APA (7th ed.) Citation

Doi, T., Marinescu, I. D., & Kurokawa, S. (2012). Advances in CMP/polishing technologies for the manufacture of electronic devices. William Andrew.

Chicago Style (17th ed.) Citation

Doi, Toshiro, Ioan D. Marinescu, and Syuhei Kurokawa. Advances in CMP/polishing Technologies for the Manufacture of Electronic Devices. Oxford: William Andrew, 2012.

MLA (9th ed.) Citation

Doi, Toshiro, et al. Advances in CMP/polishing Technologies for the Manufacture of Electronic Devices. William Andrew, 2012.