Microsystem Design:
It is a real pleasure to write the Foreword for this book, both because I have known and respected its author for many years and because I expect this book's publication will mark an important milestone in the continuing worldwide development of microsystems. By bringing together all aspects of...
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| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston, MA
Springer US
2001
|
| Schlagworte: | |
| Online-Zugang: | BTU01 FHI01 Volltext |
| Zusammenfassung: | It is a real pleasure to write the Foreword for this book, both because I have known and respected its author for many years and because I expect this book's publication will mark an important milestone in the continuing worldwide development of microsystems. By bringing together all aspects of microsystem design, it can be expected to facilitate the training of not only a new generation of engineers, but perhaps a whole new type of engineer - one capable of addressing the complex range of problems involved in reducing entire systems to the micro- and nano-domains. This book breaks down disciplinary barriers to set the stage for systems we do not even dream of today. Microsystems have a long history, dating back to the earliest days of mic- electronics. While integrated circuits developed in the early 1960s, a number of laboratories worked to use the same technology base to form integrated sensors. The idea was to reduce cost and perhaps put the sensors and circuits together on the same chip. By the late-60s, integrated MOS-photodiode arrays had been developed for visible imaging, and silicon etching was being used to create thin diaphragms that could convert pressure into an electrical signal. By 1970, selective anisotropic etching was being used for diaphragm formation, retaining a thick silicon rim to absorb package-induced stresses. Impurity- and electrochemically-based etch-stops soon emerged, and "bulk micromachining" came into its own |
| Beschreibung: | 1 Online-Ressource (XXVI, 689 p. 145 illus) |
| ISBN: | 9780306476013 |
| DOI: | 10.1007/b117574 |
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Datensatz im Suchindex
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| id | DE-604.BV045148495 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:10:01Z |
| institution | BVB |
| isbn | 9780306476013 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030538194 |
| oclc_num | 1050943329 |
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| owner_facet | DE-573 DE-634 |
| physical | 1 Online-Ressource (XXVI, 689 p. 145 illus) |
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| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | Springer US |
| record_format | marc |
| spelling | Senturia, Stephen D. 1940- Verfasser (DE-588)172402751 aut Microsystem Design by Stephen D. Senturia Boston, MA Springer US 2001 1 Online-Ressource (XXVI, 689 p. 145 illus) txt rdacontent c rdamedia cr rdacarrier It is a real pleasure to write the Foreword for this book, both because I have known and respected its author for many years and because I expect this book's publication will mark an important milestone in the continuing worldwide development of microsystems. By bringing together all aspects of microsystem design, it can be expected to facilitate the training of not only a new generation of engineers, but perhaps a whole new type of engineer - one capable of addressing the complex range of problems involved in reducing entire systems to the micro- and nano-domains. This book breaks down disciplinary barriers to set the stage for systems we do not even dream of today. Microsystems have a long history, dating back to the earliest days of mic- electronics. While integrated circuits developed in the early 1960s, a number of laboratories worked to use the same technology base to form integrated sensors. The idea was to reduce cost and perhaps put the sensors and circuits together on the same chip. By the late-60s, integrated MOS-photodiode arrays had been developed for visible imaging, and silicon etching was being used to create thin diaphragms that could convert pressure into an electrical signal. By 1970, selective anisotropic etching was being used for diaphragm formation, retaining a thick silicon rim to absorb package-induced stresses. Impurity- and electrochemically-based etch-stops soon emerged, and "bulk micromachining" came into its own Engineering Electrical Engineering Optical and Electronic Materials Mechanics Electrical engineering Optical materials Electronic materials Mikrosystemtechnik (DE-588)4221617-5 gnd rswk-swf MEMS (DE-588)4824724-8 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 s 1\p DE-604 MEMS (DE-588)4824724-8 s 2\p DE-604 Erscheint auch als Druck-Ausgabe 9780792372462 https://doi.org/10.1007/b117574 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Senturia, Stephen D. 1940- Microsystem Design Engineering Electrical Engineering Optical and Electronic Materials Mechanics Electrical engineering Optical materials Electronic materials Mikrosystemtechnik (DE-588)4221617-5 gnd MEMS (DE-588)4824724-8 gnd |
| subject_GND | (DE-588)4221617-5 (DE-588)4824724-8 |
| title | Microsystem Design |
| title_auth | Microsystem Design |
| title_exact_search | Microsystem Design |
| title_full | Microsystem Design by Stephen D. Senturia |
| title_fullStr | Microsystem Design by Stephen D. Senturia |
| title_full_unstemmed | Microsystem Design by Stephen D. Senturia |
| title_short | Microsystem Design |
| title_sort | microsystem design |
| topic | Engineering Electrical Engineering Optical and Electronic Materials Mechanics Electrical engineering Optical materials Electronic materials Mikrosystemtechnik (DE-588)4221617-5 gnd MEMS (DE-588)4824724-8 gnd |
| topic_facet | Engineering Electrical Engineering Optical and Electronic Materials Mechanics Electrical engineering Optical materials Electronic materials Mikrosystemtechnik MEMS |
| url | https://doi.org/10.1007/b117574 |
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