Plasma deposition of amorphous silicon-based materials:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boston
Academic Press
1995
|
| Schriftenreihe: | Plasma--materials interactions
|
| Schlagworte: | |
| Beschreibung: | Print version record |
| Beschreibung: | 1 online resource (xi, 324 pages) illustrations |
| ISBN: | 9780080539102 0080539106 1281054100 9781281054104 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV045342230 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 181206s1995 |||| o||u| ||||||eng d | ||
| 020 | |a 9780080539102 |9 978-0-08-053910-2 | ||
| 020 | |a 0080539106 |9 0-08-053910-6 | ||
| 020 | |a 1281054100 |9 1-281-05410-0 | ||
| 020 | |a 9781281054104 |9 978-1-281-05410-4 | ||
| 035 | |a (ZDB-4-ENC)ocn175286921 | ||
| 035 | |a (OCoLC)175286921 | ||
| 035 | |a (DE-599)BVBBV045342230 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 082 | 0 | |a 621.3815/2 |2 22 | |
| 245 | 1 | 0 | |a Plasma deposition of amorphous silicon-based materials |c edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| 264 | 1 | |a Boston |b Academic Press |c 1995 | |
| 300 | |a 1 online resource (xi, 324 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Plasma--materials interactions | |
| 500 | |a Print version record | ||
| 505 | 8 | |a Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
| 650 | 7 | |a Amorphous semiconductors / Design and construction |2 fast | |
| 650 | 7 | |a Plasma-enhanced chemical vapor deposition |2 fast | |
| 650 | 7 | |a Silicon alloys |2 fast | |
| 650 | 4 | |a Amorphous semiconductors |x Design and construction |a Silicon alloys |a Plasma-enhanced chemical vapor deposition | |
| 650 | 0 | 7 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |8 1\p |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |D s |
| 689 | 0 | 1 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |D s |
| 689 | 0 | 2 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 0 | |8 2\p |5 DE-604 | |
| 700 | 1 | |a Bruno, Giovanni |e Sonstige |4 oth | |
| 700 | 1 | |a Capezzuto, Pio |e Sonstige |4 oth | |
| 700 | 1 | |a Madan, A. |e Sonstige |4 oth | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |t Plasma deposition of amorphous silicon-based materials |d Boston : Academic Press, 1995 |z 012137940X |z 9780121379407 |
| 912 | |a ZDB-4-ENC | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030728932 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804179159769939968 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV045342230 |
| collection | ZDB-4-ENC |
| contents | Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced |
| ctrlnum | (ZDB-4-ENC)ocn175286921 (OCoLC)175286921 (DE-599)BVBBV045342230 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03027nmm a2200577zc 4500</leader><controlfield tag="001">BV045342230</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">181206s1995 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780080539102</subfield><subfield code="9">978-0-08-053910-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0080539106</subfield><subfield code="9">0-08-053910-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1281054100</subfield><subfield code="9">1-281-05410-0</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781281054104</subfield><subfield code="9">978-1-281-05410-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-ENC)ocn175286921</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)175286921</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV045342230</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma deposition of amorphous silicon-based materials</subfield><subfield code="c">edited by Giovanni Bruno, Pio Capezzuto, Arun Madan</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston</subfield><subfield code="b">Academic Press</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xi, 324 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Plasma--materials interactions</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Print version record</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Solid State</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Amorphous semiconductors / Design and construction</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma-enhanced chemical vapor deposition</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Silicon alloys</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Amorphous semiconductors</subfield><subfield code="x">Design and construction</subfield><subfield code="a">Silicon alloys</subfield><subfield code="a">Plasma-enhanced chemical vapor deposition</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Siliciumverbindungen</subfield><subfield code="0">(DE-588)4124194-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Amorpher Halbleiter</subfield><subfield code="0">(DE-588)4001756-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)4143413-4</subfield><subfield code="a">Aufsatzsammlung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Amorpher Halbleiter</subfield><subfield code="0">(DE-588)4001756-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Siliciumverbindungen</subfield><subfield code="0">(DE-588)4124194-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bruno, Giovanni</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Capezzuto, Pio</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Madan, A.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="t">Plasma deposition of amorphous silicon-based materials</subfield><subfield code="d">Boston : Academic Press, 1995</subfield><subfield code="z">012137940X</subfield><subfield code="z">9780121379407</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-ENC</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030728932</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| genre | 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV045342230 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:15:26Z |
| institution | BVB |
| isbn | 9780080539102 0080539106 1281054100 9781281054104 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030728932 |
| oclc_num | 175286921 |
| open_access_boolean | |
| physical | 1 online resource (xi, 324 pages) illustrations |
| psigel | ZDB-4-ENC |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | Academic Press |
| record_format | marc |
| series2 | Plasma--materials interactions |
| spelling | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan Boston Academic Press 1995 1 online resource (xi, 324 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Plasma--materials interactions Print version record Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Siliciumverbindungen (DE-588)4124194-0 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Amorpher Halbleiter (DE-588)4001756-4 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Amorpher Halbleiter (DE-588)4001756-4 s Siliciumverbindungen (DE-588)4124194-0 s PECVD-Verfahren (DE-588)4267316-1 s 2\p DE-604 Bruno, Giovanni Sonstige oth Capezzuto, Pio Sonstige oth Madan, A. Sonstige oth Erscheint auch als Druck-Ausgabe Plasma deposition of amorphous silicon-based materials Boston : Academic Press, 1995 012137940X 9780121379407 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Plasma deposition of amorphous silicon-based materials Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Siliciumverbindungen (DE-588)4124194-0 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Amorpher Halbleiter (DE-588)4001756-4 gnd |
| subject_GND | (DE-588)4124194-0 (DE-588)4267316-1 (DE-588)4001756-4 (DE-588)4143413-4 |
| title | Plasma deposition of amorphous silicon-based materials |
| title_auth | Plasma deposition of amorphous silicon-based materials |
| title_exact_search | Plasma deposition of amorphous silicon-based materials |
| title_full | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_fullStr | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_full_unstemmed | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_short | Plasma deposition of amorphous silicon-based materials |
| title_sort | plasma deposition of amorphous silicon based materials |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Siliciumverbindungen (DE-588)4124194-0 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Amorpher Halbleiter (DE-588)4001756-4 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Amorphous semiconductors / Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Siliciumverbindungen PECVD-Verfahren Amorpher Halbleiter Aufsatzsammlung |
| work_keys_str_mv | AT brunogiovanni plasmadepositionofamorphoussiliconbasedmaterials AT capezzutopio plasmadepositionofamorphoussiliconbasedmaterials AT madana plasmadepositionofamorphoussiliconbasedmaterials |