Computational lithography:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Oxford
Wiley-Blackwell
2010
|
| Schriftenreihe: | Wiley series in pure and applied optics
|
| Schlagworte: | |
| Beschreibung: | xv, 226 p. |
| ISBN: | 9780470596975 047059697X |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV044844042 | ||
| 003 | DE-604 | ||
| 005 | 20180305 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 180305s2010 |||| o||u| ||||||eng d | ||
| 020 | |a 9780470596975 |9 978-0-470-59697-5 | ||
| 020 | |a 047059697X |9 0-470-59697-X | ||
| 035 | |a (ZDB-38-ESG)ebr10419114 | ||
| 035 | |a (OCoLC)689995793 | ||
| 035 | |a (DE-599)BVBBV044844042 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 082 | 0 | |a 621.381531 |2 22 | |
| 100 | 1 | |a Ma, Xu |d 1983- |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Computational lithography |c Xu Ma and Gonzalo R. Arce |
| 264 | 1 | |a Oxford |b Wiley-Blackwell |c 2010 | |
| 300 | |a xv, 226 p. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Wiley series in pure and applied optics | |
| 505 | 8 | |a Includes bibliographical references and index | |
| 650 | 4 | |a Microlithography |x Mathematics | |
| 650 | 4 | |a Integrated circuits |x Design and construction |x Mathematics | |
| 650 | 4 | |a Photolithography |x Mathematics | |
| 650 | 4 | |a Semiconductors |x Etching |x Mathematics | |
| 650 | 4 | |a Resolution (Optics) | |
| 700 | 1 | |a Arce, Gonzalo R. |e Sonstige |4 oth | |
| 912 | |a ZDB-38-ESG | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030238905 | ||
Datensatz im Suchindex
| _version_ | 1804178354565283840 |
|---|---|
| any_adam_object | |
| author | Ma, Xu 1983- |
| author_facet | Ma, Xu 1983- |
| author_role | aut |
| author_sort | Ma, Xu 1983- |
| author_variant | x m xm |
| building | Verbundindex |
| bvnumber | BV044844042 |
| collection | ZDB-38-ESG |
| contents | Includes bibliographical references and index |
| ctrlnum | (ZDB-38-ESG)ebr10419114 (OCoLC)689995793 (DE-599)BVBBV044844042 |
| dewey-full | 621.381531 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381531 |
| dewey-search | 621.381531 |
| dewey-sort | 3621.381531 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV044844042 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:02:38Z |
| institution | BVB |
| isbn | 9780470596975 047059697X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030238905 |
| oclc_num | 689995793 |
| open_access_boolean | |
| physical | xv, 226 p. |
| psigel | ZDB-38-ESG |
| publishDate | 2010 |
| publishDateSearch | 2010 |
| publishDateSort | 2010 |
| publisher | Wiley-Blackwell |
| record_format | marc |
| series2 | Wiley series in pure and applied optics |
| spelling | Ma, Xu 1983- Verfasser aut Computational lithography Xu Ma and Gonzalo R. Arce Oxford Wiley-Blackwell 2010 xv, 226 p. txt rdacontent c rdamedia cr rdacarrier Wiley series in pure and applied optics Includes bibliographical references and index Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) Arce, Gonzalo R. Sonstige oth |
| spellingShingle | Ma, Xu 1983- Computational lithography Includes bibliographical references and index Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) |
| title | Computational lithography |
| title_auth | Computational lithography |
| title_exact_search | Computational lithography |
| title_full | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_fullStr | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_full_unstemmed | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_short | Computational lithography |
| title_sort | computational lithography |
| topic | Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) |
| topic_facet | Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) |
| work_keys_str_mv | AT maxu computationallithography AT arcegonzalor computationallithography |