Handbook of silicon wafer cleaning technology:
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal as...
Gespeichert in:
| Weitere Verfasser: | , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Cambridge, MA
William Andrew
[2018]
|
| Ausgabe: | Third edition |
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Online-Zugang: | FLA01 Volltext Volltext |
| Zusammenfassung: | Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource |
| ISBN: | 9780323510851 032351085X 9780323510844 0323510841 |
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:35:55Z |
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| isbn | 9780323510851 032351085X 9780323510844 0323510841 |
| language | English |
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| spelling | Handbook of silicon wafer cleaning technology editors, Karen A. Reinhardt, Werner Kern Third edition Cambridge, MA William Andrew [2018] © 2018 1 online resource txt rdacontent c rdamedia cr rdacarrier Materials science and process technology series Includes bibliographical references and index Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others TECHNOLOGY & ENGINEERING / Mechanical bisacsh Silicon-on-insulator technology fast Silicon-on-insulator technology SOI-Technik (DE-588)4128029-5 gnd rswk-swf Oberflächenreinigung (DE-588)4204243-4 gnd rswk-swf Wafer (DE-588)4294605-0 gnd rswk-swf SOI-Technik (DE-588)4128029-5 s Wafer (DE-588)4294605-0 s Oberflächenreinigung (DE-588)4204243-4 s 1\p DE-604 Reinhardt, Karen A. edt Kern, Werner 1925- edt https://www.sciencedirect.com/science/book/9780323510844 Verlag URL des Erstveröffentlichers Volltext http://www.sciencedirect.com/science/book/9780323510844 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Handbook of silicon wafer cleaning technology TECHNOLOGY & ENGINEERING / Mechanical bisacsh Silicon-on-insulator technology fast Silicon-on-insulator technology SOI-Technik (DE-588)4128029-5 gnd Oberflächenreinigung (DE-588)4204243-4 gnd Wafer (DE-588)4294605-0 gnd |
| subject_GND | (DE-588)4128029-5 (DE-588)4204243-4 (DE-588)4294605-0 |
| title | Handbook of silicon wafer cleaning technology |
| title_auth | Handbook of silicon wafer cleaning technology |
| title_exact_search | Handbook of silicon wafer cleaning technology |
| title_full | Handbook of silicon wafer cleaning technology editors, Karen A. Reinhardt, Werner Kern |
| title_fullStr | Handbook of silicon wafer cleaning technology editors, Karen A. Reinhardt, Werner Kern |
| title_full_unstemmed | Handbook of silicon wafer cleaning technology editors, Karen A. Reinhardt, Werner Kern |
| title_short | Handbook of silicon wafer cleaning technology |
| title_sort | handbook of silicon wafer cleaning technology |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Silicon-on-insulator technology fast Silicon-on-insulator technology SOI-Technik (DE-588)4128029-5 gnd Oberflächenreinigung (DE-588)4204243-4 gnd Wafer (DE-588)4294605-0 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Silicon-on-insulator technology SOI-Technik Oberflächenreinigung Wafer |
| url | https://www.sciencedirect.com/science/book/9780323510844 http://www.sciencedirect.com/science/book/9780323510844 |
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