Silicon technologies: ion implantation and thermal treatment
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
London
ISTE
2011
|
| Schlagworte: | |
| Beschreibung: | xvii, 337 p. |
| ISBN: | 9781848212312 1848212313 9781118601112 |
Internformat
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| 020 | |a 9781118601112 |c Online |9 978-1-118-60111-2 | ||
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| 082 | 0 | |a 621.3815/2 |2 22 | |
| 245 | 1 | 0 | |a Silicon technologies |b ion implantation and thermal treatment |c edited by Annie Baudrant |
| 264 | 1 | |a London |b ISTE |c 2011 | |
| 300 | |a xvii, 337 p. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 505 | 8 | |a Includes bibliographical references and index | |
| 505 | 8 | |a The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion | |
| 650 | 4 | |a Semiconductor doping | |
| 650 | 4 | |a Ion implantation | |
| 650 | 4 | |a Semiconductors |x Heat treatment | |
| 700 | 1 | |a Baudrant, Annie |e Sonstige |4 oth | |
| 912 | |a ZDB-38-ESG | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030245213 | ||
Datensatz im Suchindex
| _version_ | 1804178366128979968 |
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| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV044850353 |
| collection | ZDB-38-ESG |
| contents | Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion |
| ctrlnum | (ZDB-38-ESG)ebr10660607 (OCoLC)828672185 (DE-599)BVBBV044850353 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV044850353 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:02:49Z |
| institution | BVB |
| isbn | 9781848212312 1848212313 9781118601112 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030245213 |
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| open_access_boolean | |
| physical | xvii, 337 p. |
| psigel | ZDB-38-ESG |
| publishDate | 2011 |
| publishDateSearch | 2011 |
| publishDateSort | 2011 |
| publisher | ISTE |
| record_format | marc |
| spelling | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant London ISTE 2011 xvii, 337 p. txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion Semiconductor doping Ion implantation Semiconductors Heat treatment Baudrant, Annie Sonstige oth |
| spellingShingle | Silicon technologies ion implantation and thermal treatment Includes bibliographical references and index The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion Semiconductor doping Ion implantation Semiconductors Heat treatment |
| title | Silicon technologies ion implantation and thermal treatment |
| title_auth | Silicon technologies ion implantation and thermal treatment |
| title_exact_search | Silicon technologies ion implantation and thermal treatment |
| title_full | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_fullStr | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_full_unstemmed | Silicon technologies ion implantation and thermal treatment edited by Annie Baudrant |
| title_short | Silicon technologies |
| title_sort | silicon technologies ion implantation and thermal treatment |
| title_sub | ion implantation and thermal treatment |
| topic | Semiconductor doping Ion implantation Semiconductors Heat treatment |
| topic_facet | Semiconductor doping Ion implantation Semiconductors Heat treatment |
| work_keys_str_mv | AT baudrantannie silicontechnologiesionimplantationandthermaltreatment |