Plasma etching processes for CMOS device realization:
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
London, UK
ISTE Press
2017
|
| Schlagworte: | |
| Online-Zugang: | FLA01 URL des Erstveröffentlichers |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource (x, 121 pages) illustrations |
| ISBN: | 9780081011966 0081011962 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV045131686 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 180814s2017 |||| o||u| ||||||eng d | ||
| 020 | |a 9780081011966 |9 978-0-08-101196-6 | ||
| 020 | |a 0081011962 |9 0-08-101196-2 | ||
| 035 | |a (ZDB-33-ESD)ocn970659018 | ||
| 035 | |a (OCoLC)970659018 | ||
| 035 | |a (DE-599)BVBBV045131686 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 082 | 0 | |a 621.3815/2 |2 23 | |
| 245 | 1 | 0 | |a Plasma etching processes for CMOS device realization |c edited by Nicolas Posseme |
| 264 | 1 | |a London, UK |b ISTE Press |c 2017 | |
| 300 | |a 1 online resource (x, 121 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a Includes bibliographical references and index | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
| 650 | 7 | |a Metal oxide semiconductors, Complementary |2 fast | |
| 650 | 7 | |a Plasma etching |2 fast | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Metal oxide semiconductors, Complementary | |
| 700 | 1 | |a Posseme, Nicolas |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 9781785480966 |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 1785480960 |
| 856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9781785480966 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-33-ESD |a ZDB-33-EBS | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030521679 | ||
| 966 | e | |u http://www.sciencedirect.com/science/book/9781785480966 |l FLA01 |p ZDB-33-ESD |q FLA_PDA_ESD |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804178791491174400 |
|---|---|
| any_adam_object | |
| author2 | Posseme, Nicolas |
| author2_role | edt |
| author2_variant | n p np |
| author_facet | Posseme, Nicolas |
| building | Verbundindex |
| bvnumber | BV045131686 |
| collection | ZDB-33-ESD ZDB-33-EBS |
| ctrlnum | (ZDB-33-ESD)ocn970659018 (OCoLC)970659018 (DE-599)BVBBV045131686 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01595nmm a2200409zc 4500</leader><controlfield tag="001">BV045131686</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">180814s2017 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780081011966</subfield><subfield code="9">978-0-08-101196-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0081011962</subfield><subfield code="9">0-08-101196-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-33-ESD)ocn970659018</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)970659018</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV045131686</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">23</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma etching processes for CMOS device realization</subfield><subfield code="c">edited by Nicolas Posseme</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">London, UK</subfield><subfield code="b">ISTE Press</subfield><subfield code="c">2017</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (x, 121 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Metal oxide semiconductors, Complementary</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Metal oxide semiconductors, Complementary</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Posseme, Nicolas</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">9781785480966</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">1785480960</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9781785480966</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield><subfield code="a">ZDB-33-EBS</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030521679</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/book/9781785480966</subfield><subfield code="l">FLA01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FLA_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV045131686 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:09:35Z |
| institution | BVB |
| isbn | 9780081011966 0081011962 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030521679 |
| oclc_num | 970659018 |
| open_access_boolean | |
| physical | 1 online resource (x, 121 pages) illustrations |
| psigel | ZDB-33-ESD ZDB-33-EBS ZDB-33-ESD FLA_PDA_ESD |
| publishDate | 2017 |
| publishDateSearch | 2017 |
| publishDateSort | 2017 |
| publisher | ISTE Press |
| record_format | marc |
| spelling | Plasma etching processes for CMOS device realization edited by Nicolas Posseme London, UK ISTE Press 2017 1 online resource (x, 121 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary Posseme, Nicolas edt Erscheint auch als Druck-Ausgabe 9781785480966 Erscheint auch als Druck-Ausgabe 1785480960 http://www.sciencedirect.com/science/book/9781785480966 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Plasma etching processes for CMOS device realization TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary |
| title | Plasma etching processes for CMOS device realization |
| title_auth | Plasma etching processes for CMOS device realization |
| title_exact_search | Plasma etching processes for CMOS device realization |
| title_full | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_fullStr | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_full_unstemmed | Plasma etching processes for CMOS device realization edited by Nicolas Posseme |
| title_short | Plasma etching processes for CMOS device realization |
| title_sort | plasma etching processes for cmos device realization |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Metal oxide semiconductors, Complementary fast Plasma etching fast Plasma etching Metal oxide semiconductors, Complementary |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Metal oxide semiconductors, Complementary Plasma etching |
| url | http://www.sciencedirect.com/science/book/9781785480966 |
| work_keys_str_mv | AT possemenicolas plasmaetchingprocessesforcmosdevicerealization |