Principles of Chemical Vapor Deposition:
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equip...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Dordrecht
Springer Netherlands
2003
|
| Schlagworte: | |
| Online-Zugang: | UBT01 Volltext |
| Zusammenfassung: | Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding |
| Beschreibung: | 1 Online-Ressource (XI, 273 p) |
| ISBN: | 9789401703697 |
| DOI: | 10.1007/978-94-017-0369-7 |
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Datensatz im Suchindex
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| doi_str_mv | 10.1007/978-94-017-0369-7 |
| format | Electronic eBook |
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| id | DE-604.BV045152389 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:10:08Z |
| institution | BVB |
| isbn | 9789401703697 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030542057 |
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| physical | 1 Online-Ressource (XI, 273 p) |
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| publishDate | 2003 |
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| publisher | Springer Netherlands |
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| spelling | Dobkin, Daniel M. Verfasser aut Principles of Chemical Vapor Deposition by Daniel M. Dobkin, Michael K. Zuraw Dordrecht Springer Netherlands 2003 1 Online-Ressource (XI, 273 p) txt rdacontent c rdamedia cr rdacarrier Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding Materials Science Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Manufacturing, Machines, Tools Nuclear Physics, Heavy Ions, Hadrons Materials science Chemical engineering Nuclear physics Heavy ions Hadrons Manufacturing industries Machines Tools CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s 1\p DE-604 Zuraw, Michael K. aut Erscheint auch als Druck-Ausgabe 9789048162772 https://doi.org/10.1007/978-94-017-0369-7 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Dobkin, Daniel M. Zuraw, Michael K. Principles of Chemical Vapor Deposition Materials Science Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Manufacturing, Machines, Tools Nuclear Physics, Heavy Ions, Hadrons Materials science Chemical engineering Nuclear physics Heavy ions Hadrons Manufacturing industries Machines Tools CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4009846-1 |
| title | Principles of Chemical Vapor Deposition |
| title_auth | Principles of Chemical Vapor Deposition |
| title_exact_search | Principles of Chemical Vapor Deposition |
| title_full | Principles of Chemical Vapor Deposition by Daniel M. Dobkin, Michael K. Zuraw |
| title_fullStr | Principles of Chemical Vapor Deposition by Daniel M. Dobkin, Michael K. Zuraw |
| title_full_unstemmed | Principles of Chemical Vapor Deposition by Daniel M. Dobkin, Michael K. Zuraw |
| title_short | Principles of Chemical Vapor Deposition |
| title_sort | principles of chemical vapor deposition |
| topic | Materials Science Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Manufacturing, Machines, Tools Nuclear Physics, Heavy Ions, Hadrons Materials science Chemical engineering Nuclear physics Heavy ions Hadrons Manufacturing industries Machines Tools CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | Materials Science Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Manufacturing, Machines, Tools Nuclear Physics, Heavy Ions, Hadrons Materials science Chemical engineering Nuclear physics Heavy ions Hadrons Manufacturing industries Machines Tools CVD-Verfahren |
| url | https://doi.org/10.1007/978-94-017-0369-7 |
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