Resolution enhancement techniques in optical lithography:
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
2001
|
| Schriftenreihe: | SPIE tutorial texts
TT47 |
| Schlagworte: | |
| Online-Zugang: | FHD01 URL des Erstveröffentlichers |
| Zusammenfassung: | Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers |
| Beschreibung: | 1 online resource (xvii, 214 pages) illustrations |
| ISBN: | 9780819478818 |
| DOI: | 10.1117/3.401208 |
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Datensatz im Suchindex
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| author | Wong, Alfred Kwok-Kit |
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| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.401208 |
| format | Electronic eBook |
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| id | DE-604.BV044222137 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:00Z |
| institution | BVB |
| isbn | 9780819478818 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029628065 |
| oclc_num | 812330278 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xvii, 214 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE tutorial texts |
| spelling | Wong, Alfred Kwok-Kit Verfasser aut Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong Bellingham, Wash. SPIE 2001 1 online resource (xvii, 214 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE tutorial texts TT47 Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Integrierte Schaltung (DE-588)4027242-4 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-3995-6 https://doi.org/10.1117/3.401208 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4027242-4 |
| title | Resolution enhancement techniques in optical lithography |
| title_auth | Resolution enhancement techniques in optical lithography |
| title_exact_search | Resolution enhancement techniques in optical lithography |
| title_full | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_fullStr | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_full_unstemmed | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_short | Resolution enhancement techniques in optical lithography |
| title_sort | resolution enhancement techniques in optical lithography |
| topic | Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| topic_facet | Integrated circuits / Design and construction Microlithography Lithografie Halbleitertechnologie Integrierte Schaltung |
| url | https://doi.org/10.1117/3.401208 |
| work_keys_str_mv | AT wongalfredkwokkit resolutionenhancementtechniquesinopticallithography |