Soft UV nanoimprint lithography: concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch
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Format: | Abschlussarbeit Buch |
Sprache: | English |
Veröffentlicht: |
Ilmenau
11.06.2018
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Online-Zugang: | Inhaltsverzeichnis Inhaltsverzeichnis |
Beschreibung: | VIII, 120 Seiten, Seite CXXI-CXXXVII Illustrationen, Diagramme |
Internformat
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Datensatz im Suchindex
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any_adam_object | |
author | Si, Shuhao 1986- |
author_GND | (DE-588)1162845260 |
author_facet | Si, Shuhao 1986- |
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author_sort | Si, Shuhao 1986- |
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building | Verbundindex |
bvnumber | BV046034805 |
classification_rvk | ZN 3700 |
ctrlnum | (OCoLC)1137835186 (DE-599)GBV1025508742 |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Thesis Book |
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language | English |
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physical | VIII, 120 Seiten, Seite CXXI-CXXXVII Illustrationen, Diagramme |
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spelling | Si, Shuhao 1986- Verfasser (DE-588)1162845260 aut Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch vorgelegt von M.Sc. Shuhao Si Ilmenau 11.06.2018 VIII, 120 Seiten, Seite CXXI-CXXXVII Illustrationen, Diagramme txt rdacontent n rdamedia nc rdacarrier Dissertation Technische Universität Ilmenau 2018 Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Nanoprägen (DE-588)7546601-6 gnd rswk-swf Nanostrukturiertes Material (DE-588)4342626-8 gnd rswk-swf Nanotechnologie (DE-588)4327470-5 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Lithografie Halbleitertechnologie (DE-588)4191584-7 s Nanoprägen (DE-588)7546601-6 s Nanostrukturiertes Material (DE-588)4342626-8 s Nanotechnologie (DE-588)4327470-5 s DE-604 DE-601 application/pdf http://www.gbv.de/dms/ilmenau/toc/1025508742.PDF Inhaltsverzeichnis Inhaltsverzeichnis DE-601 text/plain http://www.gbv.de/dms/ilmenau/abs/1025508742si.txt Abstract Inhaltsverzeichnis |
spellingShingle | Si, Shuhao 1986- Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Nanoprägen (DE-588)7546601-6 gnd Nanostrukturiertes Material (DE-588)4342626-8 gnd Nanotechnologie (DE-588)4327470-5 gnd |
subject_GND | (DE-588)4191584-7 (DE-588)7546601-6 (DE-588)4342626-8 (DE-588)4327470-5 (DE-588)4113937-9 |
title | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch |
title_auth | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch |
title_exact_search | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch |
title_full | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch vorgelegt von M.Sc. Shuhao Si |
title_fullStr | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch vorgelegt von M.Sc. Shuhao Si |
title_full_unstemmed | Soft UV nanoimprint lithography concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch vorgelegt von M.Sc. Shuhao Si |
title_short | Soft UV nanoimprint lithography |
title_sort | soft uv nanoimprint lithography concept development and fabrication of nanostructures with tunable feature sizes at constant pitch |
title_sub | concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch |
topic | Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Nanoprägen (DE-588)7546601-6 gnd Nanostrukturiertes Material (DE-588)4342626-8 gnd Nanotechnologie (DE-588)4327470-5 gnd |
topic_facet | Lithografie Halbleitertechnologie Nanoprägen Nanostrukturiertes Material Nanotechnologie Hochschulschrift |
url | http://www.gbv.de/dms/ilmenau/toc/1025508742.PDF http://www.gbv.de/dms/ilmenau/abs/1025508742si.txt |
work_keys_str_mv | AT sishuhao softuvnanoimprintlithographyconceptdevelopmentandfabricationofnanostructureswithtunablefeaturesizesatconstantpitch |
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