Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis:
Maschinenbau
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | German |
| Veröffentlicht: |
Wildau
2018
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Zusammenfassung: | Maschinenbau |
| Beschreibung: | 90 Blätter Illustrationen 1 CD-ROM |
Internformat
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Datensatz im Suchindex
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| author | Villasmunta, Francesco |
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| indexdate | 2024-07-10T08:08:42Z |
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| language | German |
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| spelling | Villasmunta, Francesco Verfasser aut Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis Wildau 2018 90 Blätter Illustrationen 1 CD-ROM txt rdacontent n rdamedia nc rdacarrier Masterarbeit Technische Hochschule A2018/0452 Maschinenbau Plasma (DE-588)4046249-3 gnd rswk-swf Emissionsspektroskopie (DE-588)4152080-4 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Plasma (DE-588)4046249-3 s Emissionsspektroskopie (DE-588)4152080-4 s DE-604 Heinrich, Friedhelm 1952- (DE-588)172705541 dgs application/pdf http://wilbert.kobv.de/tocs/236511.pdf Inhaltsverzeichnis |
| spellingShingle | Villasmunta, Francesco Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis Plasma (DE-588)4046249-3 gnd Emissionsspektroskopie (DE-588)4152080-4 gnd |
| subject_GND | (DE-588)4046249-3 (DE-588)4152080-4 (DE-588)4113937-9 |
| title | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_auth | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_exact_search | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_full | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_fullStr | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_full_unstemmed | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_short | Etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| title_sort | etching of deep silicon patterns by means of an inductively coupled plasma discharge and emission spectroscopic analysis |
| topic | Plasma (DE-588)4046249-3 gnd Emissionsspektroskopie (DE-588)4152080-4 gnd |
| topic_facet | Plasma Emissionsspektroskopie Hochschulschrift |
| url | http://wilbert.kobv.de/tocs/236511.pdf |
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