Optical diagnostics for thin film processing:
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually n...
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
San Diego, CA
Academic Press
© 1996
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| Schlagworte: | |
| Online-Zugang: | FLA01 Volltext |
| Zusammenfassung: | This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource (xxix, 783 pages) illustrations |
| ISBN: | 9780123420701 0123420709 9780080538082 0080538088 1281033022 9781281033024 |
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| 520 | |a This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic | ||
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Datensatz im Suchindex
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| author | Herman, Irving P. |
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| dewey-ones | 621 - Applied physics |
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| dewey-search | 621.3815/2/0287 |
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| id | DE-604.BV046123079 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:35:47Z |
| institution | BVB |
| isbn | 9780123420701 0123420709 9780080538082 0080538088 1281033022 9781281033024 |
| language | English |
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| physical | 1 online resource (xxix, 783 pages) illustrations |
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| publishDate | 1996 |
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| publisher | Academic Press |
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| spelling | Herman, Irving P. Verfasser aut Optical diagnostics for thin film processing Irving P. Herman San Diego, CA Academic Press © 1996 1 online resource (xxix, 783 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Spectrum analysis / Industrial applications fast Thin films / Surfaces fast Dünne Schicht gnd Optische Eigenschaft gnd Spectroscopie / Applications industrielles ram Couches minces / Surfaces ram Spectroscopie ram Dünne Schicht swd Optische Eigenschaft swd Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Optische Eigenschaft (DE-588)4123887-4 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 s Optische Eigenschaft (DE-588)4123887-4 s 1\p DE-604 http://www.sciencedirect.com/science/book/9780123420701 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Herman, Irving P. Optical diagnostics for thin film processing TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Spectrum analysis / Industrial applications fast Thin films / Surfaces fast Dünne Schicht gnd Optische Eigenschaft gnd Spectroscopie / Applications industrielles ram Couches minces / Surfaces ram Spectroscopie ram Dünne Schicht swd Optische Eigenschaft swd Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd Optische Eigenschaft (DE-588)4123887-4 gnd |
| subject_GND | (DE-588)4136925-7 (DE-588)4123887-4 |
| title | Optical diagnostics for thin film processing |
| title_auth | Optical diagnostics for thin film processing |
| title_exact_search | Optical diagnostics for thin film processing |
| title_full | Optical diagnostics for thin film processing Irving P. Herman |
| title_fullStr | Optical diagnostics for thin film processing Irving P. Herman |
| title_full_unstemmed | Optical diagnostics for thin film processing Irving P. Herman |
| title_short | Optical diagnostics for thin film processing |
| title_sort | optical diagnostics for thin film processing |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Spectrum analysis / Industrial applications fast Thin films / Surfaces fast Dünne Schicht gnd Optische Eigenschaft gnd Spectroscopie / Applications industrielles ram Couches minces / Surfaces ram Spectroscopie ram Dünne Schicht swd Optische Eigenschaft swd Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd Optische Eigenschaft (DE-588)4123887-4 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Spectrum analysis / Industrial applications Thin films / Surfaces Dünne Schicht Optische Eigenschaft Spectroscopie / Applications industrielles Couches minces / Surfaces Spectroscopie Thin films Surfaces Spectrum analysis Industrial applications |
| url | http://www.sciencedirect.com/science/book/9780123420701 |
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