An introduction to physics and technology of thin films:
Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized....
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Singapore
World Scientific Pub. Co.
c1994
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Schlagworte: | |
Online-Zugang: | FHN01 Volltext |
Zusammenfassung: | Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well |
Beschreibung: | xi, 147 p. ill |
ISBN: | 9789812812988 |
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520 | |a Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well | ||
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Datensatz im Suchindex
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any_adam_object | |
author | Wagendristel, Alfred |
author_facet | Wagendristel, Alfred |
author_role | aut |
author_sort | Wagendristel, Alfred |
author_variant | a w aw |
building | Verbundindex |
bvnumber | BV044636325 |
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dewey-full | 530.4175 |
dewey-hundreds | 500 - Natural sciences and mathematics |
dewey-ones | 530 - Physics |
dewey-raw | 530.4175 |
dewey-search | 530.4175 |
dewey-sort | 3530.4175 |
dewey-tens | 530 - Physics |
discipline | Physik |
format | Electronic eBook |
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indexdate | 2024-07-10T07:57:48Z |
institution | BVB |
isbn | 9789812812988 |
language | English |
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physical | xi, 147 p. ill |
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publishDate | 1994 |
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publisher | World Scientific Pub. Co. |
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spelling | Wagendristel, Alfred Verfasser aut An introduction to physics and technology of thin films Alfred Wagendristel, Yuming Wang Singapore World Scientific Pub. Co. c1994 xi, 147 p. ill txt rdacontent c rdamedia cr rdacarrier Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well Thin films Thin film devices Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Halbleiterbauelement (DE-588)4113826-0 gnd rswk-swf Halbleiterbauelement (DE-588)4113826-0 s Dünne Schicht (DE-588)4136925-7 s 1\p DE-604 Wang, Yuming Sonstige oth Erscheint auch als Druck-Ausgabe 9789810216160 Erscheint auch als Druck-Ausgabe 9810216165 http://www.worldscientific.com/worldscibooks/10.1142/2227#t=toc Verlag URL des Erstveroeffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Wagendristel, Alfred An introduction to physics and technology of thin films Thin films Thin film devices Dünne Schicht (DE-588)4136925-7 gnd Halbleiterbauelement (DE-588)4113826-0 gnd |
subject_GND | (DE-588)4136925-7 (DE-588)4113826-0 |
title | An introduction to physics and technology of thin films |
title_auth | An introduction to physics and technology of thin films |
title_exact_search | An introduction to physics and technology of thin films |
title_full | An introduction to physics and technology of thin films Alfred Wagendristel, Yuming Wang |
title_fullStr | An introduction to physics and technology of thin films Alfred Wagendristel, Yuming Wang |
title_full_unstemmed | An introduction to physics and technology of thin films Alfred Wagendristel, Yuming Wang |
title_short | An introduction to physics and technology of thin films |
title_sort | an introduction to physics and technology of thin films |
topic | Thin films Thin film devices Dünne Schicht (DE-588)4136925-7 gnd Halbleiterbauelement (DE-588)4113826-0 gnd |
topic_facet | Thin films Thin film devices Dünne Schicht Halbleiterbauelement |
url | http://www.worldscientific.com/worldscibooks/10.1142/2227#t=toc |
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