Principles of lithography:
"This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, to...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2019]
|
| Ausgabe: | Fourth edition |
| Schlagworte: | |
| Online-Zugang: | FHD01 URL des Erstveröffentlichers |
| Zusammenfassung: | "This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus"-- |
| Beschreibung: | 1 Online-Ressource |
| ISBN: | 9781510627611 |
| DOI: | 10.1117/3.2525393 |
Internformat
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| 100 | 1 | |a Levinson, Harry J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Principles of lithography |c Harry J. Levinson |
| 250 | |a Fourth edition | ||
| 264 | 1 | |a Bellingham, Washington, USA |b SPIE Press |c [2019] | |
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| 505 | 8 | |a Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques | |
| 520 | |a "This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus"-- | ||
| 650 | 4 | |a Integrated circuits / Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 7 | |a Integrated circuits / Design and construction |2 fast | |
| 650 | 7 | |a Microlithography |2 fast | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
| _version_ | 1804180078185152512 |
|---|---|
| any_adam_object | |
| author | Levinson, Harry J. |
| author_facet | Levinson, Harry J. |
| author_role | aut |
| author_sort | Levinson, Harry J. |
| author_variant | h j l hj hjl |
| building | Verbundindex |
| bvnumber | BV045908646 |
| collection | ZDB-50-SPI |
| contents | Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques |
| ctrlnum | (OCoLC)1104925230 (DE-599)BVBBV045908646 |
| doi_str_mv | 10.1117/3.2525393 |
| edition | Fourth edition |
| format | Electronic eBook |
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| id | DE-604.BV045908646 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:30:02Z |
| institution | BVB |
| isbn | 9781510627611 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-031291306 |
| oclc_num | 1104925230 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 Online-Ressource |
| psigel | ZDB-50-SPI |
| publishDate | 2019 |
| publishDateSearch | 2019 |
| publishDateSort | 2019 |
| publisher | SPIE Press |
| record_format | marc |
| spelling | Levinson, Harry J. Verfasser aut Principles of lithography Harry J. Levinson Fourth edition Bellingham, Washington, USA SPIE Press [2019] 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques "This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus"-- Integrated circuits / Design and construction Microlithography Integrated circuits / Design and construction fast Microlithography fast Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s 1\p DE-604 Erscheint auch als Online-Ausgabe, epub 978-1-5106-2762-8 Erscheint auch als Online-Ausgabe, mobi 978-1-5106-2763-5 Erscheint auch als Druck-Ausgabe, softcover 978-1-5106-2760-4 https://doi.org/10.1117/3.2525393 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Levinson, Harry J. Principles of lithography Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques Integrated circuits / Design and construction Microlithography Integrated circuits / Design and construction fast Microlithography fast Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4191584-7 |
| title | Principles of lithography |
| title_auth | Principles of lithography |
| title_exact_search | Principles of lithography |
| title_full | Principles of lithography Harry J. Levinson |
| title_fullStr | Principles of lithography Harry J. Levinson |
| title_full_unstemmed | Principles of lithography Harry J. Levinson |
| title_short | Principles of lithography |
| title_sort | principles of lithography |
| topic | Integrated circuits / Design and construction Microlithography Integrated circuits / Design and construction fast Microlithography fast Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie |
| url | https://doi.org/10.1117/3.2525393 |
| work_keys_str_mv | AT levinsonharryj principlesoflithography |