Plasma etching processes for CMOS device realization:
Saved in:
| Other Authors: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
London, UK
ISTE Press
2017
|
| Subjects: | |
| Online Access: | FLA01 Volltext |
| Item Description: | Includes bibliographical references and index |
| Physical Description: | 1 online resource (x, 121 pages) illustrations |
| ISBN: | 9780081011966 0081011962 |
Staff View
MARC
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| 245 | 1 | 0 | |a Plasma etching processes for CMOS device realization |c edited by Nicolas Posseme |
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Record in the Search Index
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| author2_role | edt |
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| author_facet | Posseme, Nicolas |
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV045131686 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:09:35Z |
| institution | BVB |
| isbn | 9780081011966 0081011962 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030521679 |
| oclc_num | 970659018 |
| open_access_boolean | |
| physical | 1 online resource (x, 121 pages) illustrations |
| psigel | ZDB-33-ESD ZDB-33-EBS ZDB-33-ESD FLA_PDA_ESD |
| publishDate | 2017 |
| publishDateSearch | 2017 |
| publishDateSort | 2017 |
| publisher | ISTE Press |
| record_format | marc |
| spelling | Plasma etching processes for CMOS device realization edited by Nicolas Posseme London, UK ISTE Press 2017 1 online resource (x, 121 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary Posseme, Nicolas edt Erscheint auch als Druck-Ausgabe 9781785480966 Erscheint auch als Druck-Ausgabe 1785480960 http://www.sciencedirect.com/science/book/9781785480966 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Plasma etching processes for CMOS device realization TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary |
| title | Plasma etching processes for CMOS device realization |
| title_auth | Plasma etching processes for CMOS device realization |
| title_exact_search | Plasma etching processes for CMOS device realization |
| title_full | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_fullStr | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_full_unstemmed | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_short | Plasma etching processes for CMOS device realization |
| title_sort | plasma etching processes for cmos device realization |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Metal oxide semiconductors, Complementary Plasma etching |
| url | http://www.sciencedirect.com/science/book/9781785480966 |
| work_keys_str_mv | AT possemenicolas plasmaetchingprocessesforcmosdevicerealization |