Borst, C. L., Gill, W. N., & Gutmann, R. J. (2002). Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology. Springer US. https://doi.org/10.1007/978-1-4615-1165-6
Chicago-Zitierstil (17. Ausg.)Borst, Christopher L., William N. Gill, und Ronald J. Gutmann. Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology. Boston, MA: Springer US, 2002. https://doi.org/10.1007/978-1-4615-1165-6.
MLA-Zitierstil (9. Ausg.)Borst, Christopher L., et al. Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology. Springer US, 2002. https://doi.org/10.1007/978-1-4615-1165-6.