Electromigration in ULSI interconnections:
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Hackensack, N.J.
World Scientific
c2010
|
Schriftenreihe: | International series on advances in solid state electronics and technology
|
Schlagworte: | |
Beschreibung: | xix, 291 p. |
ISBN: | 9814273325 9789814273329 9789814273336 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
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001 | BV044845856 | ||
003 | DE-604 | ||
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008 | 180305s2010 |||| o||u| ||||||eng d | ||
020 | |a 9814273325 |9 981-4273-32-5 | ||
020 | |a 9789814273329 |9 978-981-4273-32-9 | ||
020 | |a 9789814273336 |c Online |9 978-981-4273-33-6 | ||
035 | |a (ZDB-38-ESG)ebr10480052 | ||
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035 | |a (DE-599)BVBBV044845856 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
100 | 1 | |a Tan, Cher Ming |d 1959- |e Verfasser |4 aut | |
245 | 1 | 0 | |a Electromigration in ULSI interconnections |c Cher Ming Tan |
264 | 1 | |a Hackensack, N.J. |b World Scientific |c c2010 | |
300 | |a xix, 291 p. | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a International series on advances in solid state electronics and technology | |
505 | 8 | |a Includes bibliographical references and index | |
650 | 4 | |a Integrated circuits |x Ultra large scale integration | |
650 | 4 | |a Electrodiffusion | |
912 | |a ZDB-38-ESG | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-030240718 |
Datensatz im Suchindex
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---|---|
any_adam_object | |
author | Tan, Cher Ming 1959- |
author_facet | Tan, Cher Ming 1959- |
author_role | aut |
author_sort | Tan, Cher Ming 1959- |
author_variant | c m t cm cmt |
building | Verbundindex |
bvnumber | BV044845856 |
collection | ZDB-38-ESG |
contents | Includes bibliographical references and index |
ctrlnum | (ZDB-38-ESG)ebr10480052 (OCoLC)714877548 (DE-599)BVBBV044845856 |
format | Electronic eBook |
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id | DE-604.BV044845856 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T08:02:42Z |
institution | BVB |
isbn | 9814273325 9789814273329 9789814273336 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030240718 |
oclc_num | 714877548 |
open_access_boolean | |
physical | xix, 291 p. |
psigel | ZDB-38-ESG |
publishDate | 2010 |
publishDateSearch | 2010 |
publishDateSort | 2010 |
publisher | World Scientific |
record_format | marc |
series2 | International series on advances in solid state electronics and technology |
spelling | Tan, Cher Ming 1959- Verfasser aut Electromigration in ULSI interconnections Cher Ming Tan Hackensack, N.J. World Scientific c2010 xix, 291 p. txt rdacontent c rdamedia cr rdacarrier International series on advances in solid state electronics and technology Includes bibliographical references and index Integrated circuits Ultra large scale integration Electrodiffusion |
spellingShingle | Tan, Cher Ming 1959- Electromigration in ULSI interconnections Includes bibliographical references and index Integrated circuits Ultra large scale integration Electrodiffusion |
title | Electromigration in ULSI interconnections |
title_auth | Electromigration in ULSI interconnections |
title_exact_search | Electromigration in ULSI interconnections |
title_full | Electromigration in ULSI interconnections Cher Ming Tan |
title_fullStr | Electromigration in ULSI interconnections Cher Ming Tan |
title_full_unstemmed | Electromigration in ULSI interconnections Cher Ming Tan |
title_short | Electromigration in ULSI interconnections |
title_sort | electromigration in ulsi interconnections |
topic | Integrated circuits Ultra large scale integration Electrodiffusion |
topic_facet | Integrated circuits Ultra large scale integration Electrodiffusion |
work_keys_str_mv | AT tancherming electromigrationinulsiinterconnections |