Characterization in silicon processing: = Silicon processing
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
New York, NY
Momentum Press
2010
|
Schriftenreihe: | Materials characterization series
|
Schlagworte: | |
Beschreibung: | Print version record. - "First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--Title page verso |
Beschreibung: | 1 online resource (xv, 240 pages) illustrations |
ISBN: | 9781606501115 1606501119 9781606501092 1606501097 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV045344516 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 181206s2010 |||| o||u| ||||||eng d | ||
020 | |a 9781606501115 |9 978-1-60650-111-5 | ||
020 | |a 1606501119 |9 1-60650-111-9 | ||
020 | |a 9781606501092 |9 978-1-60650-109-2 | ||
020 | |a 1606501097 |9 1-60650-109-7 | ||
035 | |a (ZDB-4-ENC)ocn752976145 | ||
035 | |a (OCoLC)752976145 | ||
035 | |a (DE-599)BVBBV045344516 | ||
040 | |a DE-604 |b ger |e rda | ||
041 | 0 | |a eng | |
082 | 0 | |a 620.193 | |
245 | 1 | 0 | |a Characterization in silicon processing |b = Silicon processing |c editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans |
246 | 1 | 3 | |a Silicon processing |
246 | 1 | 1 | |a Silicon processing |
264 | 1 | |a New York, NY |b Momentum Press |c 2010 | |
300 | |a 1 online resource (xv, 240 pages) |b illustrations | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a Materials characterization series | |
500 | |a Print version record. - "First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--Title page verso | ||
505 | 8 | |a With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic | |
650 | 7 | |a TECHNOLOGY & ENGINEERING / Material Science |2 bisacsh | |
650 | 7 | |a Electric conductors |2 fast | |
650 | 7 | |a Semiconductor films |2 fast | |
650 | 7 | |a Silicon |2 fast | |
650 | 7 | |a Surface chemistry |2 fast | |
650 | 4 | |a Silicon |a Electric conductors |a Semiconductor films |a Surface chemistry | |
650 | 0 | 7 | |a Silicone |0 (DE-588)4127342-4 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Silicone |0 (DE-588)4127342-4 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
700 | 1 | |a Strausser, Yale |e Sonstige |4 oth | |
700 | 1 | |a Brundle, C. Richard |e Sonstige |4 oth | |
700 | 1 | |a Evans, Charles A. |e Sonstige |4 oth | |
776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |t Characterization in silicon processing |d New York : Momentum Press, 2010 |z 1606501097 |
912 | |a ZDB-4-ENC | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-030731220 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk |
Datensatz im Suchindex
_version_ | 1804179164348022784 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV045344516 |
collection | ZDB-4-ENC |
contents | With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic |
ctrlnum | (ZDB-4-ENC)ocn752976145 (OCoLC)752976145 (DE-599)BVBBV045344516 |
dewey-full | 620.193 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 620 - Engineering and allied operations |
dewey-raw | 620.193 |
dewey-search | 620.193 |
dewey-sort | 3620.193 |
dewey-tens | 620 - Engineering and allied operations |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02707nmm a2200529zc 4500</leader><controlfield tag="001">BV045344516</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">181206s2010 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781606501115</subfield><subfield code="9">978-1-60650-111-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1606501119</subfield><subfield code="9">1-60650-111-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781606501092</subfield><subfield code="9">978-1-60650-109-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1606501097</subfield><subfield code="9">1-60650-109-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-ENC)ocn752976145</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)752976145</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV045344516</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620.193</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Characterization in silicon processing</subfield><subfield code="b">= Silicon processing</subfield><subfield code="c">editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Silicon processing</subfield></datafield><datafield tag="246" ind1="1" ind2="1"><subfield code="a">Silicon processing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York, NY</subfield><subfield code="b">Momentum Press</subfield><subfield code="c">2010</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xv, 240 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials characterization series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Print version record. - "First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--Title page verso</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Material Science</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Electric conductors</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconductor films</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Silicon</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Surface chemistry</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Silicon</subfield><subfield code="a">Electric conductors</subfield><subfield code="a">Semiconductor films</subfield><subfield code="a">Surface chemistry</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicone</subfield><subfield code="0">(DE-588)4127342-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Silicone</subfield><subfield code="0">(DE-588)4127342-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Strausser, Yale</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Brundle, C. Richard</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Evans, Charles A.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="t">Characterization in silicon processing</subfield><subfield code="d">New York : Momentum Press, 2010</subfield><subfield code="z">1606501097</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-ENC</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030731220</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
id | DE-604.BV045344516 |
illustrated | Illustrated |
indexdate | 2024-07-10T08:15:31Z |
institution | BVB |
isbn | 9781606501115 1606501119 9781606501092 1606501097 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030731220 |
oclc_num | 752976145 |
open_access_boolean | |
physical | 1 online resource (xv, 240 pages) illustrations |
psigel | ZDB-4-ENC |
publishDate | 2010 |
publishDateSearch | 2010 |
publishDateSort | 2010 |
publisher | Momentum Press |
record_format | marc |
series2 | Materials characterization series |
spelling | Characterization in silicon processing = Silicon processing editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans Silicon processing New York, NY Momentum Press 2010 1 online resource (xv, 240 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Materials characterization series Print version record. - "First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--Title page verso With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic TECHNOLOGY & ENGINEERING / Material Science bisacsh Electric conductors fast Semiconductor films fast Silicon fast Surface chemistry fast Silicon Electric conductors Semiconductor films Surface chemistry Silicone (DE-588)4127342-4 gnd rswk-swf Silicone (DE-588)4127342-4 s 1\p DE-604 Strausser, Yale Sonstige oth Brundle, C. Richard Sonstige oth Evans, Charles A. Sonstige oth Erscheint auch als Druck-Ausgabe Characterization in silicon processing New York : Momentum Press, 2010 1606501097 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Characterization in silicon processing = Silicon processing With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic TECHNOLOGY & ENGINEERING / Material Science bisacsh Electric conductors fast Semiconductor films fast Silicon fast Surface chemistry fast Silicon Electric conductors Semiconductor films Surface chemistry Silicone (DE-588)4127342-4 gnd |
subject_GND | (DE-588)4127342-4 |
title | Characterization in silicon processing = Silicon processing |
title_alt | Silicon processing |
title_auth | Characterization in silicon processing = Silicon processing |
title_exact_search | Characterization in silicon processing = Silicon processing |
title_full | Characterization in silicon processing = Silicon processing editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans |
title_fullStr | Characterization in silicon processing = Silicon processing editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans |
title_full_unstemmed | Characterization in silicon processing = Silicon processing editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans |
title_short | Characterization in silicon processing |
title_sort | characterization in silicon processing silicon processing |
title_sub | = Silicon processing |
topic | TECHNOLOGY & ENGINEERING / Material Science bisacsh Electric conductors fast Semiconductor films fast Silicon fast Surface chemistry fast Silicon Electric conductors Semiconductor films Surface chemistry Silicone (DE-588)4127342-4 gnd |
topic_facet | TECHNOLOGY & ENGINEERING / Material Science Electric conductors Semiconductor films Silicon Surface chemistry Silicon Electric conductors Semiconductor films Surface chemistry Silicone |
work_keys_str_mv | AT strausseryale characterizationinsiliconprocessingsiliconprocessing AT brundlecrichard characterizationinsiliconprocessingsiliconprocessing AT evanscharlesa characterizationinsiliconprocessingsiliconprocessing AT strausseryale siliconprocessing AT brundlecrichard siliconprocessing AT evanscharlesa siliconprocessing |