Plasma etching processes for interconnect realization in VLSI:
This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions
Saved in:
| Other Authors: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
London
ISTE Press
2015
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| Subjects: | |
| Online Access: | FLA01 Volltext |
| Summary: | This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions |
| Item Description: | Includes bibliographical references and index |
| Physical Description: | 1 online resource |
| ISBN: | 9780081005903 0081005903 |
Staff View
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| id | DE-604.BV046126812 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:35:54Z |
| institution | BVB |
| isbn | 9780081005903 0081005903 |
| language | English |
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| publishDate | 2015 |
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| publisher | ISTE Press |
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| spelling | Plasma etching processes for interconnect realization in VLSI edited by Nicolas Posseme London ISTE Press 2015 1 online resource txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Molded interconnect devices fast Plasma etching fast Integrated circuits Very large scale integration Plasma etching Molded interconnect devices Posseme, Nicolas edt Erscheint auch als Druck-Ausgabe 1785480154 Erscheint auch als Druck-Ausgabe 9781785480157 http://www.sciencedirect.com/science/book/9781785480157 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Plasma etching processes for interconnect realization in VLSI TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Molded interconnect devices fast Plasma etching fast Integrated circuits Very large scale integration Plasma etching Molded interconnect devices |
| title | Plasma etching processes for interconnect realization in VLSI |
| title_auth | Plasma etching processes for interconnect realization in VLSI |
| title_exact_search | Plasma etching processes for interconnect realization in VLSI |
| title_full | Plasma etching processes for interconnect realization in VLSI edited by Nicolas Posseme |
| title_fullStr | Plasma etching processes for interconnect realization in VLSI edited by Nicolas Posseme |
| title_full_unstemmed | Plasma etching processes for interconnect realization in VLSI edited by Nicolas Posseme |
| title_short | Plasma etching processes for interconnect realization in VLSI |
| title_sort | plasma etching processes for interconnect realization in vlsi |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Molded interconnect devices fast Plasma etching fast Integrated circuits Very large scale integration Plasma etching Molded interconnect devices |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Integrated circuits / Very large scale integration Molded interconnect devices Plasma etching Integrated circuits Very large scale integration |
| url | http://www.sciencedirect.com/science/book/9781785480157 |
| work_keys_str_mv | AT possemenicolas plasmaetchingprocessesforinterconnectrealizationinvlsi |