Materials and Processes for Next Generation Lithography:
Gespeichert in:
| Weitere Verfasser: | , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Amsterdam, Netherlands
Elsevier
2016
|
| Schriftenreihe: | Frontiers of nanoscience
v. 11 |
| Schlagworte: | |
| Online-Zugang: | FLA01 UER01 Volltext |
| Beschreibung: | 1 online resource |
| ISBN: | 9780081003589 0081003587 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV046127032 | ||
| 003 | DE-604 | ||
| 005 | 20200124 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 190827s2016 |||| o||u| ||||||eng d | ||
| 020 | |a 9780081003589 |9 978-0-08-100358-9 | ||
| 020 | |a 0081003587 |9 0-08-100358-7 | ||
| 035 | |a (ZDB-33-ESD)ocn962823082 | ||
| 035 | |a (OCoLC)962823082 | ||
| 035 | |a (DE-599)BVBBV046127032 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-29 | ||
| 082 | 0 | |a 621.38153 |2 23 | |
| 245 | 1 | 0 | |a Materials and Processes for Next Generation Lithography |
| 264 | 1 | |a Amsterdam, Netherlands |b Elsevier |c 2016 | |
| 300 | |a 1 online resource | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Frontiers of nanoscience |v v. 11 | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Mechanical |2 bisacsh | |
| 650 | 7 | |a Microlithography |2 fast | |
| 650 | 7 | |a Photoresists |2 fast | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Photoresists | |
| 700 | 1 | |a Robinson, Alex |4 edt | |
| 700 | 1 | |a Lawson, Richard |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 0081003544 |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 9780081003541 |
| 856 | 4 | 0 | |u http://www.sciencedirect.com/science/bookseries/18762778/11 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-33-ESD |a ZDB-33-EBS | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-031507486 | ||
| 966 | e | |u http://www.sciencedirect.com/science/bookseries/18762778/11 |l FLA01 |p ZDB-33-ESD |q FLA_PDA_ESD |x Verlag |3 Volltext | |
| 966 | e | |u http://www.sciencedirect.com/science/bookseries/18762778/11 |l UER01 |p ZDB-33-EBS |q UER_PDA_EBS_Kauf |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804180447720112128 |
|---|---|
| any_adam_object | |
| author2 | Robinson, Alex Lawson, Richard |
| author2_role | edt edt |
| author2_variant | a r ar r l rl |
| author_facet | Robinson, Alex Lawson, Richard |
| building | Verbundindex |
| bvnumber | BV046127032 |
| collection | ZDB-33-ESD ZDB-33-EBS |
| ctrlnum | (ZDB-33-ESD)ocn962823082 (OCoLC)962823082 (DE-599)BVBBV046127032 |
| dewey-full | 621.38153 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38153 |
| dewey-search | 621.38153 |
| dewey-sort | 3621.38153 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01660nmm a2200445zcb4500</leader><controlfield tag="001">BV046127032</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20200124 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">190827s2016 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780081003589</subfield><subfield code="9">978-0-08-100358-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0081003587</subfield><subfield code="9">0-08-100358-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-33-ESD)ocn962823082</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)962823082</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV046127032</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38153</subfield><subfield code="2">23</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Materials and Processes for Next Generation Lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam, Netherlands</subfield><subfield code="b">Elsevier</subfield><subfield code="c">2016</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Frontiers of nanoscience</subfield><subfield code="v">v. 11</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mechanical</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Microlithography</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Photoresists</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photoresists</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Robinson, Alex</subfield><subfield code="4">edt</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Lawson, Richard</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">0081003544</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">9780081003541</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/bookseries/18762778/11</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield><subfield code="a">ZDB-33-EBS</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-031507486</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/bookseries/18762778/11</subfield><subfield code="l">FLA01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FLA_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/bookseries/18762778/11</subfield><subfield code="l">UER01</subfield><subfield code="p">ZDB-33-EBS</subfield><subfield code="q">UER_PDA_EBS_Kauf</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV046127032 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:35:55Z |
| institution | BVB |
| isbn | 9780081003589 0081003587 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-031507486 |
| oclc_num | 962823082 |
| open_access_boolean | |
| owner | DE-29 |
| owner_facet | DE-29 |
| physical | 1 online resource |
| psigel | ZDB-33-ESD ZDB-33-EBS ZDB-33-ESD FLA_PDA_ESD ZDB-33-EBS UER_PDA_EBS_Kauf |
| publishDate | 2016 |
| publishDateSearch | 2016 |
| publishDateSort | 2016 |
| publisher | Elsevier |
| record_format | marc |
| series2 | Frontiers of nanoscience |
| spelling | Materials and Processes for Next Generation Lithography Amsterdam, Netherlands Elsevier 2016 1 online resource txt rdacontent c rdamedia cr rdacarrier Frontiers of nanoscience v. 11 TECHNOLOGY & ENGINEERING / Mechanical bisacsh Microlithography fast Photoresists fast Microlithography Photoresists Robinson, Alex edt Lawson, Richard edt Erscheint auch als Druck-Ausgabe 0081003544 Erscheint auch als Druck-Ausgabe 9780081003541 http://www.sciencedirect.com/science/bookseries/18762778/11 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Materials and Processes for Next Generation Lithography TECHNOLOGY & ENGINEERING / Mechanical bisacsh Microlithography fast Photoresists fast Microlithography Photoresists |
| title | Materials and Processes for Next Generation Lithography |
| title_auth | Materials and Processes for Next Generation Lithography |
| title_exact_search | Materials and Processes for Next Generation Lithography |
| title_full | Materials and Processes for Next Generation Lithography |
| title_fullStr | Materials and Processes for Next Generation Lithography |
| title_full_unstemmed | Materials and Processes for Next Generation Lithography |
| title_short | Materials and Processes for Next Generation Lithography |
| title_sort | materials and processes for next generation lithography |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Microlithography fast Photoresists fast Microlithography Photoresists |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Microlithography Photoresists |
| url | http://www.sciencedirect.com/science/bookseries/18762778/11 |
| work_keys_str_mv | AT robinsonalex materialsandprocessesfornextgenerationlithography AT lawsonrichard materialsandprocessesfornextgenerationlithography |