EUV sources for lithography:
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and...
Saved in:
| Other Authors: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
[2006]
|
| Series: | SPIE Press monograph
PM149 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject |
| Physical Description: | 1 online resource (xxxv, 1057 pages) illustrations |
| ISBN: | 9780819480712 |
| DOI: | 10.1117/3.613774 |
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| id | DE-604.BV044222739 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:01Z |
| institution | BVB |
| isbn | 9780819480712 |
| language | English |
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| physical | 1 online resource (xxxv, 1057 pages) illustrations |
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| spelling | EUV sources for lithography [edited by] Vivek Bakshi Bellingham, Wash. SPIE [2006] 1 online resource (xxxv, 1057 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM149 This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography Bakshi, Vivek edt Erscheint auch als Druck-Ausgabe 978-0-8194-5845-2 https://doi.org/10.1117/3.613774 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | EUV sources for lithography Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| title | EUV sources for lithography |
| title_auth | EUV sources for lithography |
| title_exact_search | EUV sources for lithography |
| title_full | EUV sources for lithography [edited by] Vivek Bakshi |
| title_fullStr | EUV sources for lithography [edited by] Vivek Bakshi |
| title_full_unstemmed | EUV sources for lithography [edited by] Vivek Bakshi |
| title_short | EUV sources for lithography |
| title_sort | euv sources for lithography |
| topic | Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| topic_facet | Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| url | https://doi.org/10.1117/3.613774 |
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