Resolution enhancement techniques in optical lithography:
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
2001
|
| Series: | SPIE tutorial texts
TT47 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers |
| Physical Description: | 1 online resource (xvii, 214 pages) illustrations |
| ISBN: | 9780819478818 |
| DOI: | 10.1117/3.401208 |
Staff View
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044222137 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170313s2001 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819478818 |9 978-0-8194-7881-8 | ||
| 024 | 7 | |a 10.1117/3.401208 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819478818 | ||
| 035 | |a (OCoLC)812330278 | ||
| 035 | |a (DE-599)BVBBV044222137 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/31 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Wong, Alfred Kwok-Kit |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Resolution enhancement techniques in optical lithography |c Alfred Kwok-Kit Wong |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 2001 | |
| 300 | |a 1 online resource (xvii, 214 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE tutorial texts |v TT47 | |
| 520 | |a Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers | ||
| 650 | 4 | |a Integrated circuits / Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-3995-6 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.401208 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029628065 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1117/3.401208 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Record in the Search Index
| _version_ | 1804177370651820032 |
|---|---|
| any_adam_object | |
| author | Wong, Alfred Kwok-Kit |
| author_facet | Wong, Alfred Kwok-Kit |
| author_role | aut |
| author_sort | Wong, Alfred Kwok-Kit |
| author_variant | a k k w akk akkw |
| building | Verbundindex |
| bvnumber | BV044222137 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819478818 (OCoLC)812330278 (DE-599)BVBBV044222137 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.401208 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02272nmm a2200469zcb4500</leader><controlfield tag="001">BV044222137</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170313s2001 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819478818</subfield><subfield code="9">978-0-8194-7881-8</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.401208</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819478818</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812330278</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044222137</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Wong, Alfred Kwok-Kit</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Resolution enhancement techniques in optical lithography</subfield><subfield code="c">Alfred Kwok-Kit Wong</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">2001</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xvii, 214 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE tutorial texts</subfield><subfield code="v">TT47</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits / Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-3995-6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.401208</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029628065</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.401208</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044222137 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:00Z |
| institution | BVB |
| isbn | 9780819478818 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029628065 |
| oclc_num | 812330278 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xvii, 214 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE tutorial texts |
| spelling | Wong, Alfred Kwok-Kit Verfasser aut Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong Bellingham, Wash. SPIE 2001 1 online resource (xvii, 214 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE tutorial texts TT47 Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Integrierte Schaltung (DE-588)4027242-4 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-3995-6 https://doi.org/10.1117/3.401208 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4027242-4 |
| title | Resolution enhancement techniques in optical lithography |
| title_auth | Resolution enhancement techniques in optical lithography |
| title_exact_search | Resolution enhancement techniques in optical lithography |
| title_full | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_fullStr | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_full_unstemmed | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_short | Resolution enhancement techniques in optical lithography |
| title_sort | resolution enhancement techniques in optical lithography |
| topic | Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| topic_facet | Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie Integrierte Schaltung |
| url | https://doi.org/10.1117/3.401208 |
| work_keys_str_mv | AT wongalfredkwokkit resolutionenhancementtechniquesinopticallithography |