Silicon technologies: ion implantation and thermal treatment
Saved in:
| Format: | Electronic eBook |
|---|---|
| Language: | English |
| Published: |
London
ISTE
2011
|
| Subjects: | |
| Physical Description: | xvii, 337 p. |
| ISBN: | 9781848212312 1848212313 9781118601112 |
Staff View
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV044850353 | ||
| 003 | DE-604 | ||
| 005 | 20180305 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 180305s2011 |||| o||u| ||||||eng d | ||
| 020 | |a 9781848212312 |c hc |9 978-1-84821-231-2 | ||
| 020 | |a 1848212313 |9 1-84821-231-3 | ||
| 020 | |a 9781118601112 |c Online |9 978-1-118-60111-2 | ||
| 035 | |a (ZDB-38-ESG)ebr10660607 | ||
| 035 | |a (OCoLC)828672185 | ||
| 035 | |a (DE-599)BVBBV044850353 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 082 | 0 | |a 621.3815/2 |2 22 | |
| 245 | 1 | 0 | |a Silicon technologies |b ion implantation and thermal treatment |c edited by Annie Baudrant |
| 264 | 1 | |a London |b ISTE |c 2011 | |
| 300 | |a xvii, 337 p. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 505 | 8 | |a Includes bibliographical references and index | |
| 505 | 8 | |a The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion | |
| 650 | 4 | |a Semiconductor doping | |
| 650 | 4 | |a Ion implantation | |
| 650 | 4 | |a Semiconductors |x Heat treatment | |
| 700 | 1 | |a Baudrant, Annie |e Sonstige |4 oth | |
| 912 | |a ZDB-38-ESG | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030245213 | ||
Record in the Search Index
| _version_ | 1804178366128979968 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV044850353 |
| collection | ZDB-38-ESG |
| contents | Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion |
| ctrlnum | (ZDB-38-ESG)ebr10660607 (OCoLC)828672185 (DE-599)BVBBV044850353 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01321nmm a2200361zc 4500</leader><controlfield tag="001">BV044850353</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180305 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">180305s2011 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781848212312</subfield><subfield code="c">hc</subfield><subfield code="9">978-1-84821-231-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1848212313</subfield><subfield code="9">1-84821-231-3</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781118601112</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-118-60111-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-38-ESG)ebr10660607</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)828672185</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044850353</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Silicon technologies</subfield><subfield code="b">ion implantation and thermal treatment</subfield><subfield code="c">edited by Annie Baudrant</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">London</subfield><subfield code="b">ISTE</subfield><subfield code="c">2011</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">xvii, 337 p.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductor doping</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion implantation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Heat treatment</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Baudrant, Annie</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-38-ESG</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030245213</subfield></datafield></record></collection> |
| id | DE-604.BV044850353 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:02:49Z |
| institution | BVB |
| isbn | 9781848212312 1848212313 9781118601112 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030245213 |
| oclc_num | 828672185 |
| open_access_boolean | |
| physical | xvii, 337 p. |
| psigel | ZDB-38-ESG |
| publishDate | 2011 |
| publishDateSearch | 2011 |
| publishDateSort | 2011 |
| publisher | ISTE |
| record_format | marc |
| spelling | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant London ISTE 2011 xvii, 337 p. txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion Semiconductor doping Ion implantation Semiconductors Heat treatment Baudrant, Annie Sonstige oth |
| spellingShingle | Silicon technologies ion implantation and thermal treatment Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion Semiconductor doping Ion implantation Semiconductors Heat treatment |
| title | Silicon technologies ion implantation and thermal treatment |
| title_auth | Silicon technologies ion implantation and thermal treatment |
| title_exact_search | Silicon technologies ion implantation and thermal treatment |
| title_full | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_fullStr | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_full_unstemmed | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_short | Silicon technologies |
| title_sort | silicon technologies ion implantation and thermal treatment |
| title_sub | ion implantation and thermal treatment |
| topic | Semiconductor doping Ion implantation Semiconductors Heat treatment |
| topic_facet | Semiconductor doping Ion implantation Semiconductors Heat treatment |
| work_keys_str_mv | AT baudrantannie silicontechnologiesionimplantationandthermaltreatment |