Chemical process design and simulation: Aspen Plus and Aspen HYSYS applications
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Bibliographic Details
Main Author: Haydary, Juma (Author)
Format: Book
Language:English
Published: Hoboken Wiley 2019
Subjects:
Physical Description:xliv, 391 Seiten Illustrationen, Diagramme
ISBN:9781119089117

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection!