Plasma processing for VLSI:
Plasma Processing for VLSI.
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York
Academic Press
1984
|
| Schriftenreihe: | VLSI electronics
v. 8 |
| Schlagworte: | |
| Online-Zugang: | FAW01 Volltext |
| Zusammenfassung: | Plasma Processing for VLSI. |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 online resource (xiv, 527 pages) illustrations |
| ISBN: | 9781483217758 1483217752 0122341082 9780122341083 |
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Datensatz im Suchindex
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| building | Verbundindex |
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| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| id | DE-604.BV044391457 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:51:41Z |
| institution | BVB |
| isbn | 9781483217758 1483217752 0122341082 9780122341083 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029793679 |
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| physical | 1 online resource (xiv, 527 pages) illustrations |
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| publishDate | 1984 |
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| series2 | VLSI electronics |
| spelling | Plasma processing for VLSI edited by Norman G. Einspruch, Dale M. Brown New York Academic Press 1984 1 online resource (xiv, 527 pages) illustrations txt rdacontent c rdamedia cr rdacarrier VLSI electronics v. 8 Includes bibliographical references and index Plasma Processing for VLSI. gravure lithographie plasma circuit intégré semiconducteur VLSI. TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Plasma (Ionized gases) / Industrial applications fast Gravure par plasma ram Lithographie par rayons X. ram Pulvérisation cathodique ram Circuits intégrés à très grande échelle ram Integrated circuits Very large scale integration Plasma (Ionized gases) Industrial applications Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Sputtern (DE-588)4182614-0 s DE-604 Plasmatechnik (DE-588)4140353-8 s Plasmastrahlbearbeitung (DE-588)4136199-4 s Plasmaätzen (DE-588)4174821-9 s VLSI (DE-588)4117388-0 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Mikroelektronik (DE-588)4039207-7 s Einspruch, Norman G. Sonstige oth Brown, Dale M. Sonstige oth Erscheint auch als Druck-Ausgabe Plasma processing for VLSI 0122341082 http://www.sciencedirect.com/science/bookseries/07367031/8 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Plasma processing for VLSI gravure lithographie plasma circuit intégré semiconducteur VLSI. TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Plasma (Ionized gases) / Industrial applications fast Gravure par plasma ram Lithographie par rayons X. ram Pulvérisation cathodique ram Circuits intégrés à très grande échelle ram Integrated circuits Very large scale integration Plasma (Ionized gases) Industrial applications Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Plasmatechnik (DE-588)4140353-8 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Mikroelektronik (DE-588)4039207-7 gnd VLSI (DE-588)4117388-0 gnd |
| subject_GND | (DE-588)4136199-4 (DE-588)4174821-9 (DE-588)4182614-0 (DE-588)4140353-8 (DE-588)4191584-7 (DE-588)4039207-7 (DE-588)4117388-0 |
| title | Plasma processing for VLSI |
| title_auth | Plasma processing for VLSI |
| title_exact_search | Plasma processing for VLSI |
| title_full | Plasma processing for VLSI edited by Norman G. Einspruch, Dale M. Brown |
| title_fullStr | Plasma processing for VLSI edited by Norman G. Einspruch, Dale M. Brown |
| title_full_unstemmed | Plasma processing for VLSI edited by Norman G. Einspruch, Dale M. Brown |
| title_short | Plasma processing for VLSI |
| title_sort | plasma processing for vlsi |
| topic | gravure lithographie plasma circuit intégré semiconducteur VLSI. TECHNOLOGY & ENGINEERING / Mechanical bisacsh Integrated circuits / Very large scale integration fast Plasma (Ionized gases) / Industrial applications fast Gravure par plasma ram Lithographie par rayons X. ram Pulvérisation cathodique ram Circuits intégrés à très grande échelle ram Integrated circuits Very large scale integration Plasma (Ionized gases) Industrial applications Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Plasmatechnik (DE-588)4140353-8 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Mikroelektronik (DE-588)4039207-7 gnd VLSI (DE-588)4117388-0 gnd |
| topic_facet | gravure lithographie plasma circuit intégré semiconducteur VLSI. TECHNOLOGY & ENGINEERING / Mechanical Integrated circuits / Very large scale integration Plasma (Ionized gases) / Industrial applications Gravure par plasma Lithographie par rayons X. Pulvérisation cathodique Circuits intégrés à très grande échelle Integrated circuits Very large scale integration Plasma (Ionized gases) Industrial applications Plasmastrahlbearbeitung Plasmaätzen Sputtern Plasmatechnik Lithografie Halbleitertechnologie Mikroelektronik VLSI |
| url | http://www.sciencedirect.com/science/bookseries/07367031/8 |
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