Principles of physical vapor deposition of thin films:
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Amsterdam Boston London
Elsevier
2006
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Ausgabe: | 1st ed |
Schlagworte: | |
Online-Zugang: | FLA01 Volltext |
Zusammenfassung: | The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text |
Beschreibung: | Includes bibliographical references and index |
Beschreibung: | 1 online resource (xi, 1160 pages) illustrations |
ISBN: | 9780080446998 008044699X 9780080480312 0080480314 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV046123811 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 190827s2006 |||| o||u| ||||||eng d | ||
020 | |a 9780080446998 |9 978-0-08-044699-8 | ||
020 | |a 008044699X |9 0-08-044699-X | ||
020 | |a 9780080480312 |9 978-0-08-048031-2 | ||
020 | |a 0080480314 |9 0-08-048031-4 | ||
035 | |a (ZDB-33-ESD)ocn162568390 | ||
035 | |a (OCoLC)162568390 | ||
035 | |a (DE-599)BVBBV046123811 | ||
040 | |a DE-604 |b ger |e rda | ||
041 | 0 | |a eng | |
082 | 0 | |a 621.38152 |2 22 | |
100 | 1 | |a SreeHarsha, K. S. |e Verfasser |4 aut | |
245 | 1 | 0 | |a Principles of physical vapor deposition of thin films |c K.S. Sree Harsha |
250 | |a 1st ed | ||
264 | 1 | |a Amsterdam |a Boston |a London |b Elsevier |c 2006 | |
300 | |a 1 online resource (xi, 1160 pages) |b illustrations | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a Includes bibliographical references and index | ||
520 | |a The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text | ||
650 | 4 | |a Couches minces | |
650 | 4 | |a Dépôt en phase vapeur | |
650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
650 | 7 | |a Thin films |2 fast | |
650 | 7 | |a Vapor-plating |2 fast | |
650 | 4 | |a Thin films | |
650 | 4 | |a Vapor-plating | |
650 | 0 | 7 | |a PVD-Verfahren |0 (DE-588)4115673-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
689 | 0 | 1 | |a PVD-Verfahren |0 (DE-588)4115673-0 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780080446998 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
912 | |a ZDB-33-ESD | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-031504263 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
966 | e | |u http://www.sciencedirect.com/science/book/9780080446998 |l FLA01 |p ZDB-33-ESD |q FLA_PDA_ESD |x Verlag |3 Volltext |
Datensatz im Suchindex
_version_ | 1804180441163366400 |
---|---|
any_adam_object | |
author | SreeHarsha, K. S. |
author_facet | SreeHarsha, K. S. |
author_role | aut |
author_sort | SreeHarsha, K. S. |
author_variant | k s s ks kss |
building | Verbundindex |
bvnumber | BV046123811 |
collection | ZDB-33-ESD |
ctrlnum | (ZDB-33-ESD)ocn162568390 (OCoLC)162568390 (DE-599)BVBBV046123811 |
dewey-full | 621.38152 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.38152 |
dewey-search | 621.38152 |
dewey-sort | 3621.38152 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
edition | 1st ed |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02834nmm a2200541zc 4500</leader><controlfield tag="001">BV046123811</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">190827s2006 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780080446998</subfield><subfield code="9">978-0-08-044699-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">008044699X</subfield><subfield code="9">0-08-044699-X</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780080480312</subfield><subfield code="9">978-0-08-048031-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0080480314</subfield><subfield code="9">0-08-048031-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-33-ESD)ocn162568390</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)162568390</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV046123811</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38152</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">SreeHarsha, K. S.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Principles of physical vapor deposition of thin films</subfield><subfield code="c">K.S. Sree Harsha</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1st ed</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam</subfield><subfield code="a">Boston</subfield><subfield code="a">London</subfield><subfield code="b">Elsevier</subfield><subfield code="c">2006</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xi, 1160 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Couches minces</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dépôt en phase vapeur</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Solid State</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin films</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Vapor-plating</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780080446998</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-031504263</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/book/9780080446998</subfield><subfield code="l">FLA01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FLA_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
id | DE-604.BV046123811 |
illustrated | Illustrated |
indexdate | 2024-07-10T08:35:48Z |
institution | BVB |
isbn | 9780080446998 008044699X 9780080480312 0080480314 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-031504263 |
oclc_num | 162568390 |
open_access_boolean | |
physical | 1 online resource (xi, 1160 pages) illustrations |
psigel | ZDB-33-ESD ZDB-33-ESD FLA_PDA_ESD |
publishDate | 2006 |
publishDateSearch | 2006 |
publishDateSort | 2006 |
publisher | Elsevier |
record_format | marc |
spelling | SreeHarsha, K. S. Verfasser aut Principles of physical vapor deposition of thin films K.S. Sree Harsha 1st ed Amsterdam Boston London Elsevier 2006 1 online resource (xi, 1160 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text Couches minces Dépôt en phase vapeur TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films fast Vapor-plating fast Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 s PVD-Verfahren (DE-588)4115673-0 s 1\p DE-604 http://www.sciencedirect.com/science/book/9780080446998 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | SreeHarsha, K. S. Principles of physical vapor deposition of thin films Couches minces Dépôt en phase vapeur TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films fast Vapor-plating fast Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd Dünne Schicht (DE-588)4136925-7 gnd |
subject_GND | (DE-588)4115673-0 (DE-588)4136925-7 |
title | Principles of physical vapor deposition of thin films |
title_auth | Principles of physical vapor deposition of thin films |
title_exact_search | Principles of physical vapor deposition of thin films |
title_full | Principles of physical vapor deposition of thin films K.S. Sree Harsha |
title_fullStr | Principles of physical vapor deposition of thin films K.S. Sree Harsha |
title_full_unstemmed | Principles of physical vapor deposition of thin films K.S. Sree Harsha |
title_short | Principles of physical vapor deposition of thin films |
title_sort | principles of physical vapor deposition of thin films |
topic | Couches minces Dépôt en phase vapeur TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films fast Vapor-plating fast Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd Dünne Schicht (DE-588)4136925-7 gnd |
topic_facet | Couches minces Dépôt en phase vapeur TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Thin films Vapor-plating PVD-Verfahren Dünne Schicht |
url | http://www.sciencedirect.com/science/book/9780080446998 |
work_keys_str_mv | AT sreeharshaks principlesofphysicalvapordepositionofthinfilms |