Handbook of thin-film deposition processes and techniques: principles, methods, equipment and applications
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers...
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Norwich, N.Y.
Noyes Publications/William Andrew Pub.
© 2002
|
| Ausgabe: | 2nd ed |
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Online-Zugang: | FLA01 URL des Erstveröffentlichers |
| Zusammenfassung: | The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource (xxviii, 629 pages) illustrations |
| ISBN: | 1591241936 9781591241935 9780815517788 0815517785 9780815517764 0815517769 |
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| id | DE-604.BV046124915 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:35:51Z |
| institution | BVB |
| isbn | 1591241936 9781591241935 9780815517788 0815517785 9780815517764 0815517769 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-031505369 |
| oclc_num | 49708503 |
| open_access_boolean | |
| physical | 1 online resource (xxviii, 629 pages) illustrations |
| psigel | ZDB-33-ESD ZDB-33-ESD FLA_PDA_ESD |
| publishDate | 2002 |
| publishDateSearch | 2002 |
| publishDateSort | 2002 |
| publisher | Noyes Publications/William Andrew Pub. |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications edited by Krishna Seshan 2nd ed Norwich, N.Y. Noyes Publications/William Andrew Pub. © 2002 1 online resource (xxviii, 629 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Materials science and process technology series Includes bibliographical references and index The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Chemical vapor deposition fast Thin film devices / Design and construction fast Thin films fast Filmes finos (equipamentos) larpcal Thin film devices Design and construction Handbooks, manuals, etc Thin films Handbooks, manuals, etc Chemical vapor deposition Handbooks, manuals, etc Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 s Fertigung (DE-588)4016899-2 s Dünnschichttechnik (DE-588)4136339-5 s 1\p DE-604 Halbleitertechnologie (DE-588)4158814-9 s 2\p DE-604 Seshan, Krishna Sonstige oth Erscheint auch als Druck-Ausgabe 0815514425 Erscheint auch als Druck-Ausgabe 9780815514428 http://www.sciencedirect.com/science/book/9780815514428 Verlag URL des Erstveröffentlichers Volltext data file rda 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Chemical vapor deposition fast Thin film devices / Design and construction fast Thin films fast Filmes finos (equipamentos) larpcal Thin film devices Design and construction Handbooks, manuals, etc Thin films Handbooks, manuals, etc Chemical vapor deposition Handbooks, manuals, etc Integrierte Schaltung (DE-588)4027242-4 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Fertigung (DE-588)4016899-2 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4136339-5 (DE-588)4016899-2 (DE-588)4158814-9 |
| title | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications |
| title_auth | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications |
| title_exact_search | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications |
| title_full | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications edited by Krishna Seshan |
| title_fullStr | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications edited by Krishna Seshan |
| title_full_unstemmed | Handbook of thin-film deposition processes and techniques principles, methods, equipment and applications edited by Krishna Seshan |
| title_short | Handbook of thin-film deposition processes and techniques |
| title_sort | handbook of thin film deposition processes and techniques principles methods equipment and applications |
| title_sub | principles, methods, equipment and applications |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Chemical vapor deposition fast Thin film devices / Design and construction fast Thin films fast Filmes finos (equipamentos) larpcal Thin film devices Design and construction Handbooks, manuals, etc Thin films Handbooks, manuals, etc Chemical vapor deposition Handbooks, manuals, etc Integrierte Schaltung (DE-588)4027242-4 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Fertigung (DE-588)4016899-2 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Chemical vapor deposition Thin film devices / Design and construction Thin films Filmes finos (equipamentos) Thin film devices Design and construction Handbooks, manuals, etc Thin films Handbooks, manuals, etc Chemical vapor deposition Handbooks, manuals, etc Integrierte Schaltung Dünnschichttechnik Fertigung Halbleitertechnologie |
| url | http://www.sciencedirect.com/science/book/9780815514428 |
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