Handbook of chemical vapor depostion [i.e. deposition] (CVD): principles, technology, and applications

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es...

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Bibliographische Detailangaben
1. Verfasser: Pierson, Hugh O. (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Norwich, N.Y. Noyes Publications/William Andrew Pub. © 1999
Ausgabe:2nd ed
Schriftenreihe:Materials science and process technology series
Schlagworte:
Online-Zugang:FLA01
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Zusammenfassung:Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications
Beschreibung:Includes bibliographical references and index
Paralleltitel: Handbook of chemical vapor deposition
Beschreibung:1 online resource (xxiv, 482 pages) illustrations
ISBN:9780815514329
0815514328
1591240301
9781591240303

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