Plasma deposition of amorphous silicon-based materials:
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference...
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boston
Academic Press
© 1995
|
| Schriftenreihe: | Plasma--materials interactions
|
| Schlagworte: | |
| Online-Zugang: | FLA01 Volltext |
| Zusammenfassung: | Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource (xi, 324 pages) illustrations |
| ISBN: | 9780080539102 0080539106 1281054100 9781281054104 |
Internformat
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| 490 | 0 | |a Plasma--materials interactions | |
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| 520 | |a Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
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| 650 | 7 | |a Amorphous semiconductors / Design and construction |2 fast | |
| 650 | 7 | |a Plasma-enhanced chemical vapor deposition |2 fast | |
| 650 | 7 | |a Silicon alloys |2 fast | |
| 650 | 4 | |a Amorphous semiconductors |x Design and construction | |
| 650 | 4 | |a Silicon alloys | |
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Datensatz im Suchindex
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| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV046123076 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:35:47Z |
| institution | BVB |
| isbn | 9780080539102 0080539106 1281054100 9781281054104 |
| language | English |
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| psigel | ZDB-33-ESD ZDB-33-ESD FLA_PDA_ESD |
| publishDate | 1995 |
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| publisher | Academic Press |
| record_format | marc |
| series2 | Plasma--materials interactions |
| spelling | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan Boston Academic Press © 1995 1 online resource (xi, 324 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Plasma--materials interactions Includes bibliographical references and index Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Siliciumverbindungen (DE-588)4124194-0 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Amorpher Halbleiter (DE-588)4001756-4 s Siliciumverbindungen (DE-588)4124194-0 s PECVD-Verfahren (DE-588)4267316-1 s 2\p DE-604 Bruno, Giovanni Sonstige oth Capezzuto, Pio Sonstige oth Madan, A. Sonstige oth Erscheint auch als Druck-Ausgabe 012137940X Erscheint auch als Druck-Ausgabe 9780121379407 http://www.sciencedirect.com/science/book/9780121379407 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Plasma deposition of amorphous silicon-based materials TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Siliciumverbindungen (DE-588)4124194-0 gnd |
| subject_GND | (DE-588)4001756-4 (DE-588)4267316-1 (DE-588)4124194-0 (DE-588)4143413-4 |
| title | Plasma deposition of amorphous silicon-based materials |
| title_auth | Plasma deposition of amorphous silicon-based materials |
| title_exact_search | Plasma deposition of amorphous silicon-based materials |
| title_full | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_fullStr | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_full_unstemmed | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_short | Plasma deposition of amorphous silicon-based materials |
| title_sort | plasma deposition of amorphous silicon based materials |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Siliciumverbindungen (DE-588)4124194-0 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Amorphous semiconductors / Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Amorphous semiconductors Design and construction Amorpher Halbleiter PECVD-Verfahren Siliciumverbindungen Aufsatzsammlung |
| url | http://www.sciencedirect.com/science/book/9780121379407 |
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