EUV sources for lithography:
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and...
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
[2006]
|
| Schriftenreihe: | SPIE Press monograph
PM149 |
| Schlagworte: | |
| Online-Zugang: | FHD01 URL des Erstveröffentlichers |
| Zusammenfassung: | This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject |
| Beschreibung: | 1 online resource (xxxv, 1057 pages) illustrations |
| ISBN: | 9780819480712 |
| DOI: | 10.1117/3.613774 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044222739 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170313s2006 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819480712 |9 978-0-8194-8071-2 | ||
| 024 | 7 | |a 10.1117/3.613774 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819480712 | ||
| 035 | |a (OCoLC)732295116 | ||
| 035 | |a (DE-599)BVBBV044222739 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.36/4 | |
| 245 | 1 | 0 | |a EUV sources for lithography |c [edited by] Vivek Bakshi |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c [2006] | |
| 300 | |a 1 online resource (xxxv, 1057 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE Press monograph |v PM149 | |
| 520 | |a This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject | ||
| 650 | 4 | |a Ultraviolet radiation / Industrial applications | |
| 650 | 4 | |a Extreme ultraviolet lithography | |
| 650 | 4 | |a Plasma (Ionized gases) | |
| 650 | 4 | |a Lithography | |
| 700 | 1 | |a Bakshi, Vivek |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-5845-2 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.613774 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029628650 | ||
| 966 | e | |u https://doi.org/10.1117/3.613774 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804177371685715968 |
|---|---|
| any_adam_object | |
| author2 | Bakshi, Vivek |
| author2_role | edt |
| author2_variant | v b vb |
| author_facet | Bakshi, Vivek |
| building | Verbundindex |
| bvnumber | BV044222739 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819480712 (OCoLC)732295116 (DE-599)BVBBV044222739 |
| dewey-full | 621.36/4 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.36/4 |
| dewey-search | 621.36/4 |
| dewey-sort | 3621.36 14 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.613774 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02250nmm a2200409zcb4500</leader><controlfield tag="001">BV044222739</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170313s2006 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819480712</subfield><subfield code="9">978-0-8194-8071-2</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.613774</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819480712</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)732295116</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044222739</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.36/4</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">EUV sources for lithography</subfield><subfield code="c">[edited by] Vivek Bakshi</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">[2006]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xxxv, 1057 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE Press monograph</subfield><subfield code="v">PM149</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ultraviolet radiation / Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Extreme ultraviolet lithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma (Ionized gases)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bakshi, Vivek</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-5845-2</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.613774</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029628650</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.613774</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044222739 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:01Z |
| institution | BVB |
| isbn | 9780819480712 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029628650 |
| oclc_num | 732295116 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xxxv, 1057 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2006 |
| publishDateSearch | 2006 |
| publishDateSort | 2006 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE Press monograph |
| spelling | EUV sources for lithography [edited by] Vivek Bakshi Bellingham, Wash. SPIE [2006] 1 online resource (xxxv, 1057 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM149 This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography Bakshi, Vivek edt Erscheint auch als Druck-Ausgabe 978-0-8194-5845-2 https://doi.org/10.1117/3.613774 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | EUV sources for lithography Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| title | EUV sources for lithography |
| title_auth | EUV sources for lithography |
| title_exact_search | EUV sources for lithography |
| title_full | EUV sources for lithography [edited by] Vivek Bakshi |
| title_fullStr | EUV sources for lithography [edited by] Vivek Bakshi |
| title_full_unstemmed | EUV sources for lithography [edited by] Vivek Bakshi |
| title_short | EUV sources for lithography |
| title_sort | euv sources for lithography |
| topic | Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| topic_facet | Ultraviolet radiation / Industrial applications Extreme ultraviolet lithography Plasma (Ionized gases) Lithography |
| url | https://doi.org/10.1117/3.613774 |
| work_keys_str_mv | AT bakshivivek euvsourcesforlithography |