Villasmunta, F. (2018). Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis.
Chicago-Zitierstil (17. Ausg.)Villasmunta, Francesco. Etching of Deep Silicon Patterns by Means of an Inductively Coupled Plasma Discharge and Emission Spectroscopic Analysis. Wildau, 2018.
MLA-Zitierstil (9. Ausg.)Villasmunta, Francesco. Etching of Deep Silicon Patterns by Means of an Inductively Coupled Plasma Discharge and Emission Spectroscopic Analysis. 2018.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.