Diamond films: chemical vapor deposition for oriented and heteroepitaxial growth

<Li>Discusses the most advanced techniques for diamond growth</li> <li>Assists diamond researchers in deciding on the most suitable process conditions</li> <li>Inspires readers to devise new CVD (chemical vapor deposition</li> Ever since the early 1980s, and the d...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Kobashi, Koji (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Amsterdam London Elsevier 2005
Ausgabe:1st ed
Schlagworte:
Online-Zugang:FLA01
URL des Erstveröffentlichers
Zusammenfassung:<Li>Discusses the most advanced techniques for diamond growth</li> <li>Assists diamond researchers in deciding on the most suitable process conditions</li> <li>Inspires readers to devise new CVD (chemical vapor deposition</li> Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films
Beschreibung:Includes bibliographical references (pages 319-334) and indexes
Beschreibung:1 online resource (xii, 336 pages) illustrations
ISBN:9780080447230
0080447236
9780080525570
0080525571

Es ist kein Print-Exemplar vorhanden.

Fernleihe Bestellen Achtung: Nicht im THWS-Bestand! Volltext öffnen