Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English German |
| Veröffentlicht: |
Chemnitz
Technische Universität Chemnitz
2016
|
| Schlagworte: | |
| Beschreibung: | 171 Blätter Illustrationen, Diagramme |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV044828684 | ||
| 003 | DE-604 | ||
| 005 | 20190108 | ||
| 007 | t | ||
| 008 | 180305s2016 a||| m||| 00||| eng d | ||
| 035 | |a (OCoLC)1057308724 | ||
| 035 | |a (DE-599)BSZ500128219 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 1 | |a eng |h ger | |
| 049 | |a DE-83 | ||
| 100 | 1 | |a Dhakal, Dileep |d 1986- |e Verfasser |0 (DE-588)1153215780 |4 aut | |
| 245 | 1 | 0 | |a Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |c vorgelegt von M.Sc. Dileep Dhakal |
| 246 | 1 | 3 | |a Untersuchungen zum Wachstum ultradünner Kupfer- und Kupferoxid Schichten mittels Atomlagenabscheidung |
| 264 | 1 | |a Chemnitz |b Technische Universität Chemnitz |c 2016 | |
| 300 | |a 171 Blätter |b Illustrationen, Diagramme | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 502 | |b Dissertation |c Technische Universität Chemnitz |d 2016 | ||
| 650 | 0 | 7 | |a Kupfer |0 (DE-588)4033734-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a ULSI |0 (DE-588)4226286-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Metallisierungsschicht |0 (DE-588)4296760-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Reduktion |0 (DE-588)4177306-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Kupferoxide |0 (DE-588)4166141-2 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Kupfer |0 (DE-588)4033734-0 |D s |
| 689 | 0 | 1 | |a Kupferoxide |0 (DE-588)4166141-2 |D s |
| 689 | 0 | 2 | |a Metallisierungsschicht |0 (DE-588)4296760-0 |D s |
| 689 | 0 | 3 | |a Reduktion |0 (DE-588)4177306-8 |D s |
| 689 | 0 | 4 | |a ULSI |0 (DE-588)4226286-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030223556 | ||
Datensatz im Suchindex
| _version_ | 1804178328189403136 |
|---|---|
| any_adam_object | |
| author | Dhakal, Dileep 1986- |
| author_GND | (DE-588)1153215780 |
| author_facet | Dhakal, Dileep 1986- |
| author_role | aut |
| author_sort | Dhakal, Dileep 1986- |
| author_variant | d d dd |
| building | Verbundindex |
| bvnumber | BV044828684 |
| ctrlnum | (OCoLC)1057308724 (DE-599)BSZ500128219 |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01634nam a2200409 c 4500</leader><controlfield tag="001">BV044828684</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20190108 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">180305s2016 a||| m||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1057308724</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BSZ500128219</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="1" ind2=" "><subfield code="a">eng</subfield><subfield code="h">ger</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-83</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Dhakal, Dileep</subfield><subfield code="d">1986-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)1153215780</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition</subfield><subfield code="c">vorgelegt von M.Sc. Dileep Dhakal</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Untersuchungen zum Wachstum ultradünner Kupfer- und Kupferoxid Schichten mittels Atomlagenabscheidung</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Chemnitz</subfield><subfield code="b">Technische Universität Chemnitz</subfield><subfield code="c">2016</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">171 Blätter</subfield><subfield code="b">Illustrationen, Diagramme</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="b">Dissertation</subfield><subfield code="c">Technische Universität Chemnitz</subfield><subfield code="d">2016</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Kupfer</subfield><subfield code="0">(DE-588)4033734-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">ULSI</subfield><subfield code="0">(DE-588)4226286-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Metallisierungsschicht</subfield><subfield code="0">(DE-588)4296760-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Reduktion</subfield><subfield code="0">(DE-588)4177306-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Kupferoxide</subfield><subfield code="0">(DE-588)4166141-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Kupfer</subfield><subfield code="0">(DE-588)4033734-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Kupferoxide</subfield><subfield code="0">(DE-588)4166141-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Metallisierungsschicht</subfield><subfield code="0">(DE-588)4296760-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="3"><subfield code="a">Reduktion</subfield><subfield code="0">(DE-588)4177306-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="4"><subfield code="a">ULSI</subfield><subfield code="0">(DE-588)4226286-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030223556</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV044828684 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:02:13Z |
| institution | BVB |
| language | English German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030223556 |
| oclc_num | 1057308724 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | 171 Blätter Illustrationen, Diagramme |
| publishDate | 2016 |
| publishDateSearch | 2016 |
| publishDateSort | 2016 |
| publisher | Technische Universität Chemnitz |
| record_format | marc |
| spelling | Dhakal, Dileep 1986- Verfasser (DE-588)1153215780 aut Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition vorgelegt von M.Sc. Dileep Dhakal Untersuchungen zum Wachstum ultradünner Kupfer- und Kupferoxid Schichten mittels Atomlagenabscheidung Chemnitz Technische Universität Chemnitz 2016 171 Blätter Illustrationen, Diagramme txt rdacontent n rdamedia nc rdacarrier Dissertation Technische Universität Chemnitz 2016 Kupfer (DE-588)4033734-0 gnd rswk-swf ULSI (DE-588)4226286-0 gnd rswk-swf Metallisierungsschicht (DE-588)4296760-0 gnd rswk-swf Reduktion (DE-588)4177306-8 gnd rswk-swf Kupferoxide (DE-588)4166141-2 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Kupfer (DE-588)4033734-0 s Kupferoxide (DE-588)4166141-2 s Metallisierungsschicht (DE-588)4296760-0 s Reduktion (DE-588)4177306-8 s ULSI (DE-588)4226286-0 s DE-604 |
| spellingShingle | Dhakal, Dileep 1986- Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition Kupfer (DE-588)4033734-0 gnd ULSI (DE-588)4226286-0 gnd Metallisierungsschicht (DE-588)4296760-0 gnd Reduktion (DE-588)4177306-8 gnd Kupferoxide (DE-588)4166141-2 gnd |
| subject_GND | (DE-588)4033734-0 (DE-588)4226286-0 (DE-588)4296760-0 (DE-588)4177306-8 (DE-588)4166141-2 (DE-588)4113937-9 |
| title | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |
| title_alt | Untersuchungen zum Wachstum ultradünner Kupfer- und Kupferoxid Schichten mittels Atomlagenabscheidung |
| title_auth | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |
| title_exact_search | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |
| title_full | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition vorgelegt von M.Sc. Dileep Dhakal |
| title_fullStr | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition vorgelegt von M.Sc. Dileep Dhakal |
| title_full_unstemmed | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition vorgelegt von M.Sc. Dileep Dhakal |
| title_short | Growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |
| title_sort | growth monitoring of ultrathin copper and copper oxide films deposited by atomic layer deposition |
| topic | Kupfer (DE-588)4033734-0 gnd ULSI (DE-588)4226286-0 gnd Metallisierungsschicht (DE-588)4296760-0 gnd Reduktion (DE-588)4177306-8 gnd Kupferoxide (DE-588)4166141-2 gnd |
| topic_facet | Kupfer ULSI Metallisierungsschicht Reduktion Kupferoxide Hochschulschrift |
| work_keys_str_mv | AT dhakaldileep growthmonitoringofultrathincopperandcopperoxidefilmsdepositedbyatomiclayerdeposition AT dhakaldileep untersuchungenzumwachstumultradunnerkupferundkupferoxidschichtenmittelsatomlagenabscheidung |