 9781510639027 |
| DOI: | 10.1117/3.2576902 |
Internformat
MARC
| LEADER | 00000nmm a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV047189950 | ||
| 003 | DE-604 | ||
| 005 | 20210407 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 210310s2021 |||| o||u| ||||||eng d | ||
| 020 | |a 9781510639027 |c online |9 978-1-5106-3902-7 | ||
| 035 | |a (OCoLC)1241677345 | ||
| 035 | |a (DE-599)BVBBV047189950 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 |a DE-29 | ||
| 100 | 1 | |a Erdmann, Andreas |4 aut | |
| 245 | 1 | 0 | |a Optical and EUV lithography |b a modeling perspective |c Andreas Erdmann |
| 264 | 1 | |a Bellingham, Washington, USA |b SPIE Press |c [2021] | |
| 264 | 4 | |c © 2021 | |
| 300 | |a 1 Online-Ressource (xxii, 351 Seiten) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a Includes bibliographical references and index | ||
| 520 | |a "State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and metrology of nanopatterns requires an in depth understanding of all involved physical and chemical effects. This book tries to support such understanding from a modeling-driven perspective, but without a heavy mathematical apparatus. The material for this book was compiled in many years of teaching lectures on "Optical lithography Technology, Physical Effects, and Modeling" at the Friedrich-Alexander-University Erlangen-Nuremberg and in the preparation of dedicated courses on special aspects of lithography. The book is intended to help interested students with background in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology and other areas to get started in the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers to widen their view on alternative methods and applications"-- | ||
| 650 | 4 | |a Photolithography | |
| 650 | 4 | |a Extreme ultraviolet lithography | |
| 650 | 7 | |a Extreme ultraviolet lithography |2 fast | |
| 650 | 7 | |a Photolithography |2 fast | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, paperback |z 978-1-5106-3901-0 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.2576902 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-032595162 | ||
| 966 | e | |u https://doi.org/10.1117/3.2576902 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1117/3.2576902 |l UER01 |p ZDB-50-SPI |q UER_Paketkauf |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804182287942680576 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | Erdmann, Andreas |
| author_facet | Erdmann, Andreas |
| author_role | aut |
| author_sort | Erdmann, Andreas |
| author_variant | a e ae |
| building | Verbundindex |
| bvnumber | BV047189950 |
| collection | ZDB-50-SPI |
| ctrlnum | (OCoLC)1241677345 (DE-599)BVBBV047189950 |
| doi_str_mv | 10.1117/3.2576902 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02641nmm a2200397 c 4500</leader><controlfield tag="001">BV047189950</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20210407 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">210310s2021 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781510639027</subfield><subfield code="c">online</subfield><subfield code="9">978-1-5106-3902-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1241677345</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV047189950</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield><subfield code="a">DE-29</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Erdmann, Andreas</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Optical and EUV lithography</subfield><subfield code="b">a modeling perspective</subfield><subfield code="c">Andreas Erdmann</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Washington, USA</subfield><subfield code="b">SPIE Press</subfield><subfield code="c">[2021]</subfield></datafield><datafield tag="264" ind1=" " ind2="4"><subfield code="c">© 2021</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xxii, 351 Seiten)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">"State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and metrology of nanopatterns requires an in depth understanding of all involved physical and chemical effects. This book tries to support such understanding from a modeling-driven perspective, but without a heavy mathematical apparatus. The material for this book was compiled in many years of teaching lectures on "Optical lithography Technology, Physical Effects, and Modeling" at the Friedrich-Alexander-University Erlangen-Nuremberg and in the preparation of dedicated courses on special aspects of lithography. The book is intended to help interested students with background in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology and other areas to get started in the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers to widen their view on alternative methods and applications"--</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Extreme ultraviolet lithography</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Extreme ultraviolet lithography</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Photolithography</subfield><subfield code="2">fast</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, paperback</subfield><subfield code="z">978-1-5106-3901-0</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.2576902</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-032595162</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.2576902</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.2576902</subfield><subfield code="l">UER01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="q">UER_Paketkauf</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV047189950 |
| illustrated | Not Illustrated |
| index_date | 2024-07-03T16:47:35Z |
| indexdate | 2024-07-10T09:05:10Z |
| institution | BVB |
| isbn | 9781510639027 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-032595162 |
| oclc_num | 1241677345 |
| open_access_boolean | |
| owner | DE-1050 DE-29 |
| owner_facet | DE-1050 DE-29 |
| physical | 1 Online-Ressource (xxii, 351 Seiten) |
| psigel | ZDB-50-SPI ZDB-50-SPI UER_Paketkauf |
| publishDate | 2021 |
| publishDateSearch | 2021 |
| publishDateSort | 2021 |
| publisher | SPIE Press |
| record_format | marc |
| spelling | Erdmann, Andreas aut Optical and EUV lithography a modeling perspective Andreas Erdmann Bellingham, Washington, USA SPIE Press [2021] © 2021 1 Online-Ressource (xxii, 351 Seiten) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index "State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and metrology of nanopatterns requires an in depth understanding of all involved physical and chemical effects. This book tries to support such understanding from a modeling-driven perspective, but without a heavy mathematical apparatus. The material for this book was compiled in many years of teaching lectures on "Optical lithography Technology, Physical Effects, and Modeling" at the Friedrich-Alexander-University Erlangen-Nuremberg and in the preparation of dedicated courses on special aspects of lithography. The book is intended to help interested students with background in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology and other areas to get started in the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers to widen their view on alternative methods and applications"-- Photolithography Extreme ultraviolet lithography Extreme ultraviolet lithography fast Photolithography fast Erscheint auch als Druck-Ausgabe, paperback 978-1-5106-3901-0 https://doi.org/10.1117/3.2576902 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Erdmann, Andreas Optical and EUV lithography a modeling perspective Photolithography Extreme ultraviolet lithography Extreme ultraviolet lithography fast Photolithography fast |
| title | Optical and EUV lithography a modeling perspective |
| title_auth | Optical and EUV lithography a modeling perspective |
| title_exact_search | Optical and EUV lithography a modeling perspective |
| title_exact_search_txtP | Optical and EUV lithography a modeling perspective |
| title_full | Optical and EUV lithography a modeling perspective Andreas Erdmann |
| title_fullStr | Optical and EUV lithography a modeling perspective Andreas Erdmann |
| title_full_unstemmed | Optical and EUV lithography a modeling perspective Andreas Erdmann |
| title_short | Optical and EUV lithography |
| title_sort | optical and euv lithography a modeling perspective |
| title_sub | a modeling perspective |
| topic | Photolithography Extreme ultraviolet lithography Extreme ultraviolet lithography fast Photolithography fast |
| topic_facet | Photolithography Extreme ultraviolet lithography |
| url | https://doi.org/10.1117/3.2576902 |
| work_keys_str_mv | AT erdmannandreas opticalandeuvlithographyamodelingperspective |