EUV lithography:
Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an histor...
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
[2009]
|
| Schriftenreihe: | SPIE Press monograph
PM178 |
| Schlagworte: | |
| Online-Zugang: | FHD01 Volltext |
| Zusammenfassung: | Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field |
| Beschreibung: | 1 online resource (xxvii, 673 pages) illustrations |
| ISBN: | 9780819480705 |
| DOI: | 10.1117/3.769214 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044232742 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170320s2009 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819480705 |9 978-0-8194-8070-5 | ||
| 024 | 7 | |a 10.1117/3.769214 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819480705 | ||
| 035 | |a (OCoLC)812346746 | ||
| 035 | |a (DE-599)BVBBV044232742 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 245 | 1 | 0 | |a EUV lithography |c Vivek Bakshi, editor |
| 246 | 1 | 3 | |a Extreme ultraviolet lithography |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c [2009] | |
| 300 | |a 1 online resource (xxvii, 673 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE Press monograph |v PM178 | |
| 520 | |a Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field | ||
| 650 | 4 | |a Ultraviolet radiation / Industrial applications | |
| 650 | 4 | |a Photolithography | |
| 650 | 4 | |a Optical coatings | |
| 650 | 0 | 7 | |a Fotolithografie |0 (DE-588)4274823-9 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |0 (DE-588)4274823-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Bakshi, Vivek |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-6964-9 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.769214 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029638329 | ||
| 966 | e | |u https://doi.org/10.1117/3.769214 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804177388146262016 |
|---|---|
| any_adam_object | |
| author2 | Bakshi, Vivek |
| author2_role | edt |
| author2_variant | v b vb |
| author_facet | Bakshi, Vivek |
| building | Verbundindex |
| bvnumber | BV044232742 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819480705 (OCoLC)812346746 (DE-599)BVBBV044232742 |
| dewey-full | 621.3815 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815 |
| dewey-search | 621.3815 |
| dewey-sort | 3621.3815 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.769214 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02372nmm a2200457zcb4500</leader><controlfield tag="001">BV044232742</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170320s2009 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819480705</subfield><subfield code="9">978-0-8194-8070-5</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.769214</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819480705</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812346746</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044232742</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">EUV lithography</subfield><subfield code="c">Vivek Bakshi, editor</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Extreme ultraviolet lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">[2009]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xxvii, 673 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE Press monograph</subfield><subfield code="v">PM178</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ultraviolet radiation / Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical coatings</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bakshi, Vivek</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-6964-9</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.769214</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029638329</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.769214</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044232742 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:17Z |
| institution | BVB |
| isbn | 9780819480705 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029638329 |
| oclc_num | 812346746 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xxvii, 673 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE Press monograph |
| spelling | EUV lithography Vivek Bakshi, editor Extreme ultraviolet lithography Bellingham, Wash. SPIE [2009] 1 online resource (xxvii, 673 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM178 Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field Ultraviolet radiation / Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd rswk-swf Fotolithografie (DE-588)4274823-9 s DE-604 Bakshi, Vivek edt Erscheint auch als Druck-Ausgabe 978-0-8194-6964-9 https://doi.org/10.1117/3.769214 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | EUV lithography Ultraviolet radiation / Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| subject_GND | (DE-588)4274823-9 |
| title | EUV lithography |
| title_alt | Extreme ultraviolet lithography |
| title_auth | EUV lithography |
| title_exact_search | EUV lithography |
| title_full | EUV lithography Vivek Bakshi, editor |
| title_fullStr | EUV lithography Vivek Bakshi, editor |
| title_full_unstemmed | EUV lithography Vivek Bakshi, editor |
| title_short | EUV lithography |
| title_sort | euv lithography |
| topic | Ultraviolet radiation / Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| topic_facet | Ultraviolet radiation / Industrial applications Photolithography Optical coatings Fotolithografie |
| url | https://doi.org/10.1117/3.769214 |
| work_keys_str_mv | AT bakshivivek euvlithography AT bakshivivek extremeultravioletlithography |