The physics and modeling of MOSFETS: surface-potential model HiSIM

This volume provides a timely description of the latest compact MOS transistor models for circuit simulation. The first generation BSIM3 and BSIM4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm M...

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Bibliographische Detailangaben
1. Verfasser: Miura-Mattausch, Mitiko 1949- (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: New Jersey ; London ; Singapore ; Beijing ; Shanghai ; Hong Kong ; Taipei ; Chennai World Scientific [2008]
Schriftenreihe:International series on advances in solid state electronics and technology (ASSET)
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Online-Zugang:FHN01
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Zusammenfassung:This volume provides a timely description of the latest compact MOS transistor models for circuit simulation. The first generation BSIM3 and BSIM4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm MOS transistors. This book discusses the second generation MOS transistor models that are now in urgent demand and being brought into the initial phase of manufacturing applications. It considers how the models are to include the complete drift-diffusion theory using the surface potential variable in the MOS transistor channel in order to give one characterization equation
Beschreibung:xxii, 352 Seiten Diagramme
ISBN:9812812059
9789812812056
9789814477574

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